Plasma
An ionized gas used for flat panel displays.
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High Sensitive Radiometers for Plasma Diagnostics
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ELVA-1 radiometers for plasma diagnostic are worldwide known product. The custom designed ECE radiometers have been installed at lots of Tokamaks
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RF Switchbox
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The RF Switchbox offers the application of a single system consisting of an RF Power Supply (AG 0x13 Generator) and Matching Network Tuner, and distributes power into multiple plasma applications. It allows operation of one source-to-load at a time.
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Empowering Traditional Mass Spec
ZipChip
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The ZipChip™ separations platform uses integrated microfluidic technology to prepare, separate and electrospray biological samples directly into traditional mass spectrometers (MS). In less than 3 minutes per sample, the cost-effective ZipChip system enables analysis of a broad range of matrices from growth media to cell lysates, blood, plasma, urine, and biopharma products. Each chip provides answers on analytes from small molecules up to intact proteins, antibodies and antibody drug conjugates (ADCs). This platform provides better separation quality than most liquid chromatography (LC) instruments – in a fraction of the time – all with full MS identification behind every separations peak.
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Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Optoelectronics
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Vishay is the world's number-one manufacturer of infrared components, with a portfolio that includes infrared receivers, emitters, IrDA transceivers, optocouplers, solid-state relays, and touch panels. Visible LEDs, optical sensors, photo detectors, plasma displays, and 7-segment displays complete Vishay's optoelectronics offerings.
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ICP-OES Spectrometers
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ICP-OES spectrometers measure the concentration of elements from ppb to % using de-excitation of atoms and ions in a plasma. The robustness of our Ultima ICP spectrometers makes them ideal for applications common to mining, chemicals manufacture, salt production, wear metals in oil analysis, petrochemical, metallurgical production and precious metal refining.
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328mm focal length, motorized Czerny-Turner Spectrograph
Kymera 328i
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Intelligent and multi-modal spectroscopy platform for Physical and Life science. Adaptive Focus, automated optimization for the best quality of focus. 328 mm focal length, F/4.1 aperture; Ideal combination for a wide range of applications ranging from luminescence/photoluminescence spectroscopy to more demanding, higher resolution Raman spectroscopy or plasma studies.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Plasma Emission Detectors for Gas Chromatographs
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Our patented Plasma Emission Detector is available for integration into any gas chromatography system or installation. It has been designed for ‘plug and play’ installation and to allow for analysis of impurities from PPB to % levels using either capillary or packed columns.
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MHG Solar Simulation
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Atlas Material Testing Solutions
Filtered MHG lighting is a mature technology used since the 80’s for larger solar simulators inside environmental test chambers. MHG lamps are filled with a mixture of mercury, halides and rare earth elements which vaporize during ignition, generating a plasma. After a few minutes, the plasma reaches thermal equilibrium and emits a quasi-continuous spectrum (when properly filtered) similar to global solar radiation.
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UV Cameras
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Solar blind UV cameras are imaging devices optimized to detect ultraviolet light of wavelengths below about 280nm. Such cameras are insensitive against sunlight due to negligible sensitivity to visible and long wavelength UV light. Solar blind UV cameras are used in a series of applications like corona detection, fire detection, combustion analysis, plasma research, testing UV lamps, etc. However, highly sensitive corona detection is the main mass application and these devices are of crucial importance in electric power industry. These imaging devices enable easy detection of degraded insulators of high voltage transmission lines, distributions and substations. They can see the emission of UV light when discharges occur at defect insulators. From design point of view solar blind UV cameras are actually bispectral imaging systems built by combining true UV camera with typical visible camera. These bispectral imaging system generate output image as overlay of typical visible image with UV image of analyzed UV source.
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Nexis GC-2030 BIDUFRGA
UFRGA Series
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The Ultrafast RGA system utilizes the new Barrier Discharge Ionization Detector (BID) technology coupled with Nexis GC-2030 to create new system GC for ultrafast, high-sensitivity analysis. Since the electrode creating Helium plasma is totally isolated from the carrier gas, there is no chance to contaminate this electrode with a dirty sample. This enables long-term stability.
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Die-To-Wafer Bonding Systems
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Several different D2W bonding methods are available and selected depending upon the application and customer requirements. In direct placement D2W (DP-D2W) bonding, the singulated dies are bonded to the target wafer one by one using a pick-and-place flip-chip bonder. Plasma activation and cleaning of the surfaces of the dies on the handler wafer are essential steps for establishing a high-yielding bond and electrical interface between the dies and target wafer. This is where the EVG320 D2W activation system comes in.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Monitor Holder for 19" Rack Installation
ZZ-0017-01
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- Monitor holder for 19 “rack installation- 9 U (400 mm)- Can be used universally with LED, LCD and plasma monitors- Compatible with the VESA standards 75 x 75 and 100 x 100 mm- Record in portrait and landscape format
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
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A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Test Patterns
DisplayMate Multimedia Edition
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DisplayMate Technologies Corporation
DisplayMate Multimedia Edition is the most advanced and powerful version of DisplayMate ever, with lots of proprietary and highly innovative suites of test patterns for setting up, tuning-up, calibrating, testing, evaluating, diagnosing, and analyzing CRTs, analog and digital LCD, Plasma, DLP, LCoS, and SXRD monitors and projectors, microdisplays, video boards, color printers, TVs and HDTVs, NTSC/PAL Television encoders and decoders, and more.
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R*evolution® Remote Plasma Source
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The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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One Port Vector Network Analyser
TE3001
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The TE3001 One Port Vector Network Analyser is built for the professional who understands the calibration process and has a network analysis task to perform. The unit features a larger output signal than the TE3000 for better noise immunity, and is supplied with a 6 piece custom calibration kit to remove the effect of test fixtures and cables. Together, these features make the TE3001 ideal for broadcast and plasma applications that require a length of cable for connection and may be high in noise or interference.
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Neutrals, Radicals and Ions Analysis
HPR-60 MBMS
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The Hiden HPR-60 molecular beam mass spectrometer is a compact skimmer inlet MS for the analysis of atmospheric plasma and reactive gas phase intermediates.
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OES Spectrometers
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OES Spectrometers (Optical Emission Spectrometers for OEMs) optimized for SEMICON applications including plasma monitoring/end-point detection and reflectometry (with the addition of a flash lamp). The OES-Star features unmatched throughput and SNR, spectral coverage and < 1 nm resolution). Our new OES Family, OES-Star, VS70-MC and InVizU all include our latest “Multi-Communications interface” electronics (MC= EtherCAT, Ethernet, USB-2). The Invizu integrates both a linear CMOS sensor for UV-VIS and a TE-Cooled INGAAS sensor, which extends the spectral coverage to 1700 nm.
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Digital Dairy Refractometer, Colostrum and Blood Plasma Protein
DD-2
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The DD-2 Digital-Dairy Refractometer will provide reliable estimates of the percent solids in waste milk and colostrum quality using the Brix Method, and a blood serum total protein concentration scale can be used to assess failure of passive transfer. The MISCO Digital-Dairy™ refractometers are specifically designed to help professional dairy farmers and calf ranchers to rear healthy calves. They are rugged enough to withstand the demands of farm use, yet precise enough to give laboratory-quality readings.
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Desolvating Nebulizer
Aridus3
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The CETAC Aridus3 Desolvating Nebulizer System is a specialized liquid sample introduction accessory for inductively coupled plasma mass spectrometry (ICP‑MS). The Aridus3 can enhance analyte sensitivity up to 10 times or more and can greatly reduce solvent-based interferences such as oxides and hydrides.The Aridus3 couples a low-flow (50, 100, or 200 µL/min) PFA nebulizer and a heated PFA spray chamber with an inert fluoropolymer membrane. This combination provides enhanced analyte sensitivity while reducing solvent based interferences such as oxides and hydrides. The Aridus3 is particularly advantageous for small volume and highly corrosive samples such as those generated in the earth sciences and the semiconductor industry.
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Plasma Profiling TOFMS
PP-TOFMS
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Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Principle Of Optical Emission Spectrometry
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Optical emission spectrometry involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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ICP-OES Analyzer
SPECTRO ARCOS
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SPECTRO Analytical Instruments GmbH
The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.Its unique new MultiView plasma interface option provides truly uncompromising axial-view and radial-view plasma observation in a single instrument. The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. Visit the MultiView Q&A section in the ARCOS Resource Center for answers to frequently asked questions. Plasma power enters a whole new era with the system's innovative generator. This unique, compact and extremely rugged component is based on laterally diffused metal oxide semiconductor (LDMOS) technology. It delivers the highest plasma power available today, enabling previously impossible feats of analysis at the highest plasma loads.
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Enable Non-Invasive Analysis
Sparklike Handheld™
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Sparklike Handheld™ is practical and quick method to test IG gas concentration. Technology is based on plasma emission spectroscopy. A high voltage spark is launched in the IG unit's cavity causing a light emission which is observed and analyzed further.
