Lam Research
It designs, manufactures, markets, refurbishes, and services semiconductor processing equipment that is used in the fabrication of integrated circuits.
- +1-800-526-7678
510-572-0200 - 4650 Cushing Parkway
Fremont, CA 94538
United States of America
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Product
Reactive Ion Etch (RIE)
Versys Metal Product Family
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Metal etch processes play a key role in connecting the individual components that form an integrated circuit (IC), such as forming wires and electrical connections. These processes are also used to pattern complicated metal hardmasks (MHM) that are used to form the wiring for advanced devices.
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Product
Deep Reactive Ion Etch (DRIE
Syndion Product Family
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Deep silicon etch refers to plasma-based processes that remove silicon, creating features that can be many orders of magnitude larger than those in advanced transistors and memory cells.
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Product
3D Semiconductor & MEMS Process Modeling Platform
SEMulator3D
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SEMulator3D® is a semiconductor process modeling platform that offers wide ranging technology development capabilities. Based on highly efficient physics-driven voxel modeling technology, SEMulator3D has a unique ability to model complete process flows. Starting from input design data, SEMulator3D follows an integrated process flow description to create the virtual equivalent of the complex, 3D structures created in the fab.SEMulator3D process modeling and analysis is used for fast and accurate “virtual fabrication” of advanced nano-fabrication processes, allowing engineers to understand manufacturing effects early in the development process and reduce time-consuming and costly silicon learning cycles.
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Product
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
VECTOR Product Family
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Dielectric film deposition processes are used to form some of the most difficult-to-produce insulating layers in a semiconductor device, including those used in the latest transistors and 3D structures. In some applications, these films need to conform tightly around intricate structures. Other applications require dielectric films to be exceptionally smooth and defect free since slight imperfections are multiplied greatly in subsequent layers.
