MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Process Sense™ NDIR End Point Detector For Chamber Clean
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The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Product
Microwave Generators And Systems
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MKS offers compact industrial microwave generators and systems in 915MHz and 2450MHz that are adaptable to a wide range of applications including include Food and Beverage Packaging, Environmental and Advanced Industrial processes like coating, material growth, and automotive. With a robust, modular power system chassis design and advanced filament and electromagnetic management, MKS microwave generators are engineered to last. The microwave generators are equipped with switch mode topology for all power ranges and support a variety of fieldbus communication protocols.
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Product
Elite™ 13.56 MHz RF Plasma Generators
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The elite™ Series of RF plasma generators provides state-of-the art technology in a compact air-cooled package. The elite is designed with high speed closed loop control, a class E RF deck and a switching modulator for superior output performance. The elite design utilizes a single printed circuit board assembly for the full rack product virtually eliminating all internal wires and connectors and thereby providing the highest reliability available.
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Product
Dissolved Carbon Dioxide (DI-CO2) Ultrapure Water Delivery System
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The DI-CO2 is used in single substrate cleaning tools for rinsing steps to prevent ESD effects and/or corrosion by creating UPW (ultrapure water) with precisely defined conductivity. It is a compact system for tool integration, providing conductive DI-CO2 water (Carbon Dioxide) with closed loop controlled conductivity. The conductivity is kept at a constant value under changing flow conditions by control of the CO2 concentration in the DI-CO2 water.
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Product
Vacuum Pressure Transducers
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MKS modular vacuum transducers feature compact size that dramatically reduces installation costs. These vacuum/pressure gauges are ideal for applications where controller size and local control are critically important. They are available as pressure transducers with an analog output, or as vacuum modules with digital communications used to transmit the pressure signal.
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Product
High Performance Mass Flow Controllers
P-Series
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P-Series High Performance Multi-gas, Multi-range, Thermal Mass Flow Controllers are designed for the most critical process applications where accuracy, repeatability as well as pressure insensitivity are requirements.
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Product
DELTA™ II 2-zone Flow Ratio Controller
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The DELTA™ II Flow Ratio Controller divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. It is available with EtherCAT® or DeviceNet™ communications.
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Product
R*evolution® Remote Plasma Source
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The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Product
Reference Pressure Transducers
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These Baratron® capacitance manometers offer our highest level of presure measurement accuracy making them ideal for calibration transfer standards.
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Product
Vacuum Process And Chamber Environment Monitors
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Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Product
High Performance Baratron® Absolute Pressure Transducers
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These high performance Baratron® capacitance manometers operate at ambient temperature. They are referenced to vacuum for gas independent, direct measurement of absolute pressure.
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Product
Stand-alone Ozone Delivery System For Advanced Processes
SEMOZON® AX8585
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SEMOZON® AX8585 stand-alone ozone gas delivery system is designed around the AX8410 PRIME ozone generator to provide high flow, high concentration, ultra clean ozone generation and delivery. This fully configurable product line is designed to meet the ever changing needs of the semiconductor industry. Each SEMOZON AX8585 is a fully integrated, high output ozone gas delivery system intended for use in an increasing number of semiconductor process applications such as ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, and oxide growth.
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Product
KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
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The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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Product
Chemical Downstream Plasma Source
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The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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Product
SmartPower® Microwave Power Generators
AX2500
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SmartPower® AX2500 Series intelligent microwave power generators build on ASTeX's experience in producing rugged, reliable microwave power generators for demanding semiconductor fabrication and industrial applications. The AX2500 design architecture incorporates the best of ASTeX field-proven technology, and combines new design features aimed at improved performance and lower cost of ownership.


















