Plasma
An ionized gas used for flat panel displays.
-
Product
Digital Dairy Refractometer, Colostrum and Blood Plasma Protein
DD-2
-
The DD-2 Digital-Dairy Refractometer will provide reliable estimates of the percent solids in waste milk and colostrum quality using the Brix Method, and a blood serum total protein concentration scale can be used to assess failure of passive transfer. The MISCO Digital-Dairy™ refractometers are specifically designed to help professional dairy farmers and calf ranchers to rear healthy calves. They are rugged enough to withstand the demands of farm use, yet precise enough to give laboratory-quality readings.
-
Product
Pure Boron Foils
-
MICROMATTER™ boron foils are also produced by laser plasma ablation; however, the deposition process is much more complex and time consuming than that for diamond-like carbon. Accordingly, only thin films, mainly designed for beam stripping of heavy ions in electrostatic accelerators, are available. All films are generally delivered on glass substrates coated with a release agent.
-
Product
Sub-systems
-
Our self-contained, in-house components design and fabrication capacities ensure the breadth of sub-assemblies offered from rapid prototyping and proof of concept to full production. Ducommun has produced many high performance millimeterwave band sub-assemblies for commercial and military system applications. Among them, the K and Ka band directional Doppler Radar front ends are in production. Several hundreds of sets have been delivered. In addition, Ducommun has delivered Ka through W band engineering prototypes for plasma detection system, automotive Radar, speed Radar, automatic test set, radio telescope, missile terminal guidance, telecommunication system etc. applications.
-
Product
Deep Ultraviolet Spectrophotometer System
VUVAS-10X
-
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
-
Product
*High Intensity Systems
-
Unique laser systems for extreme applications:*OPCPA*Plasma physics*Laser shock peening
-
Product
R*evolution® Remote Plasma Source
-
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
-
Product
Specialty Sources
-
When conventional sources hit their limits, specialty sources step in. These custom-designed plasma and vapor sources are engineered for III-V MBE and compound semiconductor applications where unique material delivery and control are critical.
-
Product
Thin Films, Plasma and Surface Engineering
-
A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
-
Product
Transformers
-
RR Enterprises provides all type of transformersSingle Phase and Three Phase upto 100 KVA.The transformers can be→ Air Cooled→ Epoxy Cast→ Oil CooledWe provide transformers in high voltage and low voltage. These are used for various industrial and research purposes.→ High voltage transformers for corona and static elimination.→ High voltage transformers for plasma welding.→ Special purpose high voltage transformers.→ High current transformers for metalissing plants.→ Special purpose high current transformers.
-
Product
Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
-
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
-
Product
Microwave Plasma Subsystems
AX2600 And AX2700
-
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
-
Product
Inductively Coupled Plasma Emission Spectroscopy
-
Inductively Coupled Plasma Emission Spectroscopy
-
Product
Plasma Emission Detectors for Gas Chromatographs
-
Our patented Plasma Emission Detector is available for integration into any gas chromatography system or installation. It has been designed for ‘plug and play’ installation and to allow for analysis of impurities from PPB to % levels using either capillary or packed columns.
-
Product
Spectrometers, Vacuum
-
A compact and versatile vacuum ultraviolet monochromator. A selection of aberration-corrected diffraction gratings is available so you can tailor the instrument to your wavelength of interest and application. Connect this instrument directly to your vacuum plasma physics experiment or build an intense UV tunable source. It is available as a scanning monochromator, as a spectrometer, or as a spectrograph with microchannel plate or direct-detection CCD. The Model 234/302 is popular in systems due to its compact design, high throughput and resolution. It is also available with an additional entrance or exit port.
-
Product
Pull Off Adhesion Tester
106
-
Applications for the Elcometer 106 Adhesion Test include paint or plasma spray on bridge decking, coatings on steel, aluminium, concrete etc.Supplied in a carry case - ideal for site testsHand operated - no need for a power supplyIncludes a cutter for EN13144 and ISO 4624 tests
-
Product
Chemical Downstream Plasma Source
-
The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
-
Product
Thin-film deposition
Plasma Source
-
SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
-
Product
ICP Plasma System
-
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
-
Product
Optoelectronics
-
Vishay is the world's number-one manufacturer of infrared components, with a portfolio that includes infrared receivers, emitters, IrDA transceivers, optocouplers, solid-state relays, and touch panels. Visible LEDs, optical sensors, photo detectors, plasma displays, and 7-segment displays complete Vishay's optoelectronics offerings.
-
Product
One Port Vector Network Analyser
TE3001
-
The TE3001 One Port Vector Network Analyser is built for the professional who understands the calibration process and has a network analysis task to perform. The unit features a larger output signal than the TE3000 for better noise immunity, and is supplied with a 6 piece custom calibration kit to remove the effect of test fixtures and cables. Together, these features make the TE3001 ideal for broadcast and plasma applications that require a length of cable for connection and may be high in noise or interference.
-
Product
Monitor Holder for 19" Rack Installation
ZZ-0017-01
-
- Monitor holder for 19 “rack installation- 9 U (400 mm)- Can be used universally with LED, LCD and plasma monitors- Compatible with the VESA standards 75 x 75 and 100 x 100 mm- Record in portrait and landscape format
-
Product
Matching Network Solution
Navio
-
Experience simplicity and high reliability in a single, affordable package. The Navio™ matching network leverages our power expertise to precisely match complex plasma impedance to your tuning range. It’s quick, accurate, and repeatable. Available in multiple power ranges and frequencies, choose from a standard offering or a configurable design. Installation is virtually plug-and-play with Advanced Energy’s RF power supplies. Virtual Front Panel software is available for monitoring.
-
Product
MHG Solar Simulation
-
Atlas Material Testing Solutions
Filtered MHG lighting is a mature technology used since the 80’s for larger solar simulators inside environmental test chambers. MHG lamps are filled with a mixture of mercury, halides and rare earth elements which vaporize during ignition, generating a plasma. After a few minutes, the plasma reaches thermal equilibrium and emits a quasi-continuous spectrum (when properly filtered) similar to global solar radiation.
-
Product
Streak Camera
OptoScope SC-20 systems
-
The SC-20 streak camera system is characterized by its large detection area of 35 mm x 4 mm and a large usable screen diagonal of 40 mm. Signals are mapped onto the fiber optic input window and measured without the need for optical reduction. In the simplest case, the entrance optics consists of a slit mask that lies directly on the entrance window. In addition, a flexible extension with a shutter, a lens mount or an adjustable slot with coupling optics is possible. The time resolution in the sub-nanosecond range qualifies the camera for many applications in detonics and plasma physics.
-
Product
Die-To-Wafer Bonding Systems
-
Several different D2W bonding methods are available and selected depending upon the application and customer requirements. In direct placement D2W (DP-D2W) bonding, the singulated dies are bonded to the target wafer one by one using a pick-and-place flip-chip bonder. Plasma activation and cleaning of the surfaces of the dies on the handler wafer are essential steps for establishing a high-yielding bond and electrical interface between the dies and target wafer. This is where the EVG320 D2W activation system comes in.
