Metrology
field of measurement.
See Also: Measurement, Instrumentation, Coordinate Measuring Machines
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Universal 3D Metrology Software Platform
PolyWorks
Defining the cutting edge of 3D metrology, the PolyWorks software suite maximizes productivity, quality, and profitability when integrating 3D measurement technologies into an industrial manufacturing process. From part and tool design and prototyping down to final inspection of assembled products, PolyWorks offers advanced solutions to cover the complete product development cycle. Interfacing directly with major brands and technologies of single-point and point cloud 3D measurement devices through plug-in extension modules, this universal platform also supports a wide array of native point cloud and polygonal model file formats.
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Software
Metrology systems vary significantly in their utility, which is largely a function of software. The software ultimately determines what the system can do, and if certain capabilities, commands, or calculations are absent, it can severely compromise productivity.
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Manual Semiconductor Metrology System
Front USB port enables easy storage of measurements and other data to flash drivesMTI Instruments’ Proprietary Capacitance Circuitry for Outstanding Accuracy and DependabilityNon-contact measurements76-300 mm diameter wafer rangeOptional wafer measurement ringsWafer stops for exact centeringEthernet interfaceFull remote control software (Windows compatible)Optional calibration wafers
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Slip Line Detection System
YIS 200
The YIS and SF Series metrology systems are designed for optical detection of wafer defects such as crystaldislocations, slip and other defects. The YIS-300HM (for 300 mm wafers) and YIS-200HM (for 200 mm wafers) utilizeMakyoh optics technology (Magic Mirror) and integrated robotic wafer handler provided by Hologenix.
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Stylus Profilometers
Tencor™
KLA Instruments™ Alpha-Step®, Tencor P- and HRP®-series stylus profilometers deliver high-precision, 2D and 3D surface metrology, measuring step height, surface roughness, bow and stress with industry-leading stability and reliability for your R&D and production requirements.
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Warpage Metrology System
TableTop Shadow Moiré (TTSM)
Measure warpage of substrates up to 300mm x 310 mm (a 300mm wafer or two JEDEC trays) with the entire measurement taking less than two seconds. Whether individual parts or a JEDEC tray of multiple parts, the TTSM provides an ultra-fast and highly accurate measurement at room temperature that is suited for tabletop use.
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Line-Scan USB3 Cameras
NECTA Series
NECTA cameras provide unrivaled scan speed and quick system integration.Ultra-fast acquisition rate, extremely reduced dimensions and rugged design make NECTA cameras suitable for the most demanding applications requiring automated visual inspection, industrial metrology, high performance sorting, spectrometry, and machine vision.
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Photonics Test Solutions
Chroma offers precision instruments such as laser drivers, photodetector monitoring, and temperature controllers. These lab class instruments are often intefrated into production solutions for wafer probe test, burn-in and device or module characterization with inspection, metrology, robotics, Industry 4.0 and more.
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Infrared Microscope
DDR200 & DDR300
The McBain DDR200 and DDR300 for 200mm and 300mm wafer defect detection and review are unmatched in value and features in this special application and price category. The systems offer significant and unique advantages for both production and engineering use, and provide an ideal solution when both defect detection and dimensional metrology are required.
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2D/3D Wafer Metrology System
7980
Chroma 7980 provides accurate and reliable profile information. 7980 adopts new BLiS technology and specially designed platform to achieve 2D/3D nanoscale measurement.
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Length Gauges
HEIDENHAIN length gauges deliver high accuracy, even over large measuring ranges. They are commonly used wherever fast, reliable, and accurate measurements are required, such as in production metrology, multi-gauging fixtures, measuring equipment monitoring, and position measurement.
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Surface Measurement Instrument
SMI
Redefining speed and accuracy in non-contact metrology, the Optikos SMI is a high-speed surface topography instrument that characterizes spherical, toric, and aspheric surfaces. The SMI measures surface shape deviations of precision surfaces using wavefront analysis technology. Configured to measure such items as: micro-optics, ball lenses, and contact lens molds, the instrument allows users to easily measure aspheric and toric parts without the need for reference surfaces.
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DC Current Shunts
DC current shunts / standards are true 4-terminal devices that precisely measure DC currents from 10 A to 10,000 A. They use special alloys in the resistive elements which are supported on an insulating base for mechanical stability. The 9230A includes special features to reduce the effects of power dissipation and associated self heating errors. These shunts are designed to operate in air at full rated current. These are the best performing, and most widely used, DC metrology shunts in the world.
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Slide Calipers
We recognize that reliable operation and dependable accuracy are essential to your quality and manufacturing operations. As part of our commitment to quality, we have established first generation NIST traceable documentation for all calibration artifacts and standards. Our metrology professionals are available to assist you with whatever you need to keep your system on the job.
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Micrometers
Is a device incorporating a calibrated screw widely used for accurate measurement of components in mechanical engineering and machining as well as most mechanical trades, along with other metrological instruments such as dial, vernier, and digital calipers.
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CT PT Tester
HTFA-107 / 340
Wuhan Huatian Electric Power Automation Co., Ltd.
Used for automatic testing of protective and metrological CT/PT.
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Optical Gaging Products
Quality Vision International Inc.
OGP® pioneered multisensor measurement with vision, touch probe and laser sensors. For over 75 years, OGP has consistently led with a succession of innovative systems and sensors to tackle the most difficult measurement challenges, especially as it pertains to the medical industry. Multisensor metrology is a preferred quality control technology for manufacturers to develop, maintain, and improve the quality of medical devices.
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3D Metrological Software
InnovMetric PolyWorks
Powerful metrological software which can effectively process vast amounts of data from 3D scanners in real time. Due to its modular architecture the software covers a large number of applications: one-point inspection by touch measurement systems, scanned data processing and data comparison to CAD models or complete reverse engineering – CAD model creation.
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Current Transformers
Excellent measurement technology requires high-quality current transformers. The product portfolio comprises a wide range of current transformers for load currents (operating currents) and residual currents (RCM). Different designs cover a variety of installation situations and metrological requirements, and enable retrofitting. AC/DC sensitive measuring current transformers use a special measurement method to detect both AC and DC currents of different frequencies.
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Solar Photovoltaic
Scientific Computing International
Automated metrology system designed for rapid, reliable, and accurate characterization of nearly any unpatterned thin film.
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PANELMAP
PANELMAP is a software package used to collect, edit, analyze and visualize measured physical parameters on rectangular semiconductor panels. PANELMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
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Software
Measuring, evaluation and management software enables you to increase the performance of all your metrology operations.
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Benchtop Metrology Solution
FilmTek 2000 PAR-SE
Scientific Computing International
Our most advanced benchtop metrology solution, engineered to meet the needs of nearly any advanced thin film measurement application, from R&D to production. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to deliver the highest accuracy, precision, and versatility in the industry. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
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Substrate Manufacturing
KLA’s substrate manufacturing portfolio includes defect inspection and review, metrology and data management systems that help substrate manufacturers manage quality throughout the wafer fabrication process. Specialized wafer inspection and review tools assess wafer surface quality and detect, count and bin defects during production and as a critical part of outgoing wafer qualification. Wafer geometry systems ensure the wafer shape is extremely flat and uniform in thickness, with precisely controlled wafer shape topography. Data analysis and management systems proactively identify substrate fabrication process excursions that can lead to yield loss. KLA’s substrate manufacturing systems support process development, production monitoring and final quality check of a broad range of substrate types and sizes including silicon, prime silicon, SOI, sapphire, glass, GaAs, SiC, GaN, InP, GaSb, Ge, LiTaO3, LiNBO3, and epitaxial wafers.
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Optical Thin-Film Metrology for Advanced Thin Films
FilmTek 6000 PAR-SE
Scientific Computing International
Production-proven metrology system for film thickness, refractive index and stress measurement for a broad range of film layers at the 1x nm design node and beyond. Accommodates 200 or 300 mm wafer metrology. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to meet the challenging demands associated with multi-patterning and other leading-edge device fabrication techniques.
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Xytronic Single-Phase Reference Standard +/- 0.04%, +/- 0.02%, +/- 0.01%
RADIAN RX-20, RX-21 and RX-23
Radian Research is committed to providing our customers with leading innovative and technologically superior products, while maintaining metrology capability in power and energy measurement that is surpassed by none. Our engineers drew on the expertise and knowledge we acquired for our industry-leading legacy RM (Metronic) and RD (Dytronic) reference standards to develop the RX (Xytronic), the ultimate in power and energy measurement technology perfection.
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White Light Continuum Generator
JIBE
A powerful coherent light source. Due to its amazing wide spectral band, the white light continuum is being applied in different areas such as optical parametric amplification, optical metrology, optical coherence tomography, materials characterization, etc.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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CMOS Dual USB3 Cameras
CELERA
CELERA CMOS Dual USB3 cameras provides unrivaled speed, extreme flexibility and quick system integration. Its double USB3 interface, ultra-fast acquisition rate, extremely reduced dimensions and rugged design make CELERA cameras suitable far the most demanding applications: automated optical inspection, high performance sorting systems, industrial metrology, microscopy, medical diagnostics and machine vision. CELERA cameras are powered directly by the USB3 bus eliminating the need for external power adapters. USB3 provides the most cost effective and widespread interface, pushing speed performances at the top.
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PHOTO-2000m M-LUX Meter
Hangzhou Everfine Photo-E-Info Co., LTD
Designed for low illuminance testing above 10-4 lx. The standard CLASS A photometric detector with pre-amplification is adopted, which greatly improves the output signal quality of the detector. At the same time, the industry's advanced level of m-lux detection technology, better stability, suitable for darkroom, photo photocopying room, metering laboratory, physics laboratory, metrology laboratory and other related scientific research, engineering, product inspection and other occasions.
