MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
Industrial Absolute Pressure Transducers
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These industrial Baratron® capacitance manometers feature absolute pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Product
Chemical Downstream Plasma Source
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The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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Product
Residual Gas Analyzers
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Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Product
Atmospheric Pressure Gas Analyzers
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The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Product
Microwave Plasma Subsystems
AX2600 And AX2700
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The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Product
General Performance Absolute Pressure Switches
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These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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Product
High Performance Baratron® Absolute Pressure Transducers
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These high performance Baratron® capacitance manometers operate at ambient temperature. They are referenced to vacuum for gas independent, direct measurement of absolute pressure.
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Product
DELTA™ IV 4-zone Flow Ratio Controller
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DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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Product
Compact Networked I/O
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We offer networked I/O devices based on Ethernet, DeviceNet™, and Profibus for industrial control and automation applications.
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Product
Precisive® 5 Application Specific Gas Analyzers
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The Precisive® Gas Analyzer is a real-time gas analyzer based on MKS' unique Tunable Filter Spectroscopy (TFS™) platform. The Precisive suite of products are calibrated for the measurement of a wide range of gases across multiple process industries. The real-time, continuous measurement capability provides immediate analysis ensuring control of critical process parameters.
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Product
Process And Chamber Monitoring Software & Systems
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MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
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Product
Compact Ultrafast 50-50,000 sccm Mass Flow Controller/Meter
C-Series
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The C-Series Mass Flow Controller (MFC) is a compact, fast-response model using a Micro-Electro-Mechanical Systems (MEMS) based flow sensor for non-corrosive gas applications. It is available in Full Scale flow rates from 50 sccm to 50 slm (N2 equivalent) with a control range from as low as 0.1% of Full Scale up to 100% of Full Scale and is also available as a flow meter. Analog (0 to 5 VDC) or digital (RS485 or Modbus TCP/IP) communications interfaces are available. Required power supply voltage is 24 VDC nominal.
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Product
Stand-alone Ozone Delivery System For Advanced Processes
SEMOZON® AX8585
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SEMOZON® AX8585 stand-alone ozone gas delivery system is designed around the AX8410 PRIME ozone generator to provide high flow, high concentration, ultra clean ozone generation and delivery. This fully configurable product line is designed to meet the ever changing needs of the semiconductor industry. Each SEMOZON AX8585 is a fully integrated, high output ozone gas delivery system intended for use in an increasing number of semiconductor process applications such as ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, and oxide growth.
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Product
Vapor Source Mass Flow Controller With Viscous Laminar Flow
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The 1152C Vapor Source Mass Flow Controller is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas. The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control.
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Product
High Performance Mass Flow Controllers
P-Series
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P-Series High Performance Multi-gas, Multi-range, Thermal Mass Flow Controllers are designed for the most critical process applications where accuracy, repeatability as well as pressure insensitivity are requirements.


















