MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
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Product
MultiGas™ TFS™ Gas Monitor For Multi-Compound Gas Analysis
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The MultiGas™ TFS™ Monitor is an online, multi-compound, trace gas monitoring system in a stand-alone 19-inch rack enclosure. It uses an innovative tunable filter spectroscopy technology enabling high selectivity and stability measurement. Low detection limit (sub-ppm levels for most gases) is achieved through the use of high throughput optics coupled with a long-path gas cell and a high sensitivity detector.
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Product
Tunable Filter Spectrometers
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MKS Instruments' platform of innovative optical analyzers based on Tunable Filter Spectroscopy (TFS™) provides real-time gas analysis, while delivering customers a substantially lower total cost of ownership. TFS™ can be utilized from UV (Ultra-Violet) through IR (Infra-Red) spectral regions. MKS TFS™ sensor platforms have been on the market since 2008 with more than 2500 systems deployed.
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Product
IP66 Rated Mass Flow Controllers
I-Series
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I-Series Thermal Mass Flow Controllers are designed specifically for mass flow controller applications in harsh environments to protect against water and dust. The IP66-rated enclosure for I-Series Mass Flow Controllers protect it from direct water spray as well as dusty environments.
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Product
DELTA™ IV 4-zone Flow Ratio Controller
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DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control. It is available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution.
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Product
High Performance Pressure Transducers
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Repeatably Accurate Pressure Measurement. Our high performance Baratron® capacitance manometers measure gas independent, absolute pressure at high accuracy and with high repeatability. Accuracy is specified as a percentage of the reading for an accurate output signal even at the low end of the scale.
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Product
Programmable Industrial PC
HyperPAC
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The HyperPAC Industrial PC programmable control solution delivers top of the line performance with reliable operation for a variety of control and automation tasks. Compared to standard IPCs, the HyperPAC provides a highly compact, fanless solution, with existing expandable IO via PCIe, along with flexibility to expand and configure the system. The HyperPAC is a flexible, scalable solution for numerous applications and project requirements which enables IIoT (Industrial Internet of Things) integration.
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Product
Dissolved Ammonia Delivery System
DI-NH3
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MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
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Product
Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Product
High Performance Heated Absolute Pressure Transducers
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These high performance Baratron® capacitance manometers have the sensor located in a temperature controlled constant temperature oven for improved accuracy. They are available with an analog output or digital communications for measuring absolute pressure.
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Product
Atmospheric Pressure Gas Analyzers
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The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Product
AA06A Baratron® Absolute Pressure Sensor
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AA06A Baratron® absolute pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Product
Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Product
Industrial Differential Pressure Transducers
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These industrial Baratron® capacitance manometers feature differential pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.
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Product
Fully Integrated Modular Ozone Delivery System
SEMOZON® AX8580
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The SEMOZON® AX8580 Ozone Delivery System generates and delivers high flow, high concentration, ultra-clean ozone for advanced thin film applications. The SEMOZON AX8580 is specifically designed for use with an increasing number of semiconductor process applications such as ALD, CVD and TEOS/Ozone CVD.
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.


















