Plasma
An ionized gas used for flat panel displays.
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UV Plasma Sources
UVS300|UVS 10/35
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The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Product
Remote Plasma Source
MAXstream
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Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Product
Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Tailor-Made to Simulate Low-Temperature Plasma Sources and Systems
Plasma Module
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The Plasma Module is tailor-made to model and simulate low-temperature plasma sources and systems. Engineers and scientists use it to gain insight into the physics of discharges and gauge the performance of existing or potential designs. The module can perform analysis in all space dimensions 1D, 2D, and 3D. Plasma systems are, by their very nature, complicated systems with a high degree of nonlinearity. Small changes to the electrical input or plasma chemistry can result in significant changes in the discharge characteristics.
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Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Product
High Power Microwave Plasma Source
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The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
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Product
GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Accessories for Trace Impurity, Plasma Detection and Online Trace Impurity Detectors
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Our accessories are tailored to optimise and retain gas purity at every step of the gas sample stage in order to ensure the best performance for trace impurity measurements at the ppb level.
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Plasma Processing Systems
PlasmaSTAR
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The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept. Starting with a universal base unit, multiple electrode modules are available for easy insertion into the base unit. You will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma.
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KEINOS™ 2 MHz 5 KW, 11 KW & 13 KW RF Plasma Generators
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The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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High Power Microwave Plasma System
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The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Product
Plasma Profiling TOFMS
PP-TOFMS
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Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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High Resolution Wavefront Sensor
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Phasics wavefront sensor applies to laser beam measurement, wavefront correction through an adaptive optics loop, laser optics testing and plasma density measurement. Thus the single instrument offers true versatility to engineers and researchers in laser facility.
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Product
Noise Location Package
Type HFDF
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National RF’s Type HFDF high frequency location system is a proven noise hunting and location directional antenna system that allows you, in many cases, to walk right up to the source of High Frequency (HF) noise! Used by several power companies around the United States, professional noise hunters, and other communications specialists, the HFDF has located noise sources that emanated from pole power transformers, arcing electric fences, CATV in-line amplifiers, plasma TV screens, and even Marijuana grower’s heating lamps! The system incorporates several plug-in, tunable magnetic loop sensors of a proprietary National RF design, that cover the frequency range between 1.8 MHz and 55 MHz. The unit is packaged in a hand-held, lightweight metallic enclosure, with a pistol grip and a magnetic compass mounted on top. The compass is used to get magnetic bearings to the noise source, which may be plotted on a map to triangulate, and ultimately pin-point, the location of the noise source. In certain cases, our customers tell us that they have been able to walk right up to the interfering noise source and correct the situation on the spot!
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Remote Plasma Source
Xstream
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The highly efficient Xstream® RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.
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Product
Test Patterns
DisplayMate Multimedia Edition
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DisplayMate Technologies Corporation
DisplayMate Multimedia Edition is the most advanced and powerful version of DisplayMate ever, with lots of proprietary and highly innovative suites of test patterns for setting up, tuning-up, calibrating, testing, evaluating, diagnosing, and analyzing CRTs, analog and digital LCD, Plasma, DLP, LCoS, and SXRD monitors and projectors, microdisplays, video boards, color printers, TVs and HDTVs, NTSC/PAL Television encoders and decoders, and more.
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Product
Standard CW Amplifiers
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The BT-AlphaA-CW series is a range of classAB RF power amplifiers covering the 10kHz to1MHz frequency range. Rugged, solid-state design - high reliability. Extremely high phase and amplitude stability. High linearity. In-Built Protection. Very fast blanking. Capable of pulsed operation. Competitively priced. Suitable for CW radar, communications, HF/VHF jamming, particle accelerator applications/plasma systems, plasma, RF heating and other scientific applications.
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Product
Ideal Remote Plasma Source For Oxygen-Based Processes
Rapid OX
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Reduce recombination effects and extend the lifetime of oxygen radicals thanks to Rapid OX's removable quartz liner. When compared to anodized chambers, the resultant reactive species extended lifetime improves photoresist strip rates. And because the quartz liner is easily installed or removed by the operator, it decreases downtime and significantly lowers replacement costs.
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Empowering Traditional Mass Spec
ZipChip
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The ZipChip™ separations platform uses integrated microfluidic technology to prepare, separate and electrospray biological samples directly into traditional mass spectrometers (MS). In less than 3 minutes per sample, the cost-effective ZipChip system enables analysis of a broad range of matrices from growth media to cell lysates, blood, plasma, urine, and biopharma products. Each chip provides answers on analytes from small molecules up to intact proteins, antibodies and antibody drug conjugates (ADCs). This platform provides better separation quality than most liquid chromatography (LC) instruments – in a fraction of the time – all with full MS identification behind every separations peak.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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High-Power Density
Apex
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The versatile Apex® family of RF generators and power-delivery systems showcases a compact, modular design suitable for chamber mounting. Utilizing sophisticated RF-conversion technology, Apex RF generators and power-delivery systems offer enhanced product and process reliability. High-density power capabilities make them ideal for advanced plasma processes. And various communications models and configurable features allow you to customize your platform and explore integration approaches. No custom generator lead times are necessary.
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Microwave Plasma Atomic Emission Spectroscopy / MP-AES Systems
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Agilent’s industry-leading microwave plasma-atomic emission spectrometer (MP-AES) systems are powerful, cost-efficient and easy-to-use for a wide range of applications from routine analysis to complex precious metals analysis. By running on air, Agilent MP-AES systems both cost less and are safer than alternative methods that rely on flammable gases. The innovative Agilent 4210 MP-AES system offers higher sensitivity and faster throughput capabilities than flame atomic absorption.
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Interferometers and Reflectometers for Plasma Diagnostics up to 170 GHz
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Elva-1 supplies different solutions for measurement density and temperature profiles of plasma. Our systems are installed practically on all TOKAMAKs over the World.
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Optical Emission Spectrometry
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Involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
