Plasma
An ionized gas used for flat panel displays.
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Remote Plasma Source
MAXstream
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Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Microwave Plasma Subsystems
AX2600 And AX2700
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The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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UV Plasma Sources
UVS300|UVS 10/35
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The UVS300 and UVS 10/35 are UV Plasma sources with high intensity, working with different gases.
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Thin Films, Plasma and Surface Engineering
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A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
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RF Plasma Generators
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Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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Interferometers and Reflectometers for Plasma Diagnostics up to 170 GHz
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Elva-1 supplies different solutions for measurement density and temperature profiles of plasma. Our systems are installed practically on all TOKAMAKs over the World.
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Product
Remote Plasma Sources
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Equip your manufacturing and abatement processes with high functionality and exceptional reliability. Customize your chemistry. Expand your operating range. Deliver higher process rates. Advanced Energy’s remote plasma sources offer sophisticated options in streamlined designs.
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13.56 MHz 1250, 2500 and 5000 Watt High-Reliability RF Plasma Generators
GHW Series
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.
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RF Plasma Power Systems
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These are ideal solutions for plasma apps like etching, cleaning, deposition and more
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Remote Plasma Sources For Process Applications
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MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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Product
High Power Microwave Plasma System
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The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Product
Digital Dairy Refractometer, Colostrum and Blood Plasma Protein
DD-2
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The DD-2 Digital-Dairy Refractometer will provide reliable estimates of the percent solids in waste milk and colostrum quality using the Brix Method, and a blood serum total protein concentration scale can be used to assess failure of passive transfer. The MISCO Digital-Dairy™ refractometers are specifically designed to help professional dairy farmers and calf ranchers to rear healthy calves. They are rugged enough to withstand the demands of farm use, yet precise enough to give laboratory-quality readings.
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Product
Paragon® 8.0 Slm NF3 Flow Intelligent Remote Plasma Source
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For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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Transformers
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RR Enterprises provides all type of transformersSingle Phase and Three Phase upto 100 KVA.The transformers can be→ Air Cooled→ Epoxy Cast→ Oil CooledWe provide transformers in high voltage and low voltage. These are used for various industrial and research purposes.→ High voltage transformers for corona and static elimination.→ High voltage transformers for plasma welding.→ Special purpose high voltage transformers.→ High current transformers for metalissing plants.→ Special purpose high current transformers.
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Standard CW Amplifiers
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The BT-AlphaA-CW series is a range of classAB RF power amplifiers covering the 10kHz to1MHz frequency range. Rugged, solid-state design - high reliability. Extremely high phase and amplitude stability. High linearity. In-Built Protection. Very fast blanking. Capable of pulsed operation. Competitively priced. Suitable for CW radar, communications, HF/VHF jamming, particle accelerator applications/plasma systems, plasma, RF heating and other scientific applications.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Monitor Holder for 19" Rack Installation
ZZ-0017-01
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- Monitor holder for 19 “rack installation- 9 U (400 mm)- Can be used universally with LED, LCD and plasma monitors- Compatible with the VESA standards 75 x 75 and 100 x 100 mm- Record in portrait and landscape format
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Neutrals, Radicals and Ions Analysis
HPR-60 MBMS
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The Hiden HPR-60 molecular beam mass spectrometer is a compact skimmer inlet MS for the analysis of atmospheric plasma and reactive gas phase intermediates.
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Plasma Emission Detectors for Gas Chromatographs
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Our patented Plasma Emission Detector is available for integration into any gas chromatography system or installation. It has been designed for ‘plug and play’ installation and to allow for analysis of impurities from PPB to % levels using either capillary or packed columns.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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High Resolution Wavefront Sensor
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Phasics wavefront sensor applies to laser beam measurement, wavefront correction through an adaptive optics loop, laser optics testing and plasma density measurement. Thus the single instrument offers true versatility to engineers and researchers in laser facility.
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*High Intensity Systems
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Unique laser systems for extreme applications:*OPCPA*Plasma physics*Laser shock peening
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Optical Emission Spectrometry
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Involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
