Deposition
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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NR01 net radiometer
Hukseflux Thermal Sensors B.V.
NR01 is a market leading 4-component net radiation sensor, mostly used in scientific-grade energy balance and surface flux studies. It offers 4 separate measurements of solar and longwave radiation, facing both up and down. NR01 owes its popularity to its excellent price / performance ratio and major improvements relative to comparable instruments. These advantages include weight, ease of levelling, solar offsets in the longwave measurement and pyrgeometer heating, reducing measurement errors caused by dew deposition.
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kSA BandiT
The kSA BandiT is a non-contact, non-invasive, real-time, absolute wafer and thin-film temperature monitor used during thin-film deposition and thermal processing.
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Duct Deposit Measuring System
The Elcometer 456 Duct Deposit Measuring System has been specifically designed to meet the requirements of the DTT (Deposit Thickness Test) in HVCA’s (Heating & Ventilation Contractor’s Association) Guide to Good Practice, for the measurement of dust and grease deposits within ventilation systems and kitchen ducts made of ferrous metals.
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Trace Moisture Analyzer
Model 8800P
Teledyne Analytical Instruments
The 8800 series uses field proven aluminum oxide (Al2O3) sensing technology to accurately detect trace moisture on either a continuous or spot checking basis. All Al2O3 sensors share the same basic operating principle: the capacitance measured between the sensor’s aluminum core and gold film deposited on the oxide layer varies with the water content. The 8800 series moisture sensor employs unique Hyper Thin Film (HTF) technology, which offers three major structural improvements in Al2O3 sensor design. These structural changes, noted below, provide the user with increased sensitivity, greater stability and a quicker response time when compared to other conventional aluminum oxide sensors on the market today.
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Metrology System
Aspect
Memory density increases with both layer-pair scaling and tier stacking for memory stacks well over 200 pairs. The Aspect metrology system was designed with these future architectures and scaling strategies in mind. Aspect metrology is demonstrating performance superior to X-ray systems across multiple customer devices through a revolutionary infrared optical system providing full profiling capability to enable critical etch and deposition control, with the speed and process coverage that customers require.
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Conductivity Electrode
As current-carrying and potential difference measuring electrodes, platinum was deposited on a quartz glass substrate. Voltage terminal distance can be varied by changing the connection pin. In-situ measurement of the metal transition produced in a conductive polymer insulator doping, 4 terminal electrode is used, where for insulator layer with low doping side 2 terminal method and for metal layer with high doping side 4 terminal method is used for the measurement. With this electrode, become possible to have measurement in 15 distances by combining the connection terminal.
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ITO (Indium Tin Oxide) Electrode
This quite unique material transmits only visible light whereas it does not transmit UV radiation. Our ITO electrodes consist of 100 nm thick of ITO layer deposited on quartz or borosilicate glass substrate (0.5 mm thick).
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ALD Applications
Atomic Layer Deposition (ALD) has the potential to optimize product design across a wide array of applications from making silicon chips run faster, to increasing the efficiency of solar panels, to improving the safety of medical implants.
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Long Term Test Kit
When long term electro-chemical tests (>1000 hours) are run to monitor the cell degradation at the cathode for example, it is important to avoid any contaminant in the gas flow rate.Inconel 601 flange equipped with alumina housing and alumina tube to feed the gas to the electrode during long term test (>1000 h)Typical poisoning is coming from the chromium contained in the steel tubing. The volatile chromium species (Cr6+) will flow into the cathode (with the air) and thanks to the intake of electrons at the electrode, the chromium ion will transform to chromium oxide and be deposited at the cathode triple point. In such a case, the long term test kit is used. The Inconel 601 flange is equipped with an alumina housing (>96 % Al2O3) and the air (or other gas) is led through an alumina tube. The long term test kit is fully compatible with other functionalities proposed with the Open Flanges™ test Set-Up as the integrated steamer or the small pellet test kit. The long term test kit can be implemented on the fuel, on the air or on both sides.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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ALD Periodic Table
The ALD Periodic Table is a visual guide to the elemental building blocks of atomic layer deposition. Organized by both chemistry and purpose, it helps engineers quickly find materials that meet their priorities, whether that’s conductivity, durability, clarity or thermal stability.
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Scintillation Counter
G-Explorer/Geo-Explorer
Highly sensitive, reliable and innovative radiation measurement technology. Explore and discover radioactive radiation in the environment with reliable accuracy! Use the graphical data preparation to find underground mineral deposits, such as water, caves and geological disturbances, even on large areas.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Copper PCB
The Amitron process is capable of producing 20 plus ounces of finished copper and reliably spray coat a protective and consistent solder mask with imaged nomenclature. Amitron utilizes a unique process referred to as "Laminated Deposition". This combination of processes allows extreme copper thickness requirements to become very practical and cost effective. The process utilizes heavy base copper that when placed in our plating and etching systems will deliver consistent and reliable high power circuits.
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Dimensional Metrology
Stand-Alone Metrology Family
Nova’s stand-alone metrology platforms are utilized to characterize critical dimensions such as width, shape and profile with high precision and accuracy and are used in multiple areas of the fab such as photolithography, etch, CMP and deposition in the most advanced technology nodes, across all semiconductor leading customers.
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In-Situ Spectroscopic Ellipsometer for Real-Time Thin Film Monitoring
UVISEL Plus In-Situ
The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
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ALD Research
Veeco’s ALD Research page is a hub for the latest thinking in atomic layer deposition. It brings together experimental data, modeling insights and collaborative breakthroughs that help engineers stay ahead of the curve. Whether exploring new chemistries or solving complex process challenges, this resource is designed to inform, inspire and accelerate thin-film innovation.
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Custom Sensing And Imaging Solutions
Micro Magnetics has a proven track record of excellence in designing and developing new products and solutions based on our knowledge of magnetic devices and materials. We offer specialized solutions to meet our customers? unique needs. These solutions include single magnetic sensors, sensor arrays, custom electronics and packaging solutions, sensor processing (polishing, dicing, and lapping), and custom film and device deposition.
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Ozone Generators & Systems
MKS offers a wide range of ozone generators and modular delivery systems which produce ultra-pure, reliable ozone gas. In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases resulting in the creation of Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE). MKS’ generator uses Grade 6 gas, enabling the creation of higher film density improving product yield. Photovoltaic and Display manufacturing leverage semiconductor best practices and utilize ozone to create enhanced thin film barriers, improving product performance and reliability.
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PED Systems
Pulsed Electron Deposition
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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Excitation Sources
SPECS Surface Nano Analysis GmbH
o our customers in research and industry we offer a variety of sources for deposition, excitation and charge neutralization as well as analyzers and monochromators. Most of our sources originate from product lines which we have taken over from Leybold AG, Cologne, and from VSI GmbH. The X-ray monochromator Focus 500 and the UV monochromator TMM 302 are original developments by SPECS.
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Automated Stand for Magnetic Luminescent Control of Railway Wheels
The amount of information processed and time constraints required the creation of a multi-level distributed image processing system based on National Instruments Compact Vision System controllers, industrial computers and workstations. During the control process, the wheel is watered with a magnetic-luminescent emulsion, magnetized and exposed to ultraviolet radiation. As a result, the emulsion deposited on the defects glows in the visible range (yellow-green light). Eleven FireWire (IEEE 1394) color cameras with a resolution of 1280 x 1024 are used to scan the wheel surface. In one iteration, they completely cover a 20-degree sector of the wheel.
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Surface Quality Monitors
PET manufactures and markets non-destructive, non-contact surface contamination and thin film detection models and automated systems (surface quality monitoring system) capable of detecting thin layer contamination, thin films and coating down to the Angstrom level. These systems represent a major breakthrough by providing, for the first time, a quantitative measure of surface cleanliness. As surface cleanliness verification instruments, in a part cleaning environment, these products are capable of validating the cleaning quality of all the part cleaning equipment available in the market. Any of SQM model series is capable of verifying metal contamination; monitoring absence/presence of organic and/or inorganic on virtually on surfaces of all metals. They are, price/performance, the most sufficient product available for testing surface of metals for surface cleanliness. These systems operate in an ambient environment, require no sample preparation or deposit of any agents on the surface. In any parts cleaning environment where the quality and efficiency of part cleaning equipment for removal of surface contamination is highly desired, these systems provide a scientific solution by quantitatively measuring the surface cleanliness. The SQM series has the sensitivity and operational simplicity required to provide fast and cost effective surface evaluation for all metals.
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X-Ray Detector
XRT Detector Onyx
ONYX 1412-X is a performance-leading X-ray detector comprising a proprietary 2768 × 2376 active pixel sensor array of 50 × 50 µm pixels. This detector consists of a high-speed, low-noise, radiation-tolerant, 14 × 12 cm, 6.6M pixel CMOS image sensor, with a directly deposited high-resolution CsI scintillator on Fibre Optic Plate. The highly configurable sensor is accessed through a software interface, connected via a 10 GbE SFP+ hardware interface.
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ALD Knowledge Center
As one of the first companies to market with a flexible commercially available atomic layer deposition system (ALD), we have a tremendous ALD Knowledge Center for researchers to draw upon. We have gathered together a wide range of information about ALD applications and thin films technology. This includes images and explanations of the exciting uses for ALD. We also gather and provide access to theses on the subject and a searchable database of scientific abstracts.
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Spectrometer
AirSPEC
Baltic Scientific Instruments, Ltd
Scintillation gamma-ray spectrometer AirSPEC is intended for measuring scintillation spectra and alsofor determination of activities and specific activities of radionuclides in samples and in conditions of natural occurrence in geometries 2 and 4.Spectrometercan be usedfor various tasksradiation monitoring, including the definition ofspecific effective activity of naturally occurring radionuclides (NORM) in building materials (granite,crushed stone, gravel, etc.), raw materials, products, waste industrial productionand rockswithoutsampling; measurements surface activity of the radionuclide 137Cs (and other); mass fraction of NORM in rocks andoresin the conditions oftheirnatural occurrence on a surface, inboreholes and in warehouses andtransportcontainers, and also in study ofsurface contaminationof soil,as well asprospecting and exploration ofmineral deposits resources.The spectrometercan be used forworkin the laboratoryand in the field conditions.
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Digital mammography system
AMULET
The new format FPD has a proprietary panel structure with a double layer of amorphous selenium that has high X-ray absorption properties, and was developed by combining Fujifilm''s "Device Development Technology" and "Vacuum Deposition Technology." The first layer efficiently converts X-rays into electrical signals, while the second layer employs the unique "Direct Optical Switching Technology," that captures higher resolution and lower noise image electrical signals rather than using electrical switches such as conventional TFTs. By achieving both "50µm fine pixel size (higher resolution) and low noise," the AMULET system can show microcalcifications and tumors in greater detail, both significant indicators for early diagnosis of breast cancer.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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ALD For Manufacturing And Production
Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
