Showing results: 1 - 14 of 14 items found.
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k-Space Associates, Inc.
For industrial applications, k-Space is known for its ability to provide robust data and analysis for in-line solutions in production environments. k-Space works side by side with the customer to understand their specific measurement and inspection needs, and then develops a custom solution to meet the identified requirements. Our solution includes custom measurement technology, software, database generation and integration, go/no go determination, pick and place, alarm status, and PLC communication.
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k-Space Associates, Inc.
The kSA 400 puts the power of Reflection High-Energy Electron Diffraction (RHEED) at your fingertips. Whether analyzing a static diffraction pattern, or acquiring data during high-speed substrate rotation, the kSA 400 helps you exploit the valuable wealth of information contained within the RHEED pattern.
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k-Space Associates, Inc.
The kSA Atomic Control for Epitaxy (ACE) metrology tool is a highly sensitive instrument that measures the in situ flux rate of atomic species using the principle of atomic absorption spectroscopy.
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k-Space Associates, Inc.
The kSA BandiT is a non-contact, non-invasive, real-time, absolute wafer and thin-film temperature monitor used during thin-film deposition and thermal processing.
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k-Space Associates, Inc.
The kSA Emissometer is designed to quickly and easily generate high-resolution diffuse and specular reflectance and total emissivity maps of MOCVD carriers. Carrier emissivity variation means temperature non-uniformity, which can lead to reduced device yield and possibly complete growth run failure. With the kSA Emissometer, emissivity changes can be tracked to determine carrier end-of-life, without wasting growth runs. The kSA Emissometer also detects unwanted residual deposits after baking, and easily identifies carrier surface defects, scratches, microcracks and pits that are not visible to the eye.
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k-Space Associates, Inc.
The k-Space Integrated Control for Epitaxy system (ICE) is a modular in situ metrology tool designed for today’s MOCVD and MBE reactors. It combines kSA MOS, kSA BandiT and kSA RateRat Pro patented technologies along with an Emissivity Corrected Pyrometry (ECPR) module. The kSA ICE modular design allows the user to specify which modules will be used in their kSA ICE configuration.
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k-Space Associates, Inc.
Measure and provide feedback for curvature, stress, reflectivity and growth rate to improve production processes and increase profitability with the kSA MOS.
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k-Space Associates, Inc.
The kSA MOS UltraScan and kSA MOS ThermalScan systems are ex situ, flexible, high-resolution scanning curvature, bow, and tilt-measurement systems.
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k-Space Associates, Inc.
For use on Veeco K465i and EPIK700 MOCVD reactors, the kSA Scanning Pyro performs automated temperature mapping in order to measure temperature variations across wafer carriers and wafers. Use it to tune heater zones and optimize process and hardware to achieve higher yields, wafer uniformity and device performance.
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k-Space Associates, Inc.
The kSA SpectR is a complete metrology solution for measurement of absolute spectral reflectance, growth rate and end point detection. Custom spectral features such as reflectance minima, maxima, inflection points, or baseline scatter level, over a user defined wavelength range of interest, are easily measured.
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k-Space Associates, Inc.
The kSA SpectraTemp is an easy to use, non-contact, optically-based temperature measurement and calibration tool that measures absolute temperature.
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k-Space Associates, Inc.
Harness the power of this patented technology to improve your process control. Measure and control uniformity, thickness, band gap, temperature, surface roughness and more.
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k-Space Associates, Inc.
From triggering to RHEED accessories, there are options to make your system work better for you. Explore the benefits of triggering options based on rotation position, rotation stage or pulse as well as RHEED screens and beam alignment substrates.
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k-Space Associates, Inc.
kSA RateRat Pro is a compact, convenient and easy-to-use optical metrology tool for thin-film characterization. Its unique capability is to measure, in situ and in real-time, optical constants (n and k), deposition rate and film thickness.