Thin Film
layer of material ranging < a nanometer to > a micrometer in thickness.
See Also: Film, Ellipsometers
-
-
Product
3-Axis Non-Robotic Automated Testing System
AT3
Test Instrument
The Instron AT3 is a space-efficient, highly adaptable 3-axis mechanical testing platform designed for automated execution of tensile, compression, flexural, and lap shear tests. Built to comply with a broad spectrum of ASTM and ISO standards, it’s well-suited for evaluating materials such as plastics, elastomers, thin films, foils, and metals. The system streamlines the entire testing workflow from specimen measurement and handling to strain measurement and specimen disposal—enabling users to load up to 160 samples and let the AT3 take care of the rest. Boost productivity, reduce manual intervention, and achieve consistent, dependable results with every test cycle.
-
Product
ALD Knowledge Center
-
As one of the first companies to market with a flexible commercially available atomic layer deposition system (ALD), we have a tremendous ALD Knowledge Center for researchers to draw upon. We have gathered together a wide range of information about ALD applications and thin films technology. This includes images and explanations of the exciting uses for ALD. We also gather and provide access to theses on the subject and a searchable database of scientific abstracts.
-
Product
Micro-spot Spectroscopic Reflectometry
FilmTek 2000M
-
Scientific Computing International
Micro-spot size benchtop metrology system engineered for unparalleled versatility and high performance, meeting the needs of patterned film applications requiring a very small spot size. Allows for measurement spot sizes as small as 2µm, and delivers reliable measurement of both thin and thick films.
-
Product
Spectroscopic Ellipsometer
PH-SE
-
The spectroscopic ellipsometer is used for thin film and material characterization in R & D. The spectroscopic ellipsometer is designed to meet the requirements in modern research with special emphasis on speed and accuracy for an unmatched variety of applications.
-
Product
Remote Plasma Sources
-
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
-
Product
Thin Film Chip Resistors, High Reliability Type
-
Panasonic Industrial Devices Sales Company of America
An AEC-Q200 Compliant SeriesPanasonic components specified as AEC-Q200 Compliant are consistently designed into automotive systems. However, today’s Design Engineers are specifying AEC-Q200 components to meet the high-quality standards of devices beyond automotive applications.
-
Product
1550/1310~1490nm Wavelength Division Multiplexer
PON-WDM-1543
-
Hangzhou Huatai Optic Tech. Co., Ltd.
PON-WDM-1543 WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to FTTx PON network to achieve the combination and separation of the 1550nm (CATV) and 1310/1490nm (data).
-
Product
Multi-Test Resistivity Measurement System
-
Sheet resistance mapping of thin films with a collinear 4-point probe, Temperature co-efficient of resistance (TCR) of thin films with collinear 4-point probe, Precision temperature co-efficient of resistance (TCR) with 2-point Kelvin probes and precision surface temperature probe, resistor testing with 2-point Kelvin probes,Precision resistor testing with a Kelvin probe card, temperature co-efficient of resistance resistor test (TCR), and Standard TCR test of multiple resistors with Kelvin probes or a probe card.
-
Product
Reflection/Transmission Spectrophotometry
FilmTek 3000 PAR-SE
-
Scientific Computing International
Engineered to meet the needs of any advanced thin film measurement application, excelling at material characterization on both transparent and non-transparent substrates. Combines spectroscopic ellipsometry, DUV multi-angle polarized reflectometry, and transmission measurement with a wide spectral range to meet the most challenging of measurement demands in both R&D and production. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
-
Product
Large Area Mapping Spectroscopic Ellipsometers for Flat Panel Display and Photovoltaic Industries
-
HORIBA Scientific’s large area spectroscopic ellipsometers are designed to provide thin film control solutions in flat panel display and photovoltaic manufacturing.A large mapping system allows thin film measurements at every location on the panel. Our large area spectroscopic ellipsometers are driven by our DeltaPsi2 software platform, which provides reliable recipes for routine thin film measurements. Automatic recipes fully automate measurement+modelling+mapping+results. Automatic reporting, data reprocessing, import/export package are some of the many functionalities of DeltaPsi2.
-
Product
Thin-film deposition
Plasma Source
-
SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
-
Product
PED Systems
Pulsed Electron Deposition
-
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
-
Product
C-Band Red/Blue-Band Pass MWDM
WD1515/R, WD1515/B
-
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1515/R, WD1515/B is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to the combination and separation of C-Band, Red-Band (1547~1563nm) and Blue-Band (1528~1543nm).
-
Product
Ozone Gas Delivery Systems
-
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
-
Product
Resistive Components
-
Diamond is the best thermal conductor on earth. Combined with a low dielectric constant, it is an excellent RF dielectric material for high-frequency applications in which thermal performance is equally critical. By applying cutting-edge thin film process and extensive millimeter wave design experience, Smiths Interconnect has created a high-performance line of resistive components. The resulting products, our Diamond RF Resistives® resistors, terminations, and attenuators, are significantly reduced in size and unparalleled in average and peak power handling.
-
Product
Materials Metrology
-
Nova is a market leader for innovative thin film metrology and process control technologies. We develop highly sensitive in-line metrology solutions on high productivity platforms, thereby enabling critical metrology solutions to be closer to a semiconductor fab’s process and integration needs.Our technologies enable customers to accurately detect and quantify small variations in film composition and thickness, thereby influencing better device functionality, and improved manufacturing yield.
-
Product
3 Ports FWDM（980/1550,1480/1550nm）
-
Flyin optronics' Micro-Optics WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
-
Product
Gas and Vapor Delivery Systems
-
In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
-
Product
Ultra Thin Film Scratch Tester
CSR5100
-
The micro-scratch method (JIS R-3255), which is an evolution of the scratch method that evaluates the adhesion strength between the thin film formed on the material surface and the base material, enables the detection of peeling of thin films. detection, we have a highly sensitive destruction detection mechanism based on our own patented technology (Patent No. 5070146) to evaluate the adhesion strength of ultra-thin
-
Product
DC Power Source Systems
-
Looking for a proven, precise DC power source? Advanced Energy offers standard DC and pulsed-DC power-delivery options. Thanks to vast feature sets and reliable performance, our DC power generators are used in nearly every manufacturing market — semiconductor, flat panel, glass, thin film, etc. And via our global, dedicated support staff, we make sure you get the right DC power product for your processes and applications.
-
Product
Digital Pressure Gauges
-
Transcat has your pressure measurement needs covered with our full range of digital pressure gauges that are used in the shop, field, factory, off-shore platform and calibration lab. A digital gauge numerically displays absolute, differential and gage pressure readings. The instruments incorporate a variety of sensor types to indicate pressure changes, including mechanical deflection, thin film, strain gauge or piston. Our microprocessor-controlled gauges feature sophisticated sensors and are chosen according to media compatibility and operational environment. Choose your ideal gauges built by top makers, such as Crystal Engineering, Fluke and Druck, from our selection that reflects innovation.
-
Product
Resister
-
Our ARFC type Film Flat Chip Resistor & ARFCN type Thin Film Chip Resistor Network are high precision Metal Film resistors produced with high purity. Alumina Substrate and Ni-Cr-Si Resistor Film based on high precision Etching Technology. The electrode Terminals are made with Spattering Film and Nickel-Solder Plating, and solderability is very good in all Flow, Reflow and Dipping type soldering for Hybrid IC, SMT, PCB etc. Our ARFC Metal Film Resistor & ARFCN type Thin Film Chip Resistor are being produced under the thorough quality control, and are being used widely in high precision and high reliability electronics circuit such as Measuring Instrument, Medical Instruments, Communication and other Industrial Instruments.
-
Product
PLD Systems
Pulsed Laser Deposition
-
Is a versatile thin film deposition technique. A pulsed laser (~20 ns pulse width) rapidly evaporates a target material forming a thin film that retains target composition. This unique ability of stoichiometeric transfer of target composition into the film was realized first by the research team led by Dr. Venkatesan at Bell Communications Research, NJ, USA, nearly 30 years ago while depositing high temperature superconducting (YBa2Cu3O7) thin films. Since then, PLD has become the preferred deposition technique where ever thin films of complex material compositions are considered. Another unique feature of PLD is its ability for rapid prototyping of materials. The energy source (pulsed laser) being outside the deposition chamber, facilitates a large dynamic range of operating pressures (10-10 Torr to 500 Torr) during material synthesis. By controlling the deposition pressure and substrate temperature and using relatively small target sizes, a variety of atomically controlled nano-structures and interfaces can be prepared with unique functionalities.
-
Product
2-MGEM Optical Anisotropy Factor Measurement System
-
The 2-MGEM Optical Anisotropy Factor Measurement System is a normal-incidence polarization reflection microscope designed to measure the sample Mueller matrix and is a 2008 R&D 100 Award Winner. This system is designed specifically to evaluate the Optical Anisotropy Factor (OPTAF) of cross sections of TRISO nuclear fuel pyrocarbon layers. Other possible material characterizations include measuring Mueller matrix elements of other crystals, carbon compounds, and thin film coatings (e.g. surfacedeposition films) at normal incidence. The 2-MGEM can also measure retardation (d), circular diattenuation (CD) and the polarization factor (ß). These parameters are not measurable using older techniques, since those techniques do not incorporate a compensating optical element.
-
Product
Powerful and Cost Effective Spectroscopic Ellipsometer
Smart SE
-
The Smart SE from HORIBA Scientific is a versatile spectroscopic ellipsometer for fast and accurate thin film measurements. It characterizes thin film thickness from a few Angstroms to 20µm, optical constants (n,k), and thin film structure properties (such as roughness, optical graded and anisotropic layers, etc).The spectral range from 450 to 1000nm is measured in a few seconds and ellipsometric data are analyzed using the DeltaPsi2 software platform. The software integrates two levels of software to fulfil both routine analysis with predefined recipes and advanced analysis with state-of-the art ellipsometric modelling.
-
Product
Multi-Element Standards
-
These multi-element standards consist of multi-layer thin film coatings, one on top of the other, upto a maximum of 6 elemental coatings. It is generally recommended to have coating thicknesses < 20 µg/cm2, so as to cause negligible notable matrix effects, in particular absorption of X-rays emitted in lower deposits by those covering them.
-
Product
Measurement System
DPS
-
EYCOM develops and manufactures highly accurate and dependablemeasurement systems for permittivity, dielectric loss tangent, or permeabilityby leveraging its accumulated experience and expertise over a long period of time.Capitalizing on such experience and expertise, KEYCOM is committed todeveloping customized solutions for wide range of specific applications such asflexible circuit board, semiconductor, thin film, millimeter wave and microwave frequency board,
-
Product
Instrumented Indentation Tester
-
With Anton Paar’s versatile indentation testers you can precisely determine the mechanical properties of thin films, coatings, or substrates such as hardness and elastic modulus. The instruments handle almost any type of material, whether soft, hard, brittle, or ductile. You can also conduct creep, fatigue, and stress-strain studies on surfaces in the nanometer range.
-
Product
In Situ Diagnostics
-
For researchers working on ultra thin films and novel interfaces, Neocera offers insitu, real-time process control and diagnostic tools such as high-pressure RHEED, Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES). RHEED provides exceptional growth control via RHEED intensity oscillations and the Structural data via diffraction. LAXS is a complimentary to RHEED and provides real-time Compositional information. IES provides energetics of the laser generated plasma plume which is directly responsible for obtaining high quality films and interfaces.
