Powerful and Cost Effective Spectroscopic Ellipsometer

Spectroscopic Ellipsometry

Spectroscopic ellipsometry is a surface-sensitive, non-destructive, non-intrusive optical technique widely used for thin layers and surface characterization. It is based simply on the change in the polarization state of light as it is reflected obliquely from a thin film sample. Depending on the type of material, spectroscopic ellipsometers can measure thickness from a few Å to tens of microns. It is also an excellent technique for multi-layers measurement.

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In-Line Spectroscopic Ellipsometer for Web Coater and Roll to Roll Systems

UVISEL - HORIBA, Ltd.

The UVISEL Spectroscopic Phase Modulated Ellipsometer is a turn-key thin film metrology instrument for in-line measurement of thin film thickness and optical properties. It features rapid measurement capability with data acquired every 50 ms for powerful control of thin film uniformity across the entire web.The design of the UVISEL ellipsometric heads allows simple integration into roll-to-roll systems, while the software provides advanced communication capabilities suited to roll-to-roll production.

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Spectroscopic Ellisopmeter for Simple Thin Film Measurement

Auto SE - HORIBA, Ltd.

The Auto SE is a new thin film measurement tool that allows full automatic analysis of thin film samples with simple push button operation.Sample analysis takes only a few seconds and provides a complete report that fully describes the thin film stack – including film thicknesses, optical constants, surface roughness, and film inhomogeneities.

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Reference Ellipsometer for Thin Film Measurements

UVISEL Plus - HORIBA, Ltd.

The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.

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In-Situ Spectroscopic Ellipsometer for Real-Time Thin Film Monitoring

UVISEL Plus In-Situ - HORIBA, Ltd.

The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.

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Large Area Mapping Spectroscopic Ellipsometers for Flat Panel Display and Photovoltaic Industries

HORIBA, Ltd.

HORIBA Scientific’s large area spectroscopic ellipsometers are designed to provide thin film control solutions in flat panel display and photovoltaic manufacturing.A large mapping system allows thin film measurements at every location on the panel. Our large area spectroscopic ellipsometers are driven by our DeltaPsi2 software platform, which provides reliable recipes for routine thin film measurements. Automatic recipes fully automate measurement+modelling+mapping+results. Automatic reporting, data reprocessing, import/export package are some of the many functionalities of DeltaPsi2.

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Powerful and Cost Effective Spectroscopic Ellipsometer

Topics

Spectroscopic Ellipsometry

In-Line Spectroscopic Ellipsometer for Web Coater and Roll to Roll Systems

Spectroscopic Ellisopmeter for Simple Thin Film Measurement

Reference Ellipsometer for Thin Film Measurements

In-Situ Spectroscopic Ellipsometer for Real-Time Thin Film Monitoring

Large Area Mapping Spectroscopic Ellipsometers for Flat Panel Display and Photovoltaic Industries

Spectroscopic Ellipsometry