Thin Film
layer of material ranging < a nanometer to > a micrometer in thickness.
See Also: Film, Ellipsometers
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Thin Film
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Substrates: ceramics, glass, soft substrates. Conductor: Au, Pt, Pd, Ni, Cu, Ta, WTi. Dielectrics: Polyimide, SiN. Micro strip and coplanar design. Through hole metallisation, filled via. Integrated resistor and capacitor. Air bridges. Polyimide Multilayer.
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Thin Film Circuits
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SemiGen offers build-to-print services for a wide range of materials and metallization schemes. We use our processing technology to fabricate circuits on As-Fired Alumina, Polished Alumina, Superstrate TPS, Aluminum Nitride, Beryllium Oxide, Fused Silica/Quartz, Sapphire, and Hi-K Dielectrics.
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Thin-film deposition
Plasma Source
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SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Reference Ellipsometer for Thin Film Measurements
UVISEL Plus
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The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.
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Thin Film Composition and Thickness Monitor
P-1000
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The Precision P-1000 readily analyzes compound thin films utilized in semiconductor, superconductor, magnetic and applications.
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Thin Film Chip Resistors, High Reliability Type
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Panasonic Industrial Devices Sales Company of America
An AEC-Q200 Compliant SeriesPanasonic components specified as AEC-Q200 Compliant are consistently designed into automotive systems. However, today’s Design Engineers are specifying AEC-Q200 components to meet the high-quality standards of devices beyond automotive applications.
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Thin Film
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Bourns precision thin film resistors have tight resistance tolerances, extremely low temperature coefficiency and wide range of resistance value which makes them ideal for high precision applications. Excellent stability, low noise characteristics are achieved by using thin film sputtering technology on ceramic substrates and high precision laser trimming process.
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Thin Film Chip Resistors, High Voltage Type
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Panasonic Industrial Devices Sales Company of America
Thin Film Chip Resistors, High Voltage Type by Panasonic
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Scatterometers/ Thin Film Metrology Systems
LittleFoot Series
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The n&k LittleFoot-CD, and LittleFoot-CD450 are DUV-Vis-NIR scatterometers/thin film metrology systems, based on polarized reflectance measurements (Rs and Rp) from 190nm to 1000nm, with microspot technology. The systems in the LittleFoot-CD Series determine thickness, n and k spectra from 190nm-1000nm of thin films, as well as depths, CDs, and profiles of trenches and contact holes.
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Thin Film Design Software
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Scientific Computing International
SCI offers software tools for optical thin film design, material analysis, ellipsometry, and spectrophotometry. SCI’s current standalone optical thin film software includes:
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Thin Film Based Thermopile Detector: 3 Channels, Compensated
T34 Compensated
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A three-channel compensated (6 element) thin-film thermopile in a TO-8 package. Each active area is 3.16mm x 0.4mm. Offers thermal compensation to minimize effect of sudden ambient temperature change. Internal aperture minimizes channel-to-channel crosstalk while increasing sensitivity.
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Thin Film Based Thermopile Detector: 10 Channels
10 Channel
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A ten-channel thin-film thermopile in a TO-8 package. Each active area is 3.16mm x 0.4mm and offers low noise voltage. Internal aperture minimizes channel-to-channel crosstalk while increasing sensitivity.
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In-Situ Spectroscopic Ellipsometer for Real-Time Thin Film Monitoring
UVISEL Plus In-Situ
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The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
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Thin Film Based Thermopile Detector: 1 Channel
DR46 Compensated
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A one-channel compensated thin-film thermopile in a TO-8 package. The active area and compensating element area are 4mm x 0.6mm each. Offers high output with very good signal-to-noise ratio. Internal aperture minimizes channel-to-channel crosstalk increasing sensitivity.
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Spectroscopic Ellisopmeter for Simple Thin Film Measurement
Auto SE
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The Auto SE is a new thin film measurement tool that allows full automatic analysis of thin film samples with simple push button operation.Sample analysis takes only a few seconds and provides a complete report that fully describes the thin film stack – including film thicknesses, optical constants, surface roughness, and film inhomogeneities.
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Thin Film Lithium Tantalate (TFLT™) Pyroelectric Detectors
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For room temperature measurement of THz sources, from nW to mW.
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Scatterometers / Thin film Metrology Systems
Olympian Series
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DUV-Vis-IR (Wavelength Range: 190nm – 15,000nm) Scatterometers / Thin Film Metrology Systems: The n&k Olympian, n&k Olympian-450 and n&k Olympian-M are DUV-Vis-IR scatterometers/thin film metrology systems with micro-spot technology, covering the wavelength range from 190nm – 15,000nm. With the inclusion of the infra-red wavelength range, the Olympian Series extends the capabilities of n&k’s DUV-Vis-NIR scatterometer series – the OptiPrime-CD Series.
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Ultra Thin Film Scratch Tester
CSR5100
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The micro-scratch method (JIS R-3255), which is an evolution of the scratch method that evaluates the adhesion strength between the thin film formed on the material surface and the base material, enables the detection of peeling of thin films. detection, we have a highly sensitive destruction detection mechanism based on our own patented technology (Patent No. 5070146) to evaluate the adhesion strength of ultra-thin
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Scatterometers / Thin Film Metrology Systems
OptiPrime Series
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The n&k OptiPrime series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes.
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Optical Thin-Film Metrology for Advanced Thin Films
FilmTek 6000 PAR-SE
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Scientific Computing International
Production-proven metrology system for film thickness, refractive index and stress measurement for a broad range of film layers at the 1x nm design node and beyond. Accommodates 200 or 300 mm wafer metrology. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to meet the challenging demands associated with multi-patterning and other leading-edge device fabrication techniques.
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Vibrating Sample Magnetometer
VSM-P2H
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This is low magnetic field type of exclusive use for soft thin film sample by the use of Helmholtz Coil.The type is capable of measuring variations of temperature from -50°C to 200°C by adding gas-flow type of temperature controller as an option.
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NEX CG II Energy Dispersive X-ray Fluorescence Spectrometer
NEX CG II
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Applied Rigaku Technologies, Inc
NEX CG II, a powerful second-generation energy dispersive X-ray fluorescence (EDXRF) spectrometer, delivers rapid qualitative and quantitative determination of major and minor atomic elements in a wide variety of sample types — from oils and liquids to solids, metals, polymers, powders, pastes, coatings, and thin films.
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Surface Analysis
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A UHV surface analysis system for thin film depth profilingMeasures the surface composition of the first few nanometers and/or micrometers depth of solid samples.
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100GHz/200GHz DWDM Module in LGX Box
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Flyin Optronics’ 100GHz/200 GHz dense wavelength division multiplexer (DWDM module) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging to achieve optical add and drop at the ITU wavelengths. It provides ITU channel center wavelength, low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path . It can be used for wavelength add/drop in telecommunication network system.
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40-CH 100G Athermal AWG
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Athermal AWG(AAWG) have equivalent performance to standard Thermal AWG(TAWG) but require no electrical power for stabilization. They can be used as direct replacements for Thin Film Filters(Filter type DWDM module) for cases where no power is available, also suitable for outdoor applications over -30 to +70 degree in access networks. Flyin’s Athermal AWG(AAWG) provide excellent optical performance, high reliability, ease of fiber handling and power saving solution in a compact package. Different input and output fibers, such as SM fibers, MM fibers and PM fiber can be selected to meet different applications. We can also offer different product packages, inluding special metal box and 19” 1U rackmount.
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Compact Passive and Active Resistor Trimming for Thick and Thin Film
LRT 2000C
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*Travel: 6" x 6"*Laser : Fiber Laser Ytterbium 1064 nm*Kerf: 30 to 80 micron Adjustable*Pulse width : 80 nano second*Rap Rate: 1 to 1 million Pulse Per Second*Average Power: 20 watts
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L-Band Red/Blue-Band Pass MWDM
WD1616/R, WD1616/B
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Hangzhou Huatai Optic Tech. Co., Ltd.
WD1616/R, WD1616/B is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to the combination and separation of L-Band, Red-Band (1589~1603nm) and Blue-Band (1570~1584nm).
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RFoG 4-Band Multiplexer. 1550, 1590 & 1310/1490nm MWDM
WD5943
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Hangzhou Huatai Optic Tech. Co., Ltd.
WD5943 WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to FTTx PON network to achieve the combination and separation of the 1550nm (CATV) and 1310/1490nm (data).
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XPS/ESCA Service
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X-ray Photoelectron Spectroscopy (XPS Analysis), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is used to determine quantitative atomic composition and chemistry. It is a surface analysis technique with a sampling volume that extends from the surface to a depth of approximately 50-70 Angstroms. Alternatively, XPS analysis can be utilized for X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA) from Evans Analytical Group (EAG).sputter depth profiling to characterize thin films by quantifying matrix-level elements as a function of depth.
