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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Extreme Environment Sensors
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Extremely Accelerated Stress Test Chambers
The extremely accelerated stress environment is defined by high temperature, high humidity and high pressure. WEIBER provides humidity resistance evaluation test for electronics components through customized Extremely Accelerated Stress Test Chamber. This chamber provides high performance test in minimal amount of time according to international IEC 60068-2-66 standard. This chamber also known as Accelerated Stress Test Chamber, Halt and Hass Test Chamber, Halt Test Chamber and Hass Test Chamber.This chamber reduces the time taken for humidity testing in electronic components. 2 types of tests saturated and unsaturated extremely accelerated stress test can be performed. In saturated test the temperature is maintained at 1210C at 100%RH, and for unsaturated temperature of 110, 120, 1300C is maintained at 85%RH. Normally for electronic components unsaturated type test is done.
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Light Source
OrienTek Optical Technology Ltd.
High Precision● Highly accurate unit offering 6 calibrated wavelengths● Interchangeable connectors● Durable and reliable design● Easy-to-use interface forerror-free testing● Rubber armor protection
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Light Source
UVF-210S
By traversing two light guide ends (right and left) by means of the high accuracy air cylinder, alternating irradiation of two independent positions is possible.
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Light Source
FiberPal OT-3000
The OT-3220/3221 is designed for a high performance stabilized laser source, especially in practice for FTTX networking installation and maintenance fieldworks environment requirements. It is usually applied as stable laser sources for wide range of optical testers and tools in optical fiber cabling and transmission systems.
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Light Meters
A light meter is a very sensitive electronic measuring device used to help monitor the illumination of any given area. Most light meter devices are small in size, simple to operate and equipped with an easy-to-read lighted screen made of special glass. Typically, a heavy-duty housing protects the light sensor inside the light meter from damage. A light meter is used for measuring brightness in lux (lx), foot candle (fc) or candela per square meter (cd/m²)measuring units. Some light meter devices are equipped with an internal memory or data logger to record and save measurements. The measurement of light intensity with a light meter is becoming increasingly important in the workplace due to safety concerns. Light measurement is also necessary to determine the best location and angle when installing and adjusting solar panels.
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Light Microscopy
Materials Evaluation and Engineering
MEE has a variety of light microscopes with magnifications ranging from 5X to 2400X. Each microscope is connected to a camera with digital image capture for subsequent measurements and/or additional image analyses.
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Light Meters
Meter reads from 0 to 1,999 foot-candles (resolution 0.1 to 1). Bright 1/2-inch-high digits make it an easy to read pocket light meter. The simplicity of the two-button operation eliminates the need to refer to directions. Functions are on/off, and range. The meter can be zeroed with the simple turn of an adjustment screw
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Extreme Temperature Active Probe, 1.5 GHz
N2797A
Testing devices over extreme temperature ranges is quite common these days. The N2797A single-ended active probe is the industry’s first low-cost high input impedance active probe with rugged probe tips for environmental chamber testing of ICs and devices. It gives the ability to probe signals at drastic temperature swings ranging from –40 °C to +85 °C. The probe provides 1.5 GHz of bandwidth and a 2 m long cable.
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Light Meter
MODEL 5202
Kyoritsu Electrical Instruments Works, Ltd.
Digital Light Meter 3 ranges changeable from low to high illuminance. (200/2000/20000lux) Data hold function. Digital light meter with separate light recieving sensor and meter.
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Light Meter
PLMT56
Light Meter Measures In LuxOver-Range IndicatorLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 50,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 LuxDimensions: 7.40' H x 2.52' W x 0.96' DAccessories Included: 12V A23 Battery, Photo DetectorSold as : Unit
