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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Product
Ultraviolet Checker
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For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Product
Deep Ultraviolet Spectrophotometer System
VUVAS-10X
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A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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Light Meter
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Ideal for measuring mercury, xenon, metal halide or fluorescent lamps, commonly used for studies in the UVA region, as well as sunlight.
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Light Measurement
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Light is produced from many natural and artificial sources. Controlling light and having an accurate understanding of its output, directionality and the appearance of what it irradiates is key to product development, quality and the success of a light source. Here are just a few examples of why Labsphere is leading the industry in light measurement.
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Product
Light Source
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A light source essentially is an optical transmitter that is paired with an optical receiver, both of which are connected to electrically based devices or systems. So, the source converts electrons to photons and the detector converts photons to electrons.
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Light Meters
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A light meter is a very sensitive electronic measuring device used to help monitor the illumination of any given area. Most light meter devices are small in size, simple to operate and equipped with an easy-to-read lighted screen made of special glass. Typically, a heavy-duty housing protects the light sensor inside the light meter from damage. A light meter is used for measuring brightness in lux (lx), foot candle (fc) or candela per square meter (cd/m²)measuring units. Some light meter devices are equipped with an internal memory or data logger to record and save measurements. The measurement of light intensity with a light meter is becoming increasingly important in the workplace due to safety concerns. Light measurement is also necessary to determine the best location and angle when installing and adjusting solar panels.
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Product
Economic Extreme Power Temperature Forcing System
ECO Cool
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ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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Product
Extreme Performance AI NVIDIA Rugged Computer
JetSys-5320
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Jetsys-5320 drives critical AI applications at the edge with a rugged small form factor enclosure. A server-class AI processing system based on the NVIDIA® Jetson™ TX2i SOM, along with a dual-core Denver 2 64-bit CPU and quad-core ARM A57 complex.
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Light Sources
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Excelitas offers an array of illumination and lighting technologies with custom design capabilities aligned with customer requirements to deliver an illumination solution optimized to your specifications. From simply supplying a discrete LED, Laser, Lamp or UVC source to providing a complete, integrated system, Excelitas consistently delivers lighting solutions for the most demanding applications.
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Product
Extreme Temperature Active Probe, 1.5 GHz
N2797A
Oscilloscope Probe
Testing devices over extreme temperature ranges is quite common these days. The N2797A single-ended active probe is the industry’s first low-cost high input impedance active probe with rugged probe tips for environmental chamber testing of ICs and devices. It gives the ability to probe signals at drastic temperature swings ranging from –40 °C to +85 °C. The probe provides 1.5 GHz of bandwidth and a 2 m long cable.
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Product
Structured Light
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Structured light systems from ams enable 3D imaging applications to achieve extremely high accuracy. Accurate structured light technology is behind the user face recognition being implemented in smartphones. Structured light products and design expertise from ams help customers get to market quickly and scale up production rapidly.
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Product
Light Sources
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Fiber optic light sources are a low-cost way to analyze and identify accurate fiber optic readings, while certifying optical fiber. Receive the ability to measure fiber optic light continuity, loss, and quality of the signal.
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Light Meters
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Our light meters are designed for simple and accurate results in an industrial setting. Whether you are checking work spaces, parking lots, or baseball fields for safe levels of lighting or measuring for testing design compliance, a light meter from Sper Scientific will get the job done. Obtain precise UV, FC or Lux measurements, in multiple light measurement ranges. These light meters are designed for use in work spaces, labs, schools, outdoor studies, optics, home inspections, and many others. In addition, you may use these meters to check compliance with ANSI/NFPA 101 (standards for emergency & exit lighting).
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Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
