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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Extremely Accelerated Stress Test Chambers
The extremely accelerated stress environment is defined by high temperature, high humidity and high pressure. WEIBER provides humidity resistance evaluation test for electronics components through customized Extremely Accelerated Stress Test Chamber. This chamber provides high performance test in minimal amount of time according to international IEC 60068-2-66 standard. This chamber also known as Accelerated Stress Test Chamber, Halt and Hass Test Chamber, Halt Test Chamber and Hass Test Chamber.This chamber reduces the time taken for humidity testing in electronic components. 2 types of tests saturated and unsaturated extremely accelerated stress test can be performed. In saturated test the temperature is maintained at 1210C at 100%RH, and for unsaturated temperature of 110, 120, 1300C is maintained at 85%RH. Normally for electronic components unsaturated type test is done.
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Deep Ultraviolet Spectrophotometer System
VUVAS-10X
A new ultraviolet spectrophotometer system for optical metrology just arrived at NASA Goddard! The VUVAS-10X spectrophotometer works best in the 90 to 160 nanometer wavelength range, also known as deep or vacuum ultraviolet (VUV) region. It uses a windowless hydrogen plasma light source and differential pump section to reach many wavelengths beyond those of conventional deuterium lamps. The source also works with other gases, or gas mixtures, for atomic spectral line emission from about 30 nanometers (double ionized Helium gas) up to the Visible light range. The new spectrophotometer system, McPherson VUVAS-10X, uses a one-meter focal length high-resolution monochromator with the special light source, scintillated detector and Model 121 goniometric sample chamber. The system is ideal for optical transmission, absorbance and specular reflectance at incident angles up to 60 degrees. This McPherson spectrophotometer system will help develop, inspect and qualify optical materials and coatings used for very high altitude and extraterrestrial space flight missions.
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"Extremely Random" Precision Noise Generator
Model 3025
The Model 3025, "Extremely Random"TM Precision Noise Generator supplies White and Pink Noise, and a 1 kHz reference signal. Crystal controlled - the pseudo random circuitry provides a 6.5 Day pseudo-random cycle time, assuring a "Extremely Random"TM noise source.
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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DC-AC Sine Wave Inverters for Ultraviolet (UV) Lamps
UV Lamp Inverters
The sine wave inverters are designed and built to meet any customer input/output and mechanical configuration requirements.
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Light Meters
TES Electrical Electronic Corp.
Dual Display, 4 digit LCD reading.Spectral Sensitivity close to CIE phototropic curve.Measuring levels ranging 0.001 to 1999kAccurate and instant response. Luminance ratio A/B
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Extreme Performance Edge Servers
Ark-7000 Series
ARK-7000 series feature Intel Xeon processors and multiple expansion slots, delivering high-speed data transfer rates and enhanced remote management.
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Light Meter
PLMT56
Light Meter Measures In LuxOver-Range IndicatorLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 50,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 LuxDimensions: 7.40' H x 2.52' W x 0.96' DAccessories Included: 12V A23 Battery, Photo DetectorSold as : Unit
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Timing Lights
A stroboscope used to dynamically set the ignition timing of an Otto cycle or similar internal combustion engine equipped with a distributor. Modern electronically controlled passenger vehicle engines require use of a scan tool to display ignition timing.
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Data Logger for Extremely Low Temperature
DSR-ELT
Special probe using military industrial technology supports measuring temperature ultra low to -196 Original fittings for sensor connection, ensures 100,000 plugs Support single DSR connecting to PC via USB interface, and multiple DSR grouped in RS485 or LAN networking for central management Suitable for medical refrigerator, biological specimens preservation, scientific research and other applications
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Light Sources
LS 150 Xenon Arc Lamp Source
Model LS-150 is a Patented US Pat. No. 8116017 low cost, high output 150 watt Xe arc lamp based light source. The entire source, power supply, lamp, and optical compartment are housed in an extremely compact enclosure, 9 x 6 x 11 inches. The unit's base allows mounting on inch or metric spaced optical tables with the optics centered over the hole pattern to allow for easy integration with the rest of your setup.
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Light Source
UVM-SP-JW
Readouts of UV intensity and cumulative luminescence count are prompted either on the front panel or via the externally connected remote signal control. The UV intensity detection segment is intended to measure a specific intensity of light signals, while the cumulative luminescence count is designed to tally a cumulative count on all UV intensities measured, in conjunction with real-time calibration.
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Light Analysis
Welcome to Thorlabs; below you will find links to detectors and instrumentation that measure the various properties of light, a subset of our entire line of photonics products. Thorlabs offers an extensive selection of instruments that measure the properties of light. Our versatile power and energy meters can be used with over 25 different sensors in order to make NIST-traceable power and energy measurements. If the convenience of a meter is not desired, our selection of detectors includes basic photodiodes (uncalibrated and calibrated), photodetectors (biased, amplified, and avalanche), CCD and CMOS arrays, position detectors, integrating spheres, and photomultiplier tubes. The Beam Characterization category contains beam profilers (camera and scanning slit), a wavefront sensor, spectrometers, and interferometers, while the Polarimetery link leads to a selection of instruments used to measure and control the polarization of light.
