MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
Categories
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Ozone Generators & Systems
MKS offers a wide range of ozone generators and modular delivery systems which produce ultra-pure, reliable ozone gas. In the clean semiconductor environment, Ozone reacts with a wide range of precursor gases resulting in the creation of Al2O3, ZrO2, HfO2, and La2O3 metal oxides to enable thin film deposition processes like Atomic Layer Deposition (ALD) and Etch (ALE). MKS’ generator uses Grade 6 gas, enabling the creation of higher film density improving product yield. Photovoltaic and Display manufacturing leverage semiconductor best practices and utilize ozone to create enhanced thin film barriers, improving product performance and reliability.
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High Temperature Absolute Pressure Transducers
Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Process Sense™ NDIR End Point Detector For Chamber Clean
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Micro-Baratron® Pressure Transducers
Micro-Baratron® pressure transducers are ideally suited for use in delivery systems that feed ultrapure gases to critical process systems. Their wetted surfaces exposed to the gas stream have a finish of better than 5 µin Ra. These transducers exhibit superior dry-down characteristics, and contribute no particles above background.
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High Power Microwave Plasma System
The High Power Microwave Plasma System features the High Power Microwave Plasma Source, generator (with isolator) and auto-tuning system comprised of the Precision Power Detector and SmartMatch® unit. This comprehensive system delivers a high concentration of radicals with low electron temperatures for the highest dissociation and lowest recombination rates.
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Tunable Filter Spectrometers
MKS Instruments' platform of innovative optical analyzers based on Tunable Filter Spectroscopy (TFS™) provides real-time gas analysis, while delivering customers a substantially lower total cost of ownership. TFS™ can be utilized from UV (Ultra-Violet) through IR (Infra-Red) spectral regions. MKS TFS™ sensor platforms have been on the market since 2008 with more than 2500 systems deployed.
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Vacuum Pressure Transducers
MKS modular vacuum transducers feature compact size that dramatically reduces installation costs. These vacuum/pressure gauges are ideal for applications where controller size and local control are critically important. They are available as pressure transducers with an analog output, or as vacuum modules with digital communications used to transmit the pressure signal.
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General Performance Absolute Pressure Switches
These absolute vacuum / pressure switches offer fast, accurate, and reliable protection for vacuum equipment and processes. Designed for applications where a DC signal output is not required, these pressure switches provide relay outputs that are readily interfaced with alarms, valve actuators, computers, process controllers, or other protection devices.
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Mass Spectrometers
Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
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High Performance Heated Absolute Pressure Transducers
These high performance Baratron® capacitance manometers have the sensor located in a temperature controlled constant temperature oven for improved accuracy. They are available with an analog output or digital communications for measuring absolute pressure.
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Communication Gateways
We offer compact gateways for DeviceNet™, Profibus™ and Ethernet communication protocols available in RS232, RS422, RS485 and Modbus interfaces for communicating with our programmable automation controllers and networked I/O.
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Vapor Mass Flow Controllers
Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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Precisive® 5 Application Specific Gas Analyzers
The Precisive® Gas Analyzer is a real-time gas analyzer based on MKS' unique Tunable Filter Spectroscopy (TFS™) platform. The Precisive suite of products are calibrated for the measurement of a wide range of gases across multiple process industries. The real-time, continuous measurement capability provides immediate analysis ensuring control of critical process parameters.
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Vacuum Gauge Controllers
MKS offers a range of controllers that control ion gauges, heat-loss sensors, and thermocouples. Product features can be configured to meet your specific process needs. A variety of communication protocols, including RS-232, RS-485, and DeviceNet™, are available to speed and ease integration into your control scheme. In addition, many of the controllers provide local displays and a choice of set points that further simplify control system integration.
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FTIR Gas Analyzers
FTIR Spectroscopy gas analyzer instruments from MKS Instruments are capable of ppb to ppm sensitivity for multiple gas species in a variety of gas analysis applications, such as toxic gas detection, automotive emissions measurement, and monitoring stack emissions, processes, ambient air, purity, and selective catalytic reduction performance.


















