Showing results: 16 - 28 of 28 items found.
-
VASE -
J.A. Woollam Co., Inc.
The VASE is our most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals, multi-layers, and more. It combines high accuracy and precision with a wide spectral range up to 193 to 2500nm.
-
PH-LE -
HenergySolar
The multiple angle laser ellipsometer provides film thickness, refractive index and absorption index at the HeNe laser wavelength 632,8 nm with an extraordinary precision and accuracy. It can be utilized to characterize single films, multiple layer stacks and bulk materials.
-
VUV-VASE -
J.A. Woollam Co., Inc.
The VUV-VASE variable angle spectroscopic ellipsometer is the standard in optical characterization of materials used in lithography applications. Its measurement range spans vacuum ultraviolet (VUV) to near infrared (NIR). This provides incredible versatility to characterize numerous types of materials: semiconductors, dielectrics, polymers, metals, multilayers and now liquids such as immersion fluids.
-
UVISEL Plus -
HORIBA, Ltd.
The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.
-
Smart SE -
HORIBA, Ltd.
The Smart SE from HORIBA Scientific is a versatile spectroscopic ellipsometer for fast and accurate thin film measurements. It characterizes thin film thickness from a few Angstroms to 20µm, optical constants (n,k), and thin film structure properties (such as roughness, optical graded and anisotropic layers, etc).The spectral range from 450 to 1000nm is measured in a few seconds and ellipsometric data are analyzed using the DeltaPsi2 software platform. The software integrates two levels of software to fulfil both routine analysis with predefined recipes and advanced analysis with state-of-the art ellipsometric modelling.
-
UVISEL Plus In-Situ -
HORIBA, Ltd.
The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
-
UVISEL -
HORIBA, Ltd.
The UVISEL Spectroscopic Phase Modulated Ellipsometer is a turn-key thin film metrology instrument for in-line measurement of thin film thickness and optical properties. It features rapid measurement capability with data acquired every 50 ms for powerful control of thin film uniformity across the entire web.The design of the UVISEL ellipsometric heads allows simple integration into roll-to-roll systems, while the software provides advanced communication capabilities suited to roll-to-roll production.
-
HORIBA, Ltd.
HORIBA Scientific’s large area spectroscopic ellipsometers are designed to provide thin film control solutions in flat panel display and photovoltaic manufacturing.A large mapping system allows thin film measurements at every location on the panel. Our large area spectroscopic ellipsometers are driven by our DeltaPsi2 software platform, which provides reliable recipes for routine thin film measurements. Automatic recipes fully automate measurement+modelling+mapping+results. Automatic reporting, data reprocessing, import/export package are some of the many functionalities of DeltaPsi2.
-
SENTECH Instruments GmbH.
Spectroscopic ellipsometers measure film thickness and refractive index of single layers, and multi‑layer stacks. Related properties of bulk materials, isotropic and anisotropic materials, surface and interface roughness as well as gradients can be analysed.
-
FTPadv -
SENTECH Instruments GmbH.
The SE 500adv combines ellipsometry and reflectometry to eliminate the ambiguity of measuring layer thickness of transparent films. It extends the measureable thickness to 25 µm. Therefore the SE 500adv extends the capability of the standard laser ellipsometer SE 400adv especially for analyzing thicker films of dielectrics, organic materials, photoresists, silicon, and polysilicon.
-
Boin GmbH
PANELMAP is a software package used to collect, edit, analyze and visualize measured physical parameters on rectangular semiconductor panels. PANELMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
-
Boin GmbH
WAFERMAP is an award winning software package used to collect, edit, analyze and visualize measured physical parameters on semiconductor wafers. WAFERMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
-
HORIBA, Ltd.
Spectroscopic ellipsometry is a surface-sensitive, non-destructive, non-intrusive optical technique widely used for thin layers and surface characterization. It is based simply on the change in the polarization state of light as it is reflected obliquely from a thin film sample. Depending on the type of material, spectroscopic ellipsometers can measure thickness from a few Å to tens of microns. It is also an excellent technique for multi-layers measurement.
