Showing results: 1 - 15 of 189 items found.
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Bourns
Bourns precision thin film resistors have tight resistance tolerances, extremely low temperature coefficiency and wide range of resistance value which makes them ideal for high precision applications. Excellent stability, low noise characteristics are achieved by using thin film sputtering technology on ceramic substrates and high precision laser trimming process.
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TCB Series -
Alpha Electronics Corp.
Rated Power:0.125W, 0.25W Resistance Range:100kΩ - 1MΩResistance Tolerance:±0.02% - ±1.0%TCR :0±5ppm/°C, 0±10ppm/°C
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Naprotek, LLC.
SemiGen offers build-to-print services for a wide range of materials and metallization schemes. We use our processing technology to fabricate circuits on As-Fired Alumina, Polished Alumina, Superstrate TPS, Aluminum Nitride, Beryllium Oxide, Fused Silica/Quartz, Sapphire, and Hi-K Dielectrics.
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TFA -
Luzchem Research Inc.
The TFA instrument has be designed to monitor dissolution rates with a minimal volume of developer, typically ≤ 1 ml. The design uses surface tension to hold the developer in a small gap between the sample and the detector head. The instrument allows multiple measurements on the same sample. Thickness measurement can be made in the same geometry as dissolution measurements.
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Scientific Computing International
SCI offers software tools for optical thin film design, material analysis, ellipsometry, and spectrophotometry. SCI’s current standalone optical thin film software includes:
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Gemini Series -
n&k Technology, Inc.
The n&k Gemini-TF, Gemini-TF-M and Gemini-FPD are specifically designed for measurements of patterned and unpatterned films on transparent or opaque substrates. These tools are used extensively for solar cell, flat panel and photomask applications. The tools belonging to the Gemini-TF Series are based on unpolarized Reflectance (R) and unpolarized Transmittance (T) measurements, with a 50μm spot size for both R and T. R and T are simultaneously measured to determine film thickness and n and k spectra from 190nm – 1000nm
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P-1000 -
Axic Inc.
The Precision P-1000 readily analyzes compound thin films utilized in semiconductor, superconductor, magnetic and applications.
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CSR5100 -
Rhesca Co., Ltd.
The micro-scratch method (JIS R-3255), which is an evolution of the scratch method that evaluates the adhesion strength between the thin film formed on the material surface and the base material, enables the detection of peeling of thin films. detection, we have a highly sensitive destruction detection mechanism based on our own patented technology (Patent No. 5070146) to evaluate the adhesion strength of ultra-thin
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OptiPrime Series -
n&k Technology, Inc.
The n&k OptiPrime series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes.
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OptiPrime-X Series -
n&k Technology, Inc.
The n&k OptiPrime-X series are automated metrology systems used to fully characterize and monitor Thin Film and OCD applications for both current and next generation IC processes.
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LittleFoot Series -
n&k Technology, Inc.
The n&k LittleFoot-CD, and LittleFoot-CD450 are DUV-Vis-NIR scatterometers/thin film metrology systems, based on polarized reflectance measurements (Rs and Rp) from 190nm to 1000nm, with microspot technology. The systems in the LittleFoot-CD Series determine thickness, n and k spectra from 190nm-1000nm of thin films, as well as depths, CDs, and profiles of trenches and contact holes.
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Olympian Series -
n&k Technology, Inc.
DUV-Vis-IR (Wavelength Range: 190nm – 15,000nm) Scatterometers / Thin Film Metrology Systems: The n&k Olympian, n&k Olympian-450 and n&k Olympian-M are DUV-Vis-IR scatterometers/thin film metrology systems with micro-spot technology, covering the wavelength range from 190nm – 15,000nm. With the inclusion of the infra-red wavelength range, the Olympian Series extends the capabilities of n&k’s DUV-Vis-NIR scatterometer series – the OptiPrime-CD Series.
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UVISEL Plus -
HORIBA, Ltd.
The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.
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Hiden Analytical Ltd.
A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
