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Electron Spectroscopy for Chemical Analysis

determine the atomic composition of a surface.


Showing results: 1 - 7 of 7 items found.

  • XPS/ESCA Service

    Evans Analytical Group®

    X-ray Photoelectron Spectroscopy (XPS Analysis), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is used to determine quantitative atomic composition and chemistry. It is a surface analysis technique with a sampling volume that extends from the surface to a depth of approximately 50-70 Angstroms. Alternatively, XPS analysis can be utilized for X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA) from Evans Analytical Group (EAG).sputter depth profiling to characterize thin films by quantifying matrix-level elements as a function of depth.

  • X-ray Photoelectron Spectroscopy Analysis (XPS Analysis)

    Rocky Mountain Laboratories, Inc.

    X-ray photoelectron spectroscopy (XPS Analysis) also called Electron Spectroscopy for Chemical Analysis (ESCA) is a chemical surface analysis method. XPS measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.

  • Electron Multipliers

    Hamamatsu Photonics K.K.

    Electron multipliers are mainly used as positive/negative ion detectors. They are also useful for detecting and measuring vacuum UV rays and soft X-rays. Hamamatsu electron multipliers have a high gain (multiplication factor) yet low dark current, allowingoperation in photon counting mode to detect and measure extremely small incoming particles and their energy. This means our Hamamatsu electron multipliers are ideal for electron spectroscopy and vacuum UV spectroscopy such as ESCA (electron spectroscopy for chemical analysis) and Auger electron spectroscopy as well as mass spectroscopy and field-ion microscopy.

  • Auger Electron Spectroscopy (AES)

    Rocky Mountain Laboratories, Inc.

    Auger Analysis, Auger Electron Spectroscopy (AES or Auger) is a chemical surface analysis method. AES measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.

  • Imaging X-Ray Photoelectron Spectrometer

    Kratos AXIS Nova - Shimadzu Corp.

    X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a mature and widely used surface analysis technique for materials characterisation. XPS provides quantitative elemental and chemical state information from the upper most 10 nm of material. The The AXIS Nova photoelectron spectrometer can collect X-ray photoelectron spectra and images from any material that is stable under the ultra-high vacuum conditions required for the technique.

  • Energy Dispersive X-Ray Spectroscopy (EDS)

    Rocky Mountain Laboratories, Inc.

    Energy Dispersive Spectroscopy (EDS Analysis) is used in conjunction with the Scanning Electron Microscope (SEM) providing chemical analysis in areas as small as 1 µm in diameter. EDS detects all elements except for H, He, Li, and Be. EDS can be performed exactly on any features or particles seen in the SEM images and can “MAP” elements on a surface. Unknown materials can be identified and quantitative analysis can be performed.

  • Analytical Services

    Inolytix

    IGC: Inverse Gas Chromatography; Understand surface energies, polarities, acid/base properties and nanomorphology on powders and fibers. ToF-SIMS: Time-of-Flight Secondary Ion Mass Spectrometry. Localize your molecules at the first nanos! 2D imaging with resolution up to 200 nm. Highest sensitivity up to 10 ppm. CM: Quarz Crystal Microbalance In-situ observation of thickness and stiffness of any films in liquid environmentSEM: Scanning Electron Microscopy Images say more than words, especially with an artistic eye XPS/ESCA: X-ray Photoelectron Spectroscopy/Electron Spectroscopy for Chemical Analysis.

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