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Spectroscopic Ellipsometers
SE Series
Spectroscopic data measurement– Visible range: 350~840 nm (or 1.5~3.5 eV)– Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}Manually variable angle of incidence– 45°~90° with 5° stepSingle body system– 40 cm (W) × 30 cm (D) × 30 cm (H), 15 kg (typical)* UV- option requires external lamp power supplyEasy operation– No set-up / No keys to control– Low maintenanceUser-friendly software– operation and analysisOther features– Sample stage with tilt & height adjustmentssample size: (5 mm × 5 mm) ~ (200 mm × 200 mm)– Computer with current operating softwareOptions– Mapping stage: manual or automatic– UV-option: 250~840 nm (or 1.5~5.0 eV)
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Laser Ellipsometers
CER – SE 500adv
* The SE 500adv combines ellipsometry and reflectometry, * Eliminates the ambiguity in layer thickness determination for transparent films, * Extends thickness measurement to 25000 nm. # Laser wavelength 632.8 nm# Spectral range of reflectivity from 450 nm to 920 nm wavelength# Spot size 80 ?m
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Customized Ellipsometers
~0.1 nm thickness difference can be seen by IE-1000.Thickness distribution of thin film can be imaged.Thickness and optical images of semiconductor device, display, and bio samples.IE-1000 can show the images which can not be seen by conventional microscope.Defect of semiconductor and display can be seen directly.Easy and fast operation.
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In-Situ Spectroscopic Ellipsometer for Real-Time Thin Film Monitoring
UVISEL Plus In-Situ
The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
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Reference Ellipsometer for Thin Film Measurements
UVISEL Plus
The UVISEL Plus ellipsometer range offers the best combination of modularity and performance for advanced thin film, surface and interface characterization. FastAcq technology enables a sample measurement from 190 to 2100nm to be completed within 3 minutes, at high resolution. The possibility to continuously adjust the spectral resolution along the measurement range enables to scan a sample smarter and faster.
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Variable Angle Spectroscopic Ellipsometer
VASE
The VASE is our most accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals, multi-layers, and more. It combines high accuracy and precision with a wide spectral range up to 193 to 2500nm.
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Spectroscopic Ellipsometer
PH-SE
The spectroscopic ellipsometer is used for thin film and material characterization in R & D. The spectroscopic ellipsometer is designed to meet the requirements in modern research with special emphasis on speed and accuracy for an unmatched variety of applications.
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PANELMAP
PANELMAP is a software package used to collect, edit, analyze and visualize measured physical parameters on rectangular semiconductor panels. PANELMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
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Laser Ellipsometer
The laser ellipsometer can be utilized to characterize single films and substrates from selectable, application specific angles of incidence.
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Variable Angle Spectroscopic Ellipsometer
VUV-VASE
The VUV-VASE variable angle spectroscopic ellipsometer is the standard in optical characterization of materials used in lithography applications. Its measurement range spans vacuum ultraviolet (VUV) to near infrared (NIR). This provides incredible versatility to characterize numerous types of materials: semiconductors, dielectrics, polymers, metals, multilayers and now liquids such as immersion fluids.
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Multiple Angle Laser Ellipsometer
PH-LE
The multiple angle laser ellipsometer provides film thickness, refractive index and absorption index at the HeNe laser wavelength 632,8 nm with an extraordinary precision and accuracy. It can be utilized to characterize single films, multiple layer stacks and bulk materials.
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TFProbe Wafer Measurement Tools
Angstrom Sun Technologies, Inc.
Angstrom Sun Technologies Inc offers optical measurement and inspection systems for semiconductor and related industries. Its core products include wafer measurement systems, spectroscopic ellipsometers, thin film reflectometers, and microspectrophotometers.
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Ellipsometer
alpha-SE®
For routine measurements of thin film thickness and refractive index, this ellipsometer allows you to mount a sample, choose the model that matches your film, and press "measure". You have results within seconds. Works with your materials - dielectrics, semiconductors, organics, and more.
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Ellipsometer
RC2
The RC2 design builds on 25 years of experience. It combines the best features of previous models with innovative new technology: dual rotating compensators, achromatic compensator design, advanced light source and next-generation spectrometer design. The RC2 is a near-universal solution for the diverse applications of spectroscopic ellipsometry.
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Integrated-In-Line-In-Situ-Meterology
Angstrom Sun Technologies, Inc.
Although table-top version is our major product platform, we do provide in-line and in situ solutions. Although all in-line tools involve some special configuration and customized designs, we have had such experience to demo our capability in semiconductor, photovoltaic, glass industries. Both spectroscopic ellipsometer and spectroscopic reflectometers could be integrated for in-line or in situ application purpose. But how to implement them, or which one is more suitable, an environmental situation should be considered. You are welcome to discuss with our experts and we'll be glad to offer a real solution to meet your needs.
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WAFERMAP
WAFERMAP is an award winning software package used to collect, edit, analyze and visualize measured physical parameters on semiconductor wafers. WAFERMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
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Spectroscopic Ellipsometer Software
SpectraRay/4
SpectraRay/4, the SENTECH proprietary spectroscopic ellipsometry software, includes data acquisition, modeling, fitting, and extended reporting of ellipsometric, reflection, and transmission data. It supports variable angle, multi-experiment, and combined photometric measurements. SpectraRay/4 includes a huge library of materials data based on SENTECH thickness measurements and literature data as well. The large number of dispersion models allows modeling of nearly any type of material.
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Spectroscopic Ellipsometers
M-2000
The M-2000 line of spectroscopic ellipsometers is engineered to meet the diverse demands of thin film characterization. An advanced optical design, wide spectral range, and fast data acquisition make it an extremely powerful and versatile tool.
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Spectroscopic Ellipsometry
Spectroscopic ellipsometry is a surface-sensitive, non-destructive, non-intrusive optical technique widely used for thin layers and surface characterization. It is based simply on the change in the polarization state of light as it is reflected obliquely from a thin film sample. Depending on the type of material, spectroscopic ellipsometers can measure thickness from a few Å to tens of microns. It is also an excellent technique for multi-layers measurement.
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Ellipsometer
T-Solar™
The T-Solar ellipsometer combines the best photovoltaic measurement technology into a single system designed specifically for textured samples. Based on the establishedM-2000 rotating compensator spectroscopic ellipsometer, the T-Solar measures hundreds of wavelength across the UV-Visible-NIR.
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Spectroscopic Ellipsometers
SENresearch 4.0
The SENresearch 4.0 is the new SENTECH spectroscopic ellipsometer. Every individual SENresearch 4.0 spectroscopic ellipsometer is a customer-specific configuration of spectral range, options and field upgradable accessories. SENresearch 4.0 uses fast FTIR ellipsometry for the NIR up to 2,500 nm or 3,500 nm, respectively. It provides broadest spectral range with best S/N ratio and highest, selectable spectral resolution. Silicon films up to 200 µm thickness can be measured. The measurement speed of FTIR ellipsometry compares to diode array configurations, which are also selectable up to 1,700 nm. The new motorized Pyramid Goniometer features an angle range from 20 deg to 100 deg. Optical encoders ensure highest precision and long term stability of angle settings. The spectroscopic ellipsometer arms can be moved independently for scatterometry and angle resolved transmission measurements.
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Auto Spectroscopic Ellipsometer
PH-ASE
The PH-ASE spectroscopic ellipsometer measures thickness, refractive index and extinction coefficient of single films and multilayer stacks. Reflection measurements at different incident angles and transmission measurements can be carried out and combined with ellipsometric data.
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In-Line Spectroscopic Ellipsometer for Web Coater and Roll to Roll Systems
UVISEL
The UVISEL Spectroscopic Phase Modulated Ellipsometer is a turn-key thin film metrology instrument for in-line measurement of thin film thickness and optical properties. It features rapid measurement capability with data acquired every 50 ms for powerful control of thin film uniformity across the entire web.The design of the UVISEL ellipsometric heads allows simple integration into roll-to-roll systems, while the software provides advanced communication capabilities suited to roll-to-roll production.
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Spectroscopic Ellipsometer
SE Series
Angstrom Sun Technologies, Inc.
Spectroscopic Ellipsometer SE series are advanced models built by Angstrom Sun Technologies Inc. Ellipsometry is a technique utilizing polarization state changes after light beam reacts with probing samples. A typical ellipsometer setup includes a light source, polarizing optics (like polarizer, analyzer, phase retarder or called as compensator), sample stage, detecting unit, incident angle change mechanism, computer and software for data acquisition and modeling. Not like reflectometer, ellipsometer parameters (Psi and Del) are always obtained at non normal incident angles. By varying incident angle. many more data sets can be obtained which will be helpful in refining model, reducing uncertainty and improving user's confidence on model's output. Therefore, variable angle ellipsometer is far more powerful than fixed angle ellipsometers. Furthermore, by utilizing broadband light source, spectroscopic data over a wavelength range with many wavelength points can be obtained and thus measurement precision and accuracy for optical properties can be greatly improved. The measurement speed for spectroscopic data has been overcome by implementing an advanced detector array so thousands of data can be acquired simultaneously. With such configuration and capable of collecting more data sets, the complicated layer stacks could be analyzed with powerful functions built within software.
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Spectroscopic Ellipsometry
Spectroscopic ellipsometers measure film thickness and refractive index of single layers, and multi‑layer stacks. Related properties of bulk materials, isotropic and anisotropic materials, surface and interface roughness as well as gradients can be analysed.
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Large Area Mapping Spectroscopic Ellipsometers for Flat Panel Display and Photovoltaic Industries
HORIBA Scientific’s large area spectroscopic ellipsometers are designed to provide thin film control solutions in flat panel display and photovoltaic manufacturing.A large mapping system allows thin film measurements at every location on the panel. Our large area spectroscopic ellipsometers are driven by our DeltaPsi2 software platform, which provides reliable recipes for routine thin film measurements. Automatic recipes fully automate measurement+modelling+mapping+results. Automatic reporting, data reprocessing, import/export package are some of the many functionalities of DeltaPsi2.
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Spectroscopic Ellipsometer
IR-VASE®
The IR-VASE is the first and only spectroscopic ellipsometer to cover the spectral range from 2 to 30 microns (333 to 5000 wavenumbers). The IR-VASE can determine both n and k for materials over the entire width of the spectral range without extrapolating data outside the measured range, as with a Kramers-Kronig analysis.
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Film Thickness Probe
FTPadv
The SE 500adv combines ellipsometry and reflectometry to eliminate the ambiguity of measuring layer thickness of transparent films. It extends the measureable thickness to 25 µm. Therefore the SE 500adv extends the capability of the standard laser ellipsometer SE 400adv especially for analyzing thicker films of dielectrics, organic materials, photoresists, silicon, and polysilicon.
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Powerful and Cost Effective Spectroscopic Ellipsometer
Smart SE
The Smart SE from HORIBA Scientific is a versatile spectroscopic ellipsometer for fast and accurate thin film measurements. It characterizes thin film thickness from a few Angstroms to 20µm, optical constants (n,k), and thin film structure properties (such as roughness, optical graded and anisotropic layers, etc).The spectral range from 450 to 1000nm is measured in a few seconds and ellipsometric data are analyzed using the DeltaPsi2 software platform. The software integrates two levels of software to fulfil both routine analysis with predefined recipes and advanced analysis with state-of-the art ellipsometric modelling.
