Vapor Deposition
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Physical Vapor Deposition Systems
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Physical Vapor Deposition (PVD) systems use physical processes, like sputtering and evaporation, to deposit thin films with exceptional purity and control. These techniques are widely used in semiconductor manufacturing, optical coatings and protective applications.
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Matrix Vapor Deposition System
iMLayer
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The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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Plasma-Enhanced Chemical Vapor Deposition (PECVD)
VECTOR Product Family
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Dielectric film deposition processes are used to form some of the most difficult-to-produce insulating layers in a semiconductor device, including those used in the latest transistors and 3D structures. In some applications, these films need to conform tightly around intricate structures. Other applications require dielectric films to be exceptionally smooth and defect free since slight imperfections are multiplied greatly in subsequent layers.
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High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
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A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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Vapor Concentration Monitor
IR-300 Series
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Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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Deposition Systems
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When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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Ozone Gas Delivery Systems
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MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Ozone Gas Generators
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SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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MOCVD Systems
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For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Gas and Vapor Delivery Systems
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In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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EpiStride SiC CVD System
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Veeco’s latest technology for the compound semiconductor market enables high-performance chemical vapor deposition of Silicon Carbide for both 6 and 8-inch wafer production. The platform enables a return to production in under 5 hours after routine cleaning maintenance. The EpiStride system’s high uptimes, short cycle times and overall stable performance lead to the lowest cost of ownership per wafer compared to competitive systems.
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Vapor Tension Thermometer
RF60A
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UEi Test & Measurement Instruments
Farenheit and Celsius scale Vapor Tension thermometer
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Vapor Pressure Tester
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The MINIVAP laboratory and process vapor pressure analyzers are the worldwide accepted standard instruments for the determination of the vapor pressure of gasoline, crude oil and LPG.
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Water Vapor Sorption Analyzer
DVS Adventure
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DVS Adventure is a water vapor sorption analyzer that measures sorption and desorption isotherms over a broad range of humidities and temperatures. It offers unprecedented temperature stability and humidity performance.
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Water Vapor Desorption Products
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RBD's vacuum chamber water vapor removal products include high-power, high temperature IR radiant bakeout emitters, and low-power, low temperature UVC emitters.
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Water Vapor Absorption Tester
DRK854A
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Shandong Drick Instruments Co., Ltd.
Used to test the water vapor absorption performance of the sample.
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Particle Deposition Systems
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MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Water Vapor Transmission Rate Tester
(Electrolysis Method)
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Shandong Drick Instruments Co., Ltd.
DRK311 water vapor transmission rate tester (electrolytic method), the instrument is suitable for the determination of water vapor transmission rate of plastic films, composite films and other films and sheet materials. Through the measurement of water vapor transmission rate, the technical indicators of control and adjustment of packaging materials and other products can be achieved to meet the different needs of product applications.
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Dynamic Scale Deposition Loop System
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Dynamic Scale Deposition Loop fully automated systems includes hardware and software to measure and evaluate the performance of scale inhibitors under high pressure and high temperature conditions.
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Water Vapor Permeability Tester
QT-WVP
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Qualitest Water Vapor Permeability Tester QT-WVP series is used to test the water vapor transmission rate (WVTR) of packaging materials.
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Duct Deposit Measuring System
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The Elcometer 456 Duct Deposit Measuring System has been specifically designed to meet the requirements of the DTT (Deposit Thickness Test) in HVCA’s (Heating & Ventilation Contractor’s Association) Guide to Good Practice, for the measurement of dust and grease deposits within ventilation systems and kitchen ducts made of ferrous metals.
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Water Vapor Transmission Rate WVTR Tester
WPT Series
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Water Vapor Permeability Tester is based on the Gravimetric method and is applicable to the water vapour transmission rate (WVTR) test of plastic films, composite films, sheets and other materials.
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Dual Vapor Gravimetric Sorption Analyzer
DVS Resolution
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DVS Resolution’s key feature is the combined ability to precisely control and measure temperature and relative humidity while recording the highest resolution changes in mass. DVS Resolution uses a dry carrier gas typically nitrogen or compressed air for its operation. Digital mass flow controllers regulate flows of dry and saturated gases. Relative humidity is generated by precisely mixing dry and saturated gas flows in desired flow ratios which produce expected relative humidity. In a typical experiment a known concentration of water vapor is delivered over a sample placed inside the sample pan connected to the Surface Measurement Systems Ultrabalance™ measuring realtime mass changes caused by sorption or desorption of water molecules. Prior to sorption measurements, the sample can be in-situ preheated/dried at temperatures of up to 300oC.
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Dynamic Vapor Sorption Analyzer
IGAsorp-CT
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The IGAsorp-CT is a fully automated dynamic vapor sorption analyzer for the measurement of water and organic solvent isotherms and kinetics on a wide range of materials. Operating at temperatures from 5 to 85 °C and humidity values from 0 to 98 %RH, the IGAsorp-CT offers the widest combined range of any DVS analyzer. An optional internal heater allows fully programmable pre-heating and thermal desorption measurements to 350 °C.
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Thin-film deposition
Plasma Source
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SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Mixed Injection System Liquid Vaporizer
MV-2000
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The MV-2000 achieves stable vaporization, even at low temperatures, using the new tornado flow method. This is suitable for vaporization a range of liquids even challenging sources such as "High-k", a liquid source which is pyrolyzed easily.
