Showing results: 121 - 135 of 325 items found.
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CAMSIZER -
Retsch Technology GmbH
Dynamic Image Analysis (DIA) is a modern high-performance method for the characterization of particle size and particle shape of powders, granules and suspensions. Retsch Technology's optical analyzers CAMSIZER P4 and CAMSIZER X2 are based on this technology, covering a measuring range from 0.8 m to 30 mm.
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Microtrac
Since the release of the 7991 in 1974, the first commercially available particle size analyzer, Microtrac has been at the forefront of Laser Diffraction technology. By continuously improving the instrument technology, Microtrac offers customers a robust portfolio of Laser Diffraction instruments that’s ideal for particle sizing and characterization.
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TQC B.V.
Dispersions are often used in latex wall paints, which can thus be diluted with water. The homogenity of a dispersion depends on size and weight of particles. To determine the size of particles the use of a Fineness of Grind gauge or grindometer is needed. For proper mixing and / or stirring a variety of laboratory and industrial tools are available depending on volume or capacity.
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ORTEC
High Purity Germanium (HPGe) DetectorsSilicon Charged Particle DetectorsScintillation DetectorsORTEC is a leading supplier of solid-state, high resolution, semiconductor radiation detectors. These radiation detectors are used in research, commercial industry, environmental protection, health and medical physics, as well as homeland security to detect gamma-rays, X-rays, and charged particles.
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SZ-100 -
HORIBA, Ltd.
The SZ-100 nanopartica series instruments are flexible analytical tools for characterizing the physical properties of small particles. Depending on the configuration and application the system can be used as a particle size analyzer, or also used to measure zeta potential, molecular weight, (MW) and second virial coefficient (A2). Typical applications for the SZ-100 include nanoparticles, colloids, emulsions, and submicron suspensions.
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SICK Sensor Intelligence
The reliable way to detect low dust concentrationsLight scattering by dust particles is a measurement principle that allows even very low concentrations of dust to be detected. Depending on the system-specific requirements, either forward scattering or backward scattering can be used in this context. Both measurement principles return stable and reproducible measurement results, regardless of the gas velocity, humidity, or dust particle charges.
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KW-LU -
JFE Advantech Co., Ltd.
This advanced belt conveyor-type constant feeder weighs various raw materials in particle or powder form, and products on the belt conveyor.
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AJ-1000 -
Rtec Instruments
The state of the art Rtec Air jet erosion tester AJ-5000 allows to test repeated impact erosion test that delivers a stream gas with abrasive particles. The tester comes with close loop temperature control upto 900C. The tester is used to rank erosion of various materials, coatings etc. across a wide range of abrasive particle materials, shape, size at various temperature and impact speed.
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3140 -
TSI Inc.
Automated Filter Tester 3140 utilizes the same, proven, oil-aerosol generator technology found in Models 8127 and 8130. It produces oil aerosol without heat, so a variety of oils can be used. Two Condensation Particle Counters (CPCs) simultaneously count upstream and downstream particles. This enables quick, accurate, and repeatable measurements of filters with efficiencies as high as 99.999999% (eight 9’s), or penetrations down to 0.000001%.
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DEM Solutions Ltd.
Whether you want to deploy Discrete Element Method in your research or want to expand your curriculum with a DEM-related subject, EDEM software can add another dimension to your research and help expand horizons for your students. * Combine DEM simulation with experimental investigation to understand processes involving particles, * Develop new equipment and methods for bulk solids handling and processing, * Investigate fundamental characteristics of particle systems
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Electrogrip Company
Lightweighted and low-expansion chucks with 10nm active-area flatness are required in EUV lithographic tools. These chucks also have low outgassing and low particle generation.