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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Ultraviolet Checker
For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Extreme Environment Sensors
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Economic Extreme Power Temperature Forcing System
ECO Cool
ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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Light source
UVM-MP
Measurement of maximum of 6 points is possible. By use of thee sensor amplifier box, distance between the light receiving inlet and the controller can be extended to 10 meters. Measurement start signals can be independently output by remote control. This is useful for the light source fixtures integrating shutter mechanism.
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Light Booths
Konica Minolta Sensing Americas, Inc
Konica Minolta’s Light Booth products provide accurate results when inspecting a range of unique products including inks, paints, plastics, textiles, paper and colorants. Light booths simulate lighting conditions which allows testing in a multitude of different lighting conditions. This allows for incredibly precise color measurements in a spectrum of different lights and angles.
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Light Meters
LXP-10A
The new LXP digital light meter family allows for a very precise measurement of illuminanace. Thanks to very high resolution (resolution 0.001 lx ) allows for escape route emergency light measurement. All of three light meter have built-in memory for measurement result storing, and additional function making work much easier.
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Light Shaping
VirtualLab Fusion supports light shaping by freeform surfaces, diffractive beam splitters and pattern generators, diffusers, and general arrays of micro-optical components, including, but not limited to, micro-lens arrays.
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Extreme Performance AI NVIDIA Rugged Computer
JetSys-5320
Jetsys-5320 drives critical AI applications at the edge with a rugged small form factor enclosure. A server-class AI processing system based on the NVIDIA® Jetson™ TX2i SOM, along with a dual-core Denver 2 64-bit CPU and quad-core ARM A57 complex.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Light Meters
Light Meters are used to measure the light output of an illumination source for a number of optical applications. Light Meters are measurement devices that feature photodiodes to determine the level of light transmitted from a source. Light Meters possess simple, easy to read screens upon which measurements are displayed in one or more photometric units. Most Light Meters possess traceable NIST certification for proof of accuracy.
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Light Source
pE-300ultra
CoolLED's pE-300ultrais a fluorescence microscopy light source which offers intense, broad-spectrum LED illumination for imaging most common fluorescent stains. Users have access to both microsecond switching via multiple TTL inputs and the ability to mount inline excitation filters. This, when paired with today's high performance multi band filter sets, facilitates imaging traditionally done via a white light source and a filter wheel, with all the benefits of LED.
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GO-SPEX200 Ultraviolet Space Radiation Distribution Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
GO-SPEX200 adopts the special darkroom-integrated design, integratesl electric, radiation, temperature controller, it specialized for UV LED package (including integrated packaging) of the total radiation flux, spatial distribution of radiation intensity (light distribution performance), radiation intensity data, angle, total radiation flux accurate testing, comply with relevant standards.
