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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Ultraviolet Light Distribution Measurement Film
UVSCALE
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UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Light Sensors
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ams provides the industry’s broadest portfolio of high-performance and high-sensitivity digital discrete and integrated module optical sensors.
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Light Meters
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Meter reads from 0 to 1,999 foot-candles (resolution 0.1 to 1). Bright 1/2-inch-high digits make it an easy to read pocket light meter. The simplicity of the two-button operation eliminates the need to refer to directions. Functions are on/off, and range. The meter can be zeroed with the simple turn of an adjustment screw
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Chamber Light
LED-CL
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The Teledyne Bowtech LED-CL Chamber Light is extremely safe and reliable, due to its advanced technology and innovation.The light has 100,000 hour life and has been designed specifically for use within the Hyperbaric Diving environment, whether that is in Hyperbaric Chambers, TUP's, Diving Bells or even Wet Bells.
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Light Meter
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Lumu Light Meter incorporate two state of the art sensors. True color sensor, based on the color standard CIE 1931/DIN 5033, and fast silicon photodiode capturing light at astonishing 750 000 measurements/second. Each Lumu Light Meter is calibrated before leaving the manufacturing line and comes with calibration certificate.
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Light Source
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OrienTek Optical Technology Ltd.
High Precision● Highly accurate unit offering 6 calibrated wavelengths● Interchangeable connectors● Durable and reliable design● Easy-to-use interface forerror-free testing● Rubber armor protection
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Light Meter
DL1076
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Switchable between LUX and FC (footcandles). Auto-ranging. Auto-zero at turn-on. Display hold function. Analog output (2 VDC F.S.)
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Light Meter
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Shenzhen UYIGAO Electronic Technology Co., Ltd
Digital Luxmeter Lux light meter for photography Photometer Mini spectrometer spectrophotometer Luminometer
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Lighting ICs
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Based on its 30-year experience in power conversion and high-voltage technology, ST offers a wide portfolio of solutions for electronic ballasts, ranging from high-voltage ballast controllers for analog solutions (with or without embedded PFC), to complete power management units with integrated drivers and voltage regulator for digital platforms.
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Light Sources
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The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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Economic Extreme Power Temperature Forcing System
ECO Cool
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ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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High Power White Light LED Light Sources
LS-HP1
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The LS-HP1 is a series of high-power, high brightness light sources for liquid light guides (LLG). It is characterized by its outstanding luminance and thus delivers very high light output from liquid light guides.The LS-HP1 works with the latest generation of high-power LEDs with up to 100W power from an area of less than 15mm² and is significantly brighter than a conventional halogen light bulb with 150W. The LS-HP1 is available for liquid light guides with core diameters of 3 or 5mm.
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Light Measurement
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Light is produced from many natural and artificial sources. Controlling light and having an accurate understanding of its output, directionality and the appearance of what it irradiates is key to product development, quality and the success of a light source. Here are just a few examples of why Labsphere is leading the industry in light measurement.
