MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
Categories
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Mass Flow Controllers
Enabling Productivity Through Flow Control Innovation. Our wide range of mass flow controllers are available in thermal and pressure based sensor technologies, analog and digital communication, and metal or elastomer seals.
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Special Application Thermal & Pressure Mass Flow Controllers
Certain process vapors and gases require mass flow controllers of a special design specific to the material as well as process conditions. MKS offers both thermal mass flow controllers and pressure based mass flow controllers for these applications that require flow control at elevated temperatures and/or low pressure drop conditions given the source material characteristics.
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MultiGas™ TFS™ Gas Monitor For Multi-Compound Gas Analysis
The MultiGas™ TFS™ Monitor is an online, multi-compound, trace gas monitoring system in a stand-alone 19-inch rack enclosure. It uses an innovative tunable filter spectroscopy technology enabling high selectivity and stability measurement. Low detection limit (sub-ppm levels for most gases) is achieved through the use of high throughput optics coupled with a long-path gas cell and a high sensitivity detector.
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Residual Gas Analyzers
Residual Gas Analyzers are an effective tool to analyze system gas loads resulting from real leaks, virtual leaks or chamber wall outgassing. RGAs have a number of advantages over traditional, dedicated gas leak detectors including the ability to differentiate between different gas species, comparable sensitivity levels, the ability to detect internal or "virtual" leaks and to detect and analyze outgassing problems.
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Automation Controllers And Modules
Our complete automation platform solution along with a suite of automation control hardware and software configurable modules allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution.
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Elite™ 13.56 MHz RF Plasma Generators
The elite™ Series of RF plasma generators provides state-of-the art technology in a compact air-cooled package. The elite is designed with high speed closed loop control, a class E RF deck and a switching modulator for superior output performance. The elite design utilizes a single printed circuit board assembly for the full rack product virtually eliminating all internal wires and connectors and thereby providing the highest reliability available.
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Vacuum Process And Chamber Environment Monitors
Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
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Compact Pressure Transducers And Switches
Compact Baratron® capacitance manometers are ideal for space constrained applications. Compact pressure transducers provide an analog output proportional to pressure, while compact pressure switches provide a relay output based on pressure.
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Industrial Pressure Transducers
These industrial Baratron® capacitance manometers feature industrial enclosures and higher operating temperature ranges for industrial pressure measurement applications.
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Reference Pressure Transducers
These Baratron® capacitance manometers offer our highest level of presure measurement accuracy making them ideal for calibration transfer standards.
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Microwave Plasma Subsystems
AX2600 And AX2700
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Dissolved Carbon Dioxide (DI-CO2) Ultrapure Water Delivery System
The DI-CO2 is used in single substrate cleaning tools for rinsing steps to prevent ESD effects and/or corrosion by creating UPW (ultrapure water) with precisely defined conductivity. It is a compact system for tool integration, providing conductive DI-CO2 water (Carbon Dioxide) with closed loop controlled conductivity. The conductivity is kept at a constant value under changing flow conditions by control of the CO2 concentration in the DI-CO2 water.
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Industrial Absolute Pressure Transducers
These industrial Baratron® capacitance manometers feature absolute pressure measurement, industrial enclosures, and higher operating temperature ranges for industrial applications.


















