Showing results: 31 - 45 of 93 items found.
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MKS Instruments
SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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MKS Instruments
The Precisive® Gas Analyzer is a real-time gas analyzer based on MKS' unique Tunable Filter Spectroscopy (TFS™) platform. The Precisive suite of products are calibrated for the measurement of a wide range of gases across multiple process industries. The real-time, continuous measurement capability provides immediate analysis ensuring control of critical process parameters.
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SEMOZON® AX8410 -
MKS Instruments
The SEMOZON® AX8410 PRIME is the initial product offering in MKS' next generation platform of compact, high concentration, high flow, ultra clean ozone generators. It features a newly designed cell and power structure to achieve twice the ozone output of earlier models with a similar footprint.
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MKS Instruments
MKS process and monitoring solutions feature real-time, web-enabled, hardware, software, and systems to support a variety of tools and processes. These solutions improve performance and yield while reducing tool damage and false alarms.
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MKS Instruments
As innovators in programmable control, communication protocols, embedded analytics, and gateway technology, MKS has the critical building blocks and experience to deliver the latest technologies for distributed automation control and process monitoring to our customers, personalized for their exact requirements. We offer a complete Automation Platform solution along with a suite of Automation Control hardware and software configurable modules that allow semiconductor and other industrial manufacturing customers to better automate their processes through computer-controlled automation and seamlessly integrate with existing MKS products to provide a complete solution. Our expertise in control technology enables manufacturers worldwide to operate with greater productivity and streamlined efficiency. MKS works closely with our customers to provide proven, real time solutions that save time and money, reduce inefficiencies and enable faster implementation.
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MKS Instruments
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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MKS Instruments
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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MKS Instruments
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
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MKS Instruments
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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MKS Instruments
SmartPower® AX2500 Series intelligent microwave power generators are built on proven experience in designing rugged, reliable microwave power generators for demanding semiconductor fabrication and industrial applications. The compact AX2500 design architecture incorporates field-proven technology, and combines new design features aimed at improved performance and lower cost of ownership.
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AX2500 -
MKS Instruments
SmartPower® AX2500 Series intelligent microwave power generators build on ASTeX's experience in producing rugged, reliable microwave power generators for demanding semiconductor fabrication and industrial applications. The AX2500 design architecture incorporates the best of ASTeX field-proven technology, and combines new design features aimed at improved performance and lower cost of ownership.
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MKS Instruments
Certain process vapors and gases require mass flow controllers of a special design specific to the material as well as process conditions. MKS offers both thermal mass flow controllers and pressure based mass flow controllers for these applications that require flow control at elevated temperatures and/or low pressure drop conditions given the source material characteristics.
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SEMOZON® AX8415 -
MKS Instruments
The SEMOZON® AX8415 is the most innovative and versatile ozone generator developed by MKS. Ultra clean, high concentration, high flow ozone is produced by this generator's novel architecture and patented cell design, converting oxygen to >400 g/Nm3 of high concentration ozone for leading-edge applications in the semiconductor, flat panel display and photovoltaic industries.