MKS Instruments
MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor, and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity.
- 978-645-5500
- 2 Tech Drive
Suite 201
Andover, MA 01810
United States of America
Categories
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Stand-alone Ozone Delivery System For Advanced Processes
SEMOZON® AX8585
SEMOZON® AX8585 stand-alone ozone gas delivery system is designed around the AX8410 PRIME ozone generator to provide high flow, high concentration, ultra clean ozone generation and delivery. This fully configurable product line is designed to meet the ever changing needs of the semiconductor industry. Each SEMOZON AX8585 is a fully integrated, high output ozone gas delivery system intended for use in an increasing number of semiconductor process applications such as ALD, CVD, TEOS/Ozone CVD, photoresist strip, wafer cleaning, contaminant removal, and oxide growth.
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High Flow Mass Flow Controllers
High flow thermal mass flow controllers and meters offer both elastomer and metal seals for flow rates up to 300 slm. Versions are available for standard and harsh environments where protection from water and dust is required.
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Fully Integrated Modular Ozone Delivery System
SEMOZON® AX8580
The SEMOZON® AX8580 Ozone Delivery System generates and delivers high flow, high concentration, ultra-clean ozone for advanced thin film applications. The SEMOZON AX8580 is specifically designed for use with an increasing number of semiconductor process applications such as ALD, CVD and TEOS/Ozone CVD.
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High-concentration, High Flow Ozone Generator
SEMOZON® AX8407
The SEMOZON AX8407 generator converts pure oxygen into ozone through silent electrical discharge and achieves high output and high concentration level. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the presence of contaminants, e.g. NOx compounds, is extremely low.
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R*evolution® Remote Plasma Source
The innovative R*evolution® Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination. Self-contained and compact, R*evolution delivers up to 10 slm of oxygen radicals from a 6kW power supply with true power accuracy of <1% resulting in a high density, extremely clean radical source for photoresist strip and an optimal clean rate greater than 12 microns/min-1. R*evolution can be used for other surface preparation applications.
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Atmospheric Pressure Gas Analyzers
The Cirrus™ single-quadrupole mass spectrometers are powerful analytical tools for a wide range of laboratory and industry-based gas analysis applications. The Cirrus family, featuring the Cirrus™ 3 and Cirrus™ 3-XD atmospheric pressure gas monitoring systems are ideal for analysis of bulk gas, gas composition, and detection of trace gasses and contamination. These powerful, versatile and customizable platforms, when combined with Process Eye™ Professional software and its recipe-based control, can significantly boost your productivity.
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Vapor Source Mass Flow Controller With Viscous Choked Flow
The 1150C Vapor Source Mass Flow Controllers are pressure based measurement and control systems designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas using viscous flow through a choked orifice.
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High Accuracy In-Situ Mass Flow Verifier
HA-MFV
The HA-MFV, High Accuracy Mass Flow Verifier is designed for use on process tools to verify mass flow control flow rates in-situ. Available with EtherCAT® or DeviceNet™ communications and measurement accuracy of 1.0% of reading, the HA-MFV can verify MFC flow with the actual process gas significantly better than older rate-of-rise devices or process chamber rate-of rise methods.
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AD06A Baratron® Differential Pressure Sensor
AD06A Baratron® differential pressure sensors are single-ended dual-electrode/AC bridge devices that are extremely stable and designed to minimize the effect of temperature changes. Full Scale ranges are available from 25,000 Torr down to 0.1 Torr. Each range measures down to 1 part in 106 Full Scale with selected percent Reading accuracy limited by this resolution and with accuracies ranging from 0.25% to 0.05% of Reading. They are constructed of Inconel® and stainless steel, allowing use with many wet, dirty, or corrosive gases.
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Fast and Repeatable Mass Flow Controllers
G-Series
G-Series Mass Flow Controllers and Meters are cost effective thermal flow controllers with fast and repeatable performance that are well suited for most industries and applications.
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Granville-Phillips® 835 Vacuum Quality Monitor System
The Granville-Phillips® Series 835 Vacuum Quality Monitor (VQM™) combines the highest performance gas analysis technology with intelligent functional design that transforms complex measurement into actionable information. The 835 VQM is the world's fastest, lowest power mass spectrometer with full data collection, spectral deconvolution, and data logging at 85 ms capture rates for the full 1-145 amu measurement range or 125 ms for 1-300 amu.
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Chemical Downstream Plasma Source
The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
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2450 MHz Industrial Microwave Generators
Alter® 2450 MHz Industrial Microwave Generators are built on MKS Alter® Product experience and designed with rugged and reliable switch mode power supplies for demanding industrial applications. They offer compact generators up to 3kW in a 19 inch standard rack with a remote head and integrated isolator.
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Vapor Source Mass Flow Controller With Viscous Laminar Flow
The 1152C Vapor Source Mass Flow Controller is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas. The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control.
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Dissolved Gas Systems
Dissolved gas in deionized water has been widely adopted in manufacturing processes in Electronics, Semiconductors, Flat Panel Displays and Solar applications. These wet techniques increase manufacturing productivity in particle lift-off and wet clean operations. Dissolved gases such as Ammonia, Carbon Dioxide and Ozone are environmentally friendly alternatives to heavy chemicals like sulfuric acid and peroxide acid solutions. MKS offers a large product line of Dissolved Gas systems that improve wet cleaning operations.


















