Showing results: 16 - 21 of 21 items found.
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MODEL VES-3000 -
TEK-VAC INDUSTRIES Inc.
TEK-VAC's VES-3000 coater station model offers a modular concept for thin film deposition. Common PVD techniques which can be employed in this compact unit include thermal and electron beam evaporation. A 2KVA SCR controlled filament evaporation power supply is provided. Optional ion deposition and magnetron sputtering devices can be incorporated in the system.
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Model MPS-2000 -
TEK-VAC INDUSTRIES Inc.
Accurate linear wafer transporter with low particulate generation. Automated options with programmable controls. Safety interlocked with local and global interfaces. Base pressures to 10-8 torr. Optional clean room load lock entry port. Option for inductively coupled plasma processing is available. Complete and ready to operate.
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PA-3000-A ETCHER -
TEK-VAC INDUSTRIES Inc.
Process chamber with plasma view window and full access hinged door. RF hot process shelves with opposing ground electrodes. Throttle valve. Capacitance manometer. Internal pumping system with option for Fomblin filled chemical series mechanical pump. Flow control electronics and cabinet. Up to four mass flow control assemblies can be incorporated into our system. RF matching network and 600 watt maximum power supply. Fully enclosed cabinet. Custom internal fixturing to accommodate specific substrate shapes and sizes. Plasma gas selection for optimal performance.
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Model UHV-CVD-5000 -
TEK-VAC INDUSTRIES Inc.
ur Ultra-High Vacuum CVD system is utilized for multi-wafer processing of doped and intrinsic high quality epitaxial films, including materials such as Silicon Germanium.End products include SiGe components (RF & microwave devices, amplifiers, switches, discrete HBTs, and low noise MMICs) utilized in wireless communications applications such as cellular phones, pagers, local area networks, telemetry and sensors.
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Model MSI-3000 -
TEK-VAC INDUSTRIES Inc.
The Tek-Vac MSI-3000 is a general purpose inlet system, utilized for introduction of precision gas quantities into a mass spectrometer for quantitative analysis.Combined with Tek-Vac's proprietary stainless steel passivation for nuclear applications, the MSI-3000 may be implemented in functions where handling and exposure to hydrogen isotopes is required.
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Model DRIE-1200-LL-ICP -
TEK-VAC INDUSTRIES Inc.
Single process chamber for high rate plasma etching of 200mm wafers. Loadlocked. Stainless steel construction. Capabilities of smaller, multiple wafer throughput. Substrate materials include (but are not limited to) silicon, silicon oxynitrides, SiC, SiGe, Aluminum, and III-V compounds including GaAs, GaN, GaP, and InP. Stable plasma generation capabilities to below 1 mTorr. Five, Six, or Eight gas mass flow controllers are standard. Expanded or reduced numbers are available upon request.