- Taylor Dynamometer, Inc.
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Towing Dynos for Full-Sized Cars & Light Trucks
Designed to maintain 2,248 to 5,620 lb (10,000 to 25,000 N) of constant drawbar pull, our towing dynamometers for full-sized cars to light trucks are powered by an industrial generator to provide unlimited testing at low speeds. Each model features aluminum frame, independent suspension, aero dynamic body and wireless touchscreen controller.
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EUV Lithography
EXE systems
EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Ultraviolet Meter
UVR Series
UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Extreme Environment Sensors
Kaman Fuzing & Precision Products
For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Light Simulator
From the review of the scientific development history, reliable and stable artificial light sources have played a very important role in the past century. For example, the artificial solar simulator is an important part of simulating sunlight to ensure accurate performance of PV characterization. With the growth of light sensor applications, more and more requirement of light simulators (or artificial light sources) explored. One of the core technologies of Enlitech is the artificial light sourc...show more -
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Light Sources
For applications such as transmission, absorption, and reflection, illumination sources are needed. Avantes offers a wide range of different types of light sources, to suit your specific application needs. An overview of the different types of light sources can be found below.
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Light Microscopes
Compound light microscopes from Leica Microsystems meet the highest demands whatever the application – from routine laboratory work to the research of multi-dimensional dynamic processes in living cells.
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Light Engines
Delivering the highest brightness and optical power available, our light engines provide optimized output solutions for a range of applications such as light guide and fiber optic coupling, fluorescence excitation, and unrivaled uniform near and far field illumination.
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Light Transmitter
Measure Range: Range 1: 0-2,000 LuxRange 2: 2,000-20,000 LuxRange 3: 20,000-50,000 LuxOutput: 4-20 mARange 1: 1,000 Lux = 12mA2,000 Lux = 20 mARange 2: 2,000 Lux = 5.6mA20,000 Lux = 20mARange 3: 20,000 Lux = 10.4 mA50,000 Lux = 20 mA90 - 260 ACV50 Hz/60 Hz
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Light Transmittance Meters
Shenzhen Linshang Technology Co., Ltd.
As a manufacturer of desktop spectrum transmission meter, Linshang Technology provides you with a series of light transmittance meters, including LS108A, LS108D lens transmssion tester for testing IR holes of mobile phone covers, and LS108 blue-violet tester for eyeglass lenses. Universal desktop light transmission meter LS108H, portable optical transmission measuring instrument LS183.
