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*Beam Profiling For 266nm To 3000µm
Unlike a power meter that measures average or instantaneous Watts or Joules of the overall laser beam, knowing how the power is distributed within the beam is equally as important. As an example, if you want to cut something the power should generally be focused in the center of the beam to concentrate the power density in a very small area but if you were trying to weld something with all the power in the center you would poke a hole in the weld; requiring the power to be equally distributed as in a top hat profile.
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Beam Directing and Reflecting Optics
Beam directing and reflecting optics simply reflect, bend or translate the beam, but do not typically modify the polarization, except for polarizing beam splitters. For example, mirrors, cube corners and retroreflectors are attached to objects that move in order to keep the weight down on the moving object (instead of mounting the interferometer on the moving object).
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Specialized Beam Profiler Systems
DataRay offers specialized beam profiler systems. These systems offer solutions for complex applications. The large beam profiling system is suitable for beams up to 200 mm image area, and the line laser profiling system provides for direct measurement of line lasers up to 200 mm in length.
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Beam Pattern Measurement System
BP100
The BP100 is purpose-made for luminous intensity measurement of lamps, using a diffusely transmitting screen to provide a flat image that can be measured by an imaging photometer. This is a low cost, versatile solution in comparison to the traditional method of measuring lamp properties as a function of angle of emission, using Goniometers that are often costly and dedicated for one specific measurement.
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Non-Contact Beam Profiler
BeamWatch
The patented BeamWatch non-contact profiling system accurately captures and analyzes industrial multi-kilowatt lasers wavelengths from 980nm - 1080nm by measuring Rayleigh Scattering. It features a complete passthrough beam measurement technique, no moving parts, and a lightweight compact design which makes it ideal for comprehensive analysis of industrial multi-kilowatt lasers
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Beam and Singlepoint Load Cells
We have trimmed all the non-essential fat off these load cells, however you can be sure that nothing has been trimmed from the actual load cells, they are precision tested and certified to meet all the exacting requirements on the downloadable technical specifications shown below.
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Electron Spin Resonance Spectrometer
ESR
Electron Spin Resonance (ESR) is a powerful analytical method to detect, analyze and determine thecharacteristics of unpaired electrons in a substance. It is clear that the state of electrons in a substance have a strong influence on its characteristics and functionality, so evaluation by ESR is becoming more and more important. Many types of substances, from electronic materials to catalysts, biological samples, can be studied regardless of whether they are solid, liquid, or gas. A wide range of ESR techniques are possible using suitable attachments together with the basic instrument.
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Scanning Slit Beam Profiling
NanoScan
Measure your beam as never before with the NanoScan™ beam profiler. The advantage of scanning slit beam profiling is sub-micron precision for measuring beam position and size. Scan head configurations include Silicon, Germanium, and Pyroelectric versions for a wide range of wavelengths and laser power levels. The NanoScan software is available in two versions: Standard and Professional, and includes an extensive set of ISO quantitative measurements, an M2 Wizard, and the ability to measure laser power.
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Electron Diffraction System
Modern physics is the post-Newtonian conception of physics. It implies that classical descriptions of phenomena are lacking, and that an accurate, " Modern", description of nature requires theories to incorporate elements of quantum mechanics or relativity, or both. This section includes many of the most important experiments in physics, including e/m tubes, the Franck-Hertz experiment, and nuclear magnetic resonance (NMR)
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Shear Beam Load Cell
SB-1.0
The Shear Beam Load Cell SB-1.0 is a single point weighing device, suitable for use in multiple applications.
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Ion Beam Etch
Nexus IBE Series
Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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UV-Vis Double Beam Research Spectrophotometer
UVD-3500
The high- performance blazed holographic grating and the optimized CT-type Monochromator reduce stray light, and widen the photometric range. Wavelength range: 190 nm – 900 nm. Spectral bandwidth: 0.1, 0.2, 0.5nm, 1.0nm, 2.0nm, and 5.0 nm.(UVD-3500).
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Single Light Beam Safety Devices
Leuze electronic GmbH + Co. KG
Single light beam safety devices can be integrated flexibly into machine concepts – particularly in constrained spaces or where no flat mounting surfaces exist. They are used for point of operation and access guarding as well as for collision avoidance. The safety sensors are available as type 2 and type 4 devices with external monitoring as well as self-monitoring type 4 devices.
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UV-NIR Beam Profiler
CinCam
CINOGY Technologies CinCam is optimized to provide excellent sensitivity from the UV to NIR spectral range involving CCD/CMOS/InGaAs technologies. Thanks to its high resolution and its small pixel size, the CinCam ensures the highest accuracy in laser beam analysis of cw and pulsed laser systems. The plug and play design facilitates easy and flexible adaption to standard optical components.
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Economical Bending Beam Load Cells
EBB SERIES
The EBB Series is a economical low capacity bending beam load cell suitable for use in a variety of industrial and OEM force measurement and weighing applications. It is made of an aluminum alloy and comes in 1, 2, 5 and 10 kilogram ranges.
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*Beam Propagation Analysis
M²
M², or Beam Propagation Ratio, is a value that indicates how close a laser is to being a single mode TEM00 beam, which in turn determines how small a beam waist can be focused. For the perfect Gaussian TEM00 condition the M² equals 1. M² cannot be determined from a single beam profile measurement. The ISO/DIS 11146 requires that M² be calculated from a series of measurements. M² is measured on real beams by focusing the beam with a fixed position lens of known focal length, and then measuring th...show more -
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S Beam Load Cell
Futek Advanced Sensor Technology, Inc.
FUTEK S Beam Load Cells (Tension/Compression) offer a compact design for a variety of applications. Available in standard and metric, the S Beam Load Cell series provides accuracy, compact design features, overload protection (select models), and a wide capacity range to choose from. S Beam Load Cells are also commonly known as Z Beam Load Cells or S Type Load Cells.
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Digital Laser Beam Analyzer
ScienceGL offers economic laser beam profiling solutions for laser beam measurement, diagnostics and analysis. The Digital Laser Beam Profiler allows you to analyze laser output quickly and accurately at fraction of the market price. The profiler utilizes our advanced computer graphics engine for best visual perception of the beam in 3D realistic representation. Traditional 2D plot colored by the look up table (LUT) is also available.
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Electron Sources
SPECS Surface Nano Analysis GmbH
To our customers in research and industry we offer a variety of sources for deposition, excitation and charge neutralization as well as analyzers and monochromators. Most of our sources originate from product lines which we have taken over from Leybold AG, Cologne, and from VSI GmbH. The X-ray monochromator Focus 500 and the UV monochromator TMM 302 are original developments by SPECS.Compliance with industry standards, a good price-performance ratio, stability, and longevity are the guidelines for our product development. We focus on standardized easy handling, user-friendliness, standardized software interfaces and safety.
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Large Aperture Beam Profilers
Modern laser applications seldom require large beam profiling, combined with high resolution. The BeamOn HR 1" is the perfect solution enabling both relatively large beam characterization, with a high resolution detector of 20 MP. By implementing a diffuser to present the beam to a smaller detector via dedicated optics, one of the largest beam profilers of 60 mm is offered, i.e BeamOn LA U3. Even further than that, for collimated beams the Laser Analyzing Telescope offers an input aperture of 100 mm combined with high resolution, attitude and divergence measurement of the laser beam.
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Linear Electron Accelerators Where Electrons Reach Energy Of Up To 10 MegaWatt
*Processing polymer materials and modifying their parameters*Processing semiconductor materials and devices*For treating food products for disinfection, eliminated bugs, pathogens, and micro-organisms, and increasing their shelf life*Processing diamonds, precious stones and semi-precious stones to change their color
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Automated Laser Beam Quality Measurement System
Beamage-M2
Large Apertures: The only M2 system on the market equipped with a complete set of 50mm optics. Also, the sensor is 11.3 x 11.3 mm. Simple Alignment: Two beam-steering mirrors are included for quick and easy alignment of your laser into the system. The internal mirrors are factory-aligned and the pre-set height also simplifies the alignment.Available Fall '17
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EQE/Photon-Electron Conversion Testing
Enlitech offers different solutions for incident photon-electron conversion testing systems. The available systems include IPCE, PV External quantum efficiency (PV-EQE), Internal Quantum Efficiency, Spectral Response (SR), Highly-sensitive EL-EQE. There are over 1,000 SCI papers cited Enlitech‘s systems to provide reliable experimental data for significant scientific publication. The Highest PV-EQE sensitivity and EL-EQE both reach 10-5 % (7 orders). They can be utilized to PV conversion efficiency, HJT/ PERC/TOP-CON current-loss analysis, Organic PV charge-transfer-state and Perovskite PV trap state measuring, and Organic PV and Perovskite PV Voc loss analysis.
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4% Beam Splitter
10725B
The 10725B 4% beam splitter, designed for beam diameters of 9 mm or less, reflects 4% of the total incoming laser beam and transmits 96% straight through. This optic is without housing and requires a user-supplied mount.
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Beam Lead Capacitors
Beam lead capacitors have high insulation resistance, low dissipation factor, and low temperature coefficient, which allow for use in military and aerospace designs. Their robust performance and small form factor provide repeatable performance.
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Taper System, CCD Beam Imaging Camera
TaperCamD series
355 to 1150 nm, standard CCD detectorHyperCal Dynamic Noise and Baseline Correction software (Pat. Pending)CTE Comet Tail Elimination for > 900 nm (Pat. Pending)Port-powered USB 2.0; flexible 3 m cable, no power brick14-bit ADC, 4 MB image buffer & on-board microprocessorWindow-free sensors standard for no fringing25,000:1 electronic auto-shutter, 40 s to 1000 ms1,000:1 SNR (30/60 dB Optical/Electrical)
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Spectro UV-Vis Dual Beam
UVS-2700
Spectro UV-Vis Split Beam PC is a precise scanning Spectrophotometer with a new design of 8 microprocessor automatic 2 row cell holder that moves noiseless with a special membrane. This Split Beam Spectro has a dual detector and a very accurate system.
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Laser Beam Alignment
The alignment product line provides full solutions for applications such as: alignment of laser cavities, straightness measurement, machine alignment, wide-bed printers alignment and others. The AlignMeter system simultaneously measures incoming laser beam position (in µm) and angle (in µRad).It is a powerful compact device perfect for alignment monitoring, for testing the drift, centration and beam alignment relative to the outer housing or tube.
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Electron Probe Microanalyzer
JXA-8530FPlus
JEOL commercialized the world's first FE-EPMA, the JXA-8500F in 2003. This highly regarded FE-EPMA has long been used in various fields, such as: metals, materials and geology in both industry and academia. The JXA-8530FPlus is a third-generation FE-EPMA that comes with enhanced analytical and imaging capabilities. The In-Lens Schottky field emission electron gun combined with new software provides higher throughput while maintaining high stability, thus allowing a wider range of EPMA applications to be achieved with higher resolution.
