Showing results: 901 - 915 of 3765 items found.
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FCT-650 -
Sinton Instruments
Advanced analysis of solar cells including light I-V and Suns-Voc data.
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National Technical Systems
NTS testing covers compatibility, functionality, interoperability, performance, and competitive analysis.
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Shimadzu Corp.
An enormous number of MRM conditions need to be evaluated in order to analyze a large number of proteins. This MRM library includes such analysis conditions, greatly facilitating the initial preparation for analysis. By allowing the use of proven methods, it greatly reduces the time needed for method development.
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Dewesoft d.o.o.
Order Tracking AnalysisOrder tracking analysis is a tool to determine the operating condition of the rotating machines such as resonances, stable operation points, determining a cause of vibrations. Dewesoft provides a flexible order analysis software and data acquisition hardware for every rotating machinery and rotordynamics.
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FPL1000 -
Rohde & Schwarz GmbH & Co. KG
In an RF lab, the R&S®FPL1000 is as indispensable as an oscilloscope or multimeter. It is a single measuring instrument for a variety of measurement tasks. It supports not only spectrum analysis, but also highly accurate power measurement with power sensors and analysis of analog and digitally modulated signals.
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ZNL -
Rohde & Schwarz GmbH & Co. KG
With the R&S®ZNL, Rohde & Schwarz exceeds these expectations and offers even more: vector network analysis, spectrum analysis and power meter measurements are unified in one single, compact instrument making the R&S®ZNL a universal all-rounder.
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Elemental Analysis, Inc.
XRF is an elemental analysis technique with unique capabilities including (1) highly accurate determinations for major elements and (2) a broad elemental survey of the sample composition without standards. For example, XRF is used in analysis of rocks and metals with an accuracy of ~0.1% of the major elements.
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aixACCT Systems GmbH
The integration of additional measurement technology in probers enables you to flexibly expand the analysis options in the ongoing production process. With the introduction of our Automation Assistant software platform, we have therefore equipped a large number of probers with a wide variety of analysis tools.
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WELDinspect -
Inspectis Optical Systems AB
High-resolution, ergonomic optical inspection systems designed for weld bead analysis and measurement. 4K or Full HD inverted imaging system with motorised zoom, auto-focus, built-in large aperture illumination, and dedicated software for weld bead measurements, analysis, documentation, and reporting.
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testo AG
Combustion analysis in high definition is more than just a brilliant display. It's a combination of proven measurement standards, contractor-rugged design, and Testo's innovation. The result - Testo's series of combustion analyzer - makes combustion analysis easier to perform, easier to control, and easier to understand.
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Material Interface, Inc.
Surface Analysis; X-Ray Photoelectron Spectroscopy (XPS, ESCA), Auger Electron Spectroscopy (AES), Time-of-Flight Secondary Ion Mass Spectrometry (Static) (TOF-SIMS), Dynamic Secondary Ion Mass Spectrometry (D-SIMS). Microscopy & Diffraction; Organic Material Analysis; Bulk Chemistry.
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DigivibeMX® M30 -
Erbessd Instruments, LLC
DigivibeMX® M30 System is the Vibration Analyzer, Dynamic Balancer and Data Collector with more functions in the market. From simple Vibration analysis to complex 3D ODS vibration simulations, DigivibeMX® M30 is the best tool for predictive analysis and diagnosis for your machinery.
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Conductance Measurement and Analysis -
Materials Development Corporation
MDC uses conductance to give a complete picture of MOS devices as well as to correct for series resistance effects. MDC C-V plotters use conductance and capacitance measurements to plot true device capacitance and depletion region conductance.
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MOS Doping Profile Analysis -
Materials Development Corporation
MDC uses the comprehensive Ziegler algorithm toconvert pulsed MOS C-V data to a doping profile. The doping profile is accurate from the oxide semiconductor interface to the maximum depletion depth and is therefore useful for low dose ion implant monitoring. Peak doping, range, and total active dose are computed. The technique is sensitive enough to resolve changes in the substrate doping profile due to redistribution during oxidation.