Inductively Coupled Plasma
-
product
Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
-
product
Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
-
product
Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
Industry-leading performance, speed and ease of use – no compromises
-
product
Inductively Coupled Plasma Spectrometry
Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
-
product
Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
-
product
Inductively Coupled Plasma Emission Spectroscopy
Inductively Coupled Plasma Emission Spectroscopy
-
product
Chemical Analysis and Corrosion Testing
Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
-
product
Inductively Coupled Plasma
Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
-
product
ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
-
product
Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
-
product
Inductive Sensors
Our hygienic sensors are extremely durable against abrasive and aggressive media: their labeling is resistant to abrasion and chemicals. The luminous displays are protected against destruction and the housing construction is optimized for safe cleaning.
-
product
Plasma Power Generators
Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes and benefit from our plasma power generators’ comprehensive capabilities.
-
product
Inductive Sensors
Inductive sensor designed to detect shaft speed, shaft position, gate position, or object presenceTotally sealed constructionMulti-voltage 24 - 240 VAC/VDCDetects ferrous targets up to 5/16" (8 mm)IP 65 Protection
-
product
Coupling Networks
Hilo-Test offers a large number of coupling / decoupling networks for single-phase and 3-phase power supply lines and signal data lines and telecommunication lines. In addition to numerous standard versions Hilo-Test also supplies special variants for higher voltages (e.g. 3x690 VAC or up to 1 KV DC) and high currents (up to 200 A or more), as well as for surge voltages up to 12.kV. TheIEC 61000-4-4/5standardsformainlyvalid.
-
product
Downhole Induction Probe
VECTEM
The three component downhole VECTEM V receiver probe is designed to be used in conjunction with the terraTEM24. It is available as a 42mm outer diameter tool. The VECTEM V is connected to the terraTEM24 via a four core cable which provides power, communications, and signal monitoring.
-
product
Fail-Safe Inductive Sensors
*Certification to EN 60947-5-3 for electromechanical controlgear*Ensuring operator and machine safety*No special actuator for electronic fail-safe sensors required*Connection to safety plc or safe AS-i module*Series connection of sensors and contacts possible
-
product
Inductive sensors
Inductive sensors are signal generators which detect function-related movements of processing machines, robots, production lines, conveyor systems etc. in a contactless fashion, and transform them into electrical signals.
-
product
Coupling Decoupling Network
TBCDN-M4
The TBCDN-M4 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
-
product
Inductive Sensor
HFCT Ø 30-39-50mm
Techimp HFCT is an inductive sensor for partial discharge measurements. It is suitable for on/off line PD tests on many electrical systems (cables, transformers, rotating machine, etc..). It has to be applied to the ground connection of the system to be tested.
-
product
Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
-
product
Remote Plasma Source
MAXstream
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
-
product
2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
-
product
Inductively Powered Telemetry Systems
Advanced Telemetrics International
ATi Inductively Powered Telemetry Systems are typically used to transmit data from rotating shafts or machinery to a stationary receiver.
-
product
Unclamped Inductive Load Tester
ITC55600C
Model ITC55350 is the high current (600A) version of theITC55100 tester. The ITC55350 performs the same testsas the ITC55100 and includes many features that improvetesting accuracy, test results collection, test resultsviewing, and multiple tester networking
-
product
CDN - Coupling / Decoupling Networks
The Coupling- / Decoupling Networks are used to inject common mode disturbances to Equipment under Test (EuT). Further the CDNs provide sufficient decoupling between Auxiliary Equipment (AE) and disturbance signal. The requirements for CDN and their application are described in the standard IEC 61000-4-6 (Immunity to conducted disturbances, induced by radio-frequency fields). CDNs have a common mode impedance of 150 Ohm and are available for a multitude of cable types and connectors.
-
product
Microwave Plasma Subsystems
AX2600 And AX2700
The AX2600 and AX2700 Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 3 kW, these highly reliable, field-proven plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system.
-
product
RF Plasma Generators
Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
-
product
Chemical Downstream Plasma Source
The AX7610 is a microwave plasma source for remote plasma applications. With replaceable quartz or sapphire plasma tubes, the AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The quartz tube version is ideally suited for production of atomic oxygen, nitrogen or argon. The sapphire tube version is compatible with much more severe CF4 CHF3 and NF3 chemistries.
-
-
product
High Power Microwave Plasma Source
The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level.
