Inductively Coupled Plasma
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Product
Induction Heater
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Prominent & Leading Manufacturer from Vadodara, we offer High Frequency Induction Heater, Induction Heating Machine and Induction Bearing Heater.
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Inductive Sensors
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Wide operating temperature range. High protection rating for the requirements of harsh industrial environments. Reliable detection due to low sensor tolerances. Reduced inventory due to wide range of applications.
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Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Inductance Standard
1482 Series
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The GenRad 1482 Standard Inductors are the standard of choice in metrology labs. Used today by national metrology institutes and primary standards bodies around the world, these inductors have no peer or equivlent.
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HV Coupling Capacitors
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Our high-voltage coupling capacitors are a main component of our partial discharge test stations. They serve to decouple the partial discharge impulses and act as a voltage divider, the output voltage of which is matched to our partial discharge measuring devices (with integrated voltage measurement) and peak voltage measuring devices. These high-voltage components are also available separately in their various designs, sizes, capacities and voltage ranges.
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Product
Remote Plasma Source
Xstream
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The highly efficient Xstream® RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance.
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Plasma Emission Controller
RU-1000
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The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.
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Inductive Sensors (LVDT)
induSENSOR
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Micro-Epsilon offers a large range of inductive sensors for displacement and position measurement from conventional LVDT sensors and inductive sensors with integrated controller to customer-specific high-volume versions. The induSENSOR displacement sensors from Micro-Epsilon are used in automated processes, quality assurance, test rigs, hydraulics, pneumatic cylinders and automotive engineering.
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Coupling Decoupling Network
TBCDN-M2
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The TBCDN-M2 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Inductive Sensors
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Inductive sensor designed to detect shaft speed, shaft position, gate position, or object presenceTotally sealed constructionMulti-voltage 24 - 240 VAC/VDCDetects ferrous targets up to 5/16" (8 mm)IP 65 Protection
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Inductive Proximity Sensors (Square)
SP2
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Easy installation, high-speed pulse generator, high-speed rotation control, and more. A wealth of models ideal for limit control, counting control, and other applications. Sensing distance from 1~2/2 ~ 6/ 5~ 12/10~15mm. Housing by PBT with strong structure and acid resisting available.
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Coupling Decoupling Network
TBCDN-M1
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The TBCDN-M1 is a Coupling Decoupling Network for conducted immunity testing according to IEC 61000-4-6.
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Product
High-frequency Induction Heater Unit
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High-frequency induction heater unit is a high frequency generator for non-contact heating of metal using electromagnetic induction.
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Inductive Sensor
Ampstik®
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The Ampstik is easy to use and provides accurate information to anyone working with medium and high voltage. It gives line personnel the right answers so they have the ability to make decisions in the field.
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CDNs - Coupling Decoupling Network
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Coupling Decoupling Networks, commonly called CDNs for IEC-61000-4-6 conducted immunity testing, serve the purpose of Injecting common mode disturbances These CDNs also ensures these signals do not interfere (decoupling) with auxiliary equipment connected to the device under test (DUT)
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Product
Compact Micro-size Inductive Proximity Sensor
GS
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Panasonic Industrial Devices Sales Company of America
The Panasonic GS Compact Micro-size Inductive Proximity Sensor has Sensor heads that come in multiple sizes with a separate amplifier controller.
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