Dissolved Gas Systems
Dissolved gas in deionized water has been widely adopted in manufacturing processes in Electronics, Semiconductors, Flat Panel Displays and Solar applications. These wet techniques increase manufacturing productivity in particle lift-off and wet clean operations. Dissolved gases such as Ammonia, Carbon Dioxide and Ozone are environmentally friendly alternatives to heavy chemicals like sulfuric acid and peroxide acid solutions. MKS offers a large product line of Dissolved Gas systems that improve wet cleaning operations.
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Unlisted Product
Ozonated Water Delivery System
LIQUOZON® DI-O3
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MKS' LIQUOZON® DI-O3 is a dissolved ozone gas delivery system providing high purity ozone in ultrapure water for Semiconductor and Electronic Thin Film applications like contaminant removal and surface conditioning via wet clean or rinsing methods. The high redox potential of ozone causes rapid conversion back to oxygen making it an environmentally friendly alternative to other chemical processes.
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Product
Dissolved Carbon Dioxide (DI-CO2) Ultrapure Water Delivery System
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The DI-CO2 is used in single substrate cleaning tools for rinsing steps to prevent ESD effects and/or corrosion by creating UPW (ultrapure water) with precisely defined conductivity. It is a compact system for tool integration, providing conductive DI-CO2 water (Carbon Dioxide) with closed loop controlled conductivity. The conductivity is kept at a constant value under changing flow conditions by control of the CO2 concentration in the DI-CO2 water.
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Product
Dissolved Ammonia Delivery System
DI-NH3
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MKS' DI-NH3 is a compact, stand-alone system providing dissolved ammonia water. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The DI-NH3 delivers dissolved ammonia, providing optimal cleaning capability in an alkaline chemistry, minimizing material loss and contamination and inhibiting Electrostatic Discharge (ESD). Using closed-loop control, conductivity and pressure are kept stable under changing flow conditions. The dissolved ammonia concentration is monitored and adjusted, delivering the specific NH4OH concentration needed. Dissolved ammonia’s alkaline chemistry provides ESD protection during rinsing, particle lift-off, and residual photoresist removal in middle-of-line (MOL) and prevents corrosion of cobalt/copper interfaces.
