Benchtop Metrology System

Semiconductor

Materials which have a conductivity between conductors (generally metals) and nonconductors or insulators

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Benchtop Metrology Solution

FilmTek 2000 PAR-SE - Scientific Computing International

Our most advanced benchtop metrology solution, engineered to meet the needs of nearly any advanced thin film measurement application, from R&D to production. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to deliver the highest accuracy, precision, and versatility in the industry. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.

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CD Measurement and Advanced Film Analysis

FilmTek CD - Scientific Computing International

SCI’s leading-edge solution for fully-automated, high-throughput CD measurement and advanced film analysis for the 1x nm design node and beyond. Delivers real-time multi-layer stack characterization and CD measurement simultaneously, for both known and completely unknown structures. Patented multimodal measurement technology meets the challenging demands associated with the most complex semiconductor design features in development and production.

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Optical Thin-Film Metrology for Advanced Thin Films

FilmTek 6000 PAR-SE - Scientific Computing International

Production-proven metrology system for film thickness, refractive index and stress measurement for a broad range of film layers at the 1x nm design node and beyond. Accommodates 200 or 300 mm wafer metrology. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to meet the challenging demands associated with multi-patterning and other leading-edge device fabrication techniques.

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Benchtop Metrology System

Topics

Semiconductor

Benchtop Metrology Solution

CD Measurement and Advanced Film Analysis

Optical Thin-Film Metrology for Advanced Thin Films