Plasma CVD & Reactive Ion Etching System
MODEL DRIE-1100-LL-ECR - TEK-VAC INDUSTRIES Inc. (TEK-VAC INDUSTRIES Inc.)
The Tek-Vac DRIE-1100-LL-ECR series systems are designed for both high-density plasma chemical vapor deposition and reactive ion etching of sub-micron integrated circuits, optical devices and RF microwave electron devices.
