The Model 30 UV Light Source is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused using OAI’s proprietary optical integrator which produces a highly uniform UV beam at the exposure plane. Using the appropriate lamp (included with the system), this UV Light Source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm. Output power ranges from 200 watts to 5 kilowatts. All OAI UV Light Sources are equipped with quick-change filter assemblies, enabling the user to customize the output spectrum.
The Model 30E Enhanced UV Lightsource is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm, using the appropriate lamp (included). Output power ranges from 200 watts to 5 kilowatts. All OAI UV Lightsources are easily equipped with quick-change filter assemblies, enabling the user to customize the output spectrum with little effort. Optional remote exhaust fans are available.
The OAI UV Light Source Grande is a large area collimated light source. The device is available with output power up to 10KW. Utilizing collimating mirrors, the UV Light Source Grande is a highly efficient UV light source intended for a variety of larger-scale applications.
This new UV LED lightsource is designed and engineered by the proven lithography experts at OAI. The lightsource delivers a number of unique benefits, the most consequential of which is consistent intensity over an exceptionally long life. The lightsource is highly energy efficient, requires no maintenance or light replacement, and contains no mercury.
The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure system (2000AF); both configurations are based on OAI’s proven, time-tested platform.
The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.The Model 2012SM Automated Edge-bead Exposure System provides a cost-effective method for edge-bead removal using standard shadow mask technology. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.
Dependable and repeatable, The OAI Model 308 UV Intensity/Power Meter is precise, direct-reading instrument designed to measure UV light intensity. The Model 308 features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port and is available with an optional software package that facilitates instant data logging of intensity mode, time, wave length, serial number and calibration due date.
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The Model 308T features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port. Accuracy of the meter is within ±3%and measurement repeatability is within ±3 LSB (least significant bit). Like all OAI precision instruments, the Model 308T provides NIST traceable measurements. This easy-to-use meter is auto-ranging from 0.1 to 1999.9 milliwatts/cm2 full scale when used with the 2000 milliwatts/ cm2 probe. The linearity of the meter in this range is at least ±(.002% + 6 LSB).
The Model 30 UV Light Source is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused using OAI’s proprietary optical integrator which produces a highly uniform UV beam at the exposure plane. Using the appropriate lamp (included with the system), this UV Light Source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm. Output power ranges from 200 watts to 5 kilowatts. All OAI UV Light Sources are equipped with quick-change filter assemblies, enabling the user to customize the output spectrum.
The Model 30E Enhanced UV Lightsource is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm, using the appropriate lamp (included). Output power ranges from 200 watts to 5 kilowatts. All OAI UV Lightsources are easily equipped with quick-change filter assemblies, enabling the user to customize the output spectrum with little effort. Optional remote exhaust fans are available.
The OAI UV Light Source Grande is a large area collimated light source. The device is available with output power up to 10KW. Utilizing collimating mirrors, the UV Light Source Grande is a highly efficient UV light source intended for a variety of larger-scale applications.
This new UV LED lightsource is designed and engineered by the proven lithography experts at OAI. The lightsource delivers a number of unique benefits, the most consequential of which is consistent intensity over an exceptionally long life. The lightsource is highly energy efficient, requires no maintenance or light replacement, and contains no mercury.
The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure system (2000AF); both configurations are based on OAI’s proven, time-tested platform.
The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.The Model 2012SM Automated Edge-bead Exposure System provides a cost-effective method for edge-bead removal using standard shadow mask technology. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.
Dependable and repeatable, The OAI Model 308 UV Intensity/Power Meter is precise, direct-reading instrument designed to measure UV light intensity. The Model 308 features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port and is available with an optional software package that facilitates instant data logging of intensity mode, time, wave length, serial number and calibration due date.
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The Model 308T features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port. Accuracy of the meter is within ±3%and measurement repeatability is within ±3 LSB (least significant bit). Like all OAI precision instruments, the Model 308T provides NIST traceable measurements. This easy-to-use meter is auto-ranging from 0.1 to 1999.9 milliwatts/cm2 full scale when used with the 2000 milliwatts/ cm2 probe. The linearity of the meter in this range is at least ±(.002% + 6 LSB).
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