Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
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Product
Gridless End-Hall Ion Sources
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Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
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Product
ALD
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Atomic Layer Deposition (ALD) offers precise control down to the atomic scale.Atomic layer deposition holds tremendous promise across a wide array of industries, including energy, optical, electronics, nanostructures, biomedical, and more. Please check out our Applications section for more details in any and all of these areas.
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Product
Dopant Source
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Attain precise and stable control of relatively low fluxes for dopant constituents in molecular beam epitaxy (MBE) through this compact dopant source. Its small thermal mass gives it excellent responsiveness, reproducibility, and stabilization for advanced doping profiles, plus consistent flux uniformity across an entire platen. Efficient cell heating minimizes thermal load.
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Product
5cc Dual Dopant Source
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Attain precise and stable control of relatively low fluxes for dopant constituents in molecular beam epitaxy (MBE) through this compact dopant source. Its small thermal mass gives it excellent responsiveness, reproducibility, and stabilization for advanced doping profiles, plus consistent flux uniformity across an entire platen. Efficient cell heating minimizes thermal load.
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Product
ALD For Research & Development
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Veeco’s atomic layer deposition research systems are designed by ALD scientists and built for maximum experimental flexibility and value. With universal precursor delivery systems, you can use solid, liquid or gas chemistries in any precursor port. There are many options to choose from including ozone generators, in-situ monitoring and various configurations. As always, our team of ALD scientists are ready to answer your recipe development and film characterization questions. Over 2500 published academic papers feature research performed on our Savannah® thermal ALD system and Fiji® plasma ALD system.
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Product
ALD Research
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Veeco’s ALD Research page is a hub for the latest thinking in atomic layer deposition. It brings together experimental data, modeling insights and collaborative breakthroughs that help engineers stay ahead of the curve. Whether exploring new chemistries or solving complex process challenges, this resource is designed to inform, inspire and accelerate thin-film innovation.
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Product
Medium-Temperature
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Medium-temperature processing systems deliver more thermal energy than low-temp tools can provide, without crossing into the stress-inducing range of high-temp processes. Operating between 200–600°C, they create the perfect balance for enabling critical film transformations, crystallization and adhesion. Medium-temperature MBE sources can be used for virtually any application—from hot-lip SUMO sources to standard filament for thermal effusion.
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Product
Diamond-Like Carbon: High-Performance Coatings for Extreme Applications
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When durability matters, Diamond-Like Carbon (DLC) coatings deliver. Known for their hardness, low friction, and chemical resistance, DLC films are the go-to solution for protecting surfaces in high-stress environments: from precision mechanical parts to advanced semiconductor devices.
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Product
Specialty Sources
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When conventional sources hit their limits, specialty sources step in. These custom-designed plasma and vapor sources are engineered for III-V MBE and compound semiconductor applications where unique material delivery and control are critical.
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Product
MOCVD Systems
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For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Product
Gas and Vapor Delivery Systems
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In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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Product
Etch System
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When it comes to clean etches, Veeco’s Ion Beam Etch (IBE) systems deliver with sharp control and minimal disruption. Using a focused argon ion beam, this subtractive technique etches nanoscale features with precision, making it a go-to for pattern transfer, layer removal, and surface refinement where edge definition matters most.
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Product
High Temperature
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When low vapor pressure materials demand more heat to transform, Veeco’s high-temperature MBE sources step in. Built for thermal extremes, they power the kinds of reactions and structural changes that unlock next-level device performance.
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Product
Laser Processing Systems
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Veeco delivers revolutionary Low-Cost-of-Ownership, HVM production-proven thermal annealing solutions at the most advanced technology nodes. Making a Material Difference with Leading Laser Spike Annealing Technology
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Product
Selenium Valved Cracker
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This source has multiple heating zones that can either generate cracked or uncracked selenium flux while resisting the chemical attack from the corrosive vapor. The unrivaled convenience and flux control are maintained without depleting the source material via an all-metal needle valve. Excellent results have been reported producing blue/green LED and laser diode devices.
