Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
-
Product
MBE systems
GEN Family
-
Veeco provides the industry’s broadest line-up of innovative and reliable molecular beam epitaxy (MBE) systems.
-
Product
ALD Research
-
Veeco’s ALD Research page is a hub for the latest thinking in atomic layer deposition. It brings together experimental data, modeling insights and collaborative breakthroughs that help engineers stay ahead of the curve. Whether exploring new chemistries or solving complex process challenges, this resource is designed to inform, inspire and accelerate thin-film innovation.
-
-
Product
Single Filament Sources
-
Get a cost-effective solution that’s ideal for your high-volume, high-value MBE process needs with reliable Veeco Single Filament Sources. They feature dependable band thermocouples and single heater filaments for 750-1200°C operation. Three system configurations, and many crucible sizes, are available. All offer stable and consistent fluxes of high vapor pressure materials.
-
Product
Physical Vapor Deposition Systems
-
Physical Vapor Deposition (PVD) systems use physical processes, like sputtering and evaporation, to deposit thin films with exceptional purity and control. These techniques are widely used in semiconductor manufacturing, optical coatings and protective applications.
-
Product
Gridless End-Hall Ion Sources
-
Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
-
Product
ALD Knowledge Center
-
As one of the first companies to market with a flexible commercially available atomic layer deposition system (ALD), we have a tremendous ALD Knowledge Center for researchers to draw upon. We have gathered together a wide range of information about ALD applications and thin films technology. This includes images and explanations of the exciting uses for ALD. We also gather and provide access to theses on the subject and a searchable database of scientific abstracts.
-
Product
MBE Components
-
Engineered to exacting operational standards and designed to provide highly reliable, flexible performance, Veeco offers a range of MBE components.
-
Product
Downward-Looking SUMO Source For Gallium And Indium
-
Attain large capacity, excellent flux uniformity, negligible shutter flux transients, and minimal depletion effects with Veeco’s Downward-Looking SUMO® Source for MBE. It combines a dual filament source with an asymmetric SUMO crucible featuring a narrow offset orifice and tapered exit cone with hot-lip heating. Result: excellent material quality, low defect counts, and good thickness uniformity. NOTE: This source is not for use with aluminum.
-
Product
Specialty Sources
-
When conventional sources hit their limits, specialty sources step in. These custom-designed plasma and vapor sources are engineered for III-V MBE and compound semiconductor applications where unique material delivery and control are critical.
-
Product
Atomic Layer Deposition Systems
-
Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
-
Product
ALD
-
Atomic Layer Deposition (ALD) offers precise control down to the atomic scale.Atomic layer deposition holds tremendous promise across a wide array of industries, including energy, optical, electronics, nanostructures, biomedical, and more. Please check out our Applications section for more details in any and all of these areas.
-
Product
Etch System
-
When it comes to clean etches, Veeco’s Ion Beam Etch (IBE) systems deliver with sharp control and minimal disruption. Using a focused argon ion beam, this subtractive technique etches nanoscale features with precision, making it a go-to for pattern transfer, layer removal, and surface refinement where edge definition matters most.
-
Product
ALD Advantages
-
Atomic Layer Deposition (ALD) stands out for one reason: control. The most significant advantages of thin film deposition via Atomic Later Deposition over other methods, are manifest in four distinct areas – film conformality, low temperature processing, stoichiometric control, and inherent film quality associated with the self-limiting, and self-assembled nature of the ALD mechanism ALD is exceptionally effective at coating surfaces that exhibit ultra high aspect ratio topographies, as well as surfaces requiring multilayer films with good quality interfaces technology. This thin-film process builds materials one atomic layer at a time, delivering unmatched uniformity and sub-nanometer precision, even on complex 3D structures. That level of accuracy makes ALD a critical technology for advanced semiconductor manufacturing, flexible electronics, and materials research.
-
Product
Corrosive Series Valved Cracker
-
With the superior flux control of the Corrosive Series Valved Cracker, complex structures not possible with conventional thermally controlled sources can be achieved. Mixed Group V layers of varying compositions can be grown without the frequent recalibration procedures necessary when using standard sources. SIMS analysis of a continuously graded GaAs1-xSbx layer demonstrates the excellent flux control available when using two Group V valved crackers, with identical results achieved at two different growth rates.
