Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
-
Product
Medium-Temperature
-
Medium-temperature processing systems deliver more thermal energy than low-temp tools can provide, without crossing into the stress-inducing range of high-temp processes. Operating between 200–600°C, they create the perfect balance for enabling critical film transformations, crystallization and adhesion. Medium-temperature MBE sources can be used for virtually any application—from hot-lip SUMO sources to standard filament for thermal effusion.
-
Product
MBE Technologies
-
When you’re creating thin films of exotic compound semiconductor materials one crystal at a time, you need a molecular beam epitaxy system that is configurable for different applications.
-
Product
Ion Sources
-
Veeco offers the most comprehensive array of ion beam sources for a broad range of applications, including the industry's only Linear gridded sources.
-
Product
Lithography Systems
-
When it comes to shaping what a chip can do, lithography systems lead the way by transferring intricate circuit designs onto substrates with unmatched precision. From prototyping to high-volume manufacturing, these tools define the geometry of modern microchips, as well performance.
-
Product
Dual Filament Source
-
Get the optimal thermal profile for different materials and situations with the Veeco Dual Filament Source. This source is designed for growing high-quality Ga- and In-containing materials, while preventing charge material recondensation and significantly reducing defects. Dual Filament Sources are available for use with both SUMO and conventional crucibles (including Group III production crucibles).
-
Product
Phosphorus Valved Cracker
-
The patented Valved Cracker for Phosphorus is uniquely tailored to provide a controlled and reproducible P2 flux from a solid phosphorus charge. The multi-zone crucible is designed for in situ conversion from commercially available red phosphorus to the more reactive white phosphorus with its advantageous evaporation characteristics.
-
Product
Dopant Source
-
Attain precise and stable control of relatively low fluxes for dopant constituents in molecular beam epitaxy (MBE) through this compact dopant source. Its small thermal mass gives it excellent responsiveness, reproducibility, and stabilization for advanced doping profiles, plus consistent flux uniformity across an entire platen. Efficient cell heating minimizes thermal load.
-
Product
Sputtering Systems
-
Known for precision and cleanliness, Veeco Ion Beam Sputtering (IBS) systems are ideal when engineers need tight control over film thickness, composition, and optical performance. Using a focused ion beam, IBS dislodges atoms from a target, depositing them onto a surface in smooth, ultra-uniform layers.
-
Product
High Temperature
-
When low vapor pressure materials demand more heat to transform, Veeco’s high-temperature MBE sources step in. Built for thermal extremes, they power the kinds of reactions and structural changes that unlock next-level device performance.
-
Product
Dicing And Lapping Systems
-
In semiconductor fabrication, clean die separation and smooth surfaces can make all the difference. While these steps might come late in the process, they play a major role in how well a device ultimately performs. Dicing and lapping bring the necessary level of precision to cut wafers into individual dies and polish surfaces so everything fits, functions and holds up the way it should in real world scenarios.
-
Product
ALD For Research & Development
-
Veeco’s atomic layer deposition research systems are designed by ALD scientists and built for maximum experimental flexibility and value. With universal precursor delivery systems, you can use solid, liquid or gas chemistries in any precursor port. There are many options to choose from including ozone generators, in-situ monitoring and various configurations. As always, our team of ALD scientists are ready to answer your recipe development and film characterization questions. Over 2500 published academic papers feature research performed on our Savannah® thermal ALD system and Fiji® plasma ALD system.
-
Product
ALD Services
-
Our ALD Services help engineers optimize, troubleshoot, and scale their processes, covering everything from custom process development to equipment calibration and advanced film characterization.
-
Product
Retractable Sources
-
Veeco’s retractable sources address fundamental limitations of MBE, including source capacity, source removal for maintenance and system uptime. The retractable source allows an individual source to be withdrawn and isolated from the growth environment with the source gate valve and then removed without venting the entire chamber.
-
Product
ALD For Manufacturing And Production
-
Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
-
Product
Laser Processing Systems
-
Veeco delivers revolutionary Low-Cost-of-Ownership, HVM production-proven thermal annealing solutions at the most advanced technology nodes. Making a Material Difference with Leading Laser Spike Annealing Technology
