Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
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Selenium Valved Cracker
This source has multiple heating zones that can either generate cracked or uncracked selenium flux while resisting the chemical attack from the corrosive vapor. The unrivaled convenience and flux control are maintained without depleting the source material via an all-metal needle valve. Excellent results have been reported producing blue/green LED and laser diode devices.
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Ion Beam System
Veeco's unmatched Ion Beam know-how delivers proven etch and deposition performance enabling the data storage and MEMS markets for decades.
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High Temperature
When low vapor pressure materials demand more heat to transform, Veeco’s high-temperature MBE sources step in. Built for thermal extremes, they power the kinds of reactions and structural changes that unlock next-level device performance.
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Wet Processing Systems
Surface preparation using sustainable practices is critical to ensuring the reliability of your advanced microelectronics destined for automotive applications, medical devices, 5G and cloud storage.
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High Temperature Source
The Veeco High Temperature Source provides thermal evaporation of charge materials at temperatures up to 2000°C. This compact MBE source operates efficiently to achieve high temperatures without excessive thermal load on the system. Low power requirements also enhance the lifetime of the heater filaments.
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ALD Materials
Chemists have synthesized many exciting new precursors for ALD and have created a large number of atomic layer deposition materials, such as coatings with improved properties for metals, semiconductors, insulators, oxides, nitrides, dielectrics, magnetic, and refractive coatings.
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ALD Advantages
Atomic Layer Deposition (ALD) stands out for one reason: control. The most significant advantages of thin film deposition via Atomic Later Deposition over other methods, are manifest in four distinct areas – film conformality, low temperature processing, stoichiometric control, and inherent film quality associated with the self-limiting, and self-assembled nature of the ALD mechanism ALD is exceptionally effective at coating surfaces that exhibit ultra high aspect ratio topographies, as well as surfaces requiring multilayer films with good quality interfaces technology. This thin-film process builds materials one atomic layer at a time, delivering unmatched uniformity and sub-nanometer precision, even on complex 3D structures. That level of accuracy makes ALD a critical technology for advanced semiconductor manufacturing, flexible electronics, and materials research.
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Atomic Layer Deposition Systems
Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
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Diamond-Like Carbon: High-Performance Coatings for Extreme Applications
When durability matters, Diamond-Like Carbon (DLC) coatings deliver. Known for their hardness, low friction, and chemical resistance, DLC films are the go-to solution for protecting surfaces in high-stress environments: from precision mechanical parts to advanced semiconductor devices.
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Gridded DC Ion Sources
Ion-assisted processes like sputtering, etching, and surface treatment depend on a beam that’s stable, uniform, and tightly controlled. Gridded DC ion sources make that happen, giving engineers the precision they need to fine-tune ion energy and current density for reliable results.
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Retractable Sources
Veeco’s retractable sources address fundamental limitations of MBE, including source capacity, source removal for maintenance and system uptime. The retractable source allows an individual source to be withdrawn and isolated from the growth environment with the source gate valve and then removed without venting the entire chamber. The source can then be easily refilled with the same material or a new material before being remounted at standard positions to the growth module, allowing growths to continue with minimal interruption. This saves the user from re-qualifying new source to substrate distances and multiple weeks of downtime by avoiding the process of an entire system vent and bake. In addition, the differential pumping option provides a marked improvement in base pressure around the source to reduce contamination of the source material and provide longer lifetimes for sources in corrosive and oxidizing environments. Veeco’s retractable source is the leading solution for material flexibility, system productivity and enhances our leadership with the patented SUMO source technology.
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ALD For Manufacturing And Production
Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
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ALD For Research & Development
Veeco’s atomic layer deposition research systems are designed by ALD scientists and built for maximum experimental flexibility and value. With universal precursor delivery systems, you can use solid, liquid or gas chemistries in any precursor port. There are many options to choose from including ozone generators, in-situ monitoring and various configurations. As always, our team of ALD scientists are ready to answer your recipe development and film characterization questions. Over 2500 published academic papers feature research performed on our Savannah® thermal ALD system and Fiji® plasma ALD system.
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Gridless End-Hall Ion Sources
Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
