Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- 1 Terminal Drive
Plainview, NY 11803
United States of America
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Product
Gridless End-Hall Ion Sources
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Veeco's Gridless End Hall Ion Sources provide high beam current for vacuum coating processes.
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Product
Ion Beam System
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Veeco's unmatched Ion Beam know-how delivers proven etch and deposition performance enabling the data storage and MEMS markets for decades.
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Product
Diamond-Like Carbon: High-Performance Coatings for Extreme Applications
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When durability matters, Diamond-Like Carbon (DLC) coatings deliver. Known for their hardness, low friction, and chemical resistance, DLC films are the go-to solution for protecting surfaces in high-stress environments: from precision mechanical parts to advanced semiconductor devices.
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Product
Laser Processing Systems
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Veeco delivers revolutionary Low-Cost-of-Ownership, HVM production-proven thermal annealing solutions at the most advanced technology nodes. Making a Material Difference with Leading Laser Spike Annealing Technology
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Product
Single Filament Sources
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Get a cost-effective solution that’s ideal for your high-volume, high-value MBE process needs with reliable Veeco Single Filament Sources. They feature dependable band thermocouples and single heater filaments for 750-1200°C operation. Three system configurations, and many crucible sizes, are available. All offer stable and consistent fluxes of high vapor pressure materials.
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Product
Deposition Systems
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When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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Product
Specialty Sources
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When conventional sources hit their limits, specialty sources step in. These custom-designed plasma and vapor sources are engineered for III-V MBE and compound semiconductor applications where unique material delivery and control are critical.
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Product
ALD For Manufacturing And Production
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Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
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Product
Dopant Source
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Attain precise and stable control of relatively low fluxes for dopant constituents in molecular beam epitaxy (MBE) through this compact dopant source. Its small thermal mass gives it excellent responsiveness, reproducibility, and stabilization for advanced doping profiles, plus consistent flux uniformity across an entire platen. Efficient cell heating minimizes thermal load.
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Product
Etch System
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When it comes to clean etches, Veeco’s Ion Beam Etch (IBE) systems deliver with sharp control and minimal disruption. Using a focused argon ion beam, this subtractive technique etches nanoscale features with precision, making it a go-to for pattern transfer, layer removal, and surface refinement where edge definition matters most.
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Product
MBE systems
GEN Family
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Veeco provides the industry’s broadest line-up of innovative and reliable molecular beam epitaxy (MBE) systems.
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Product
Lithography Systems
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When it comes to shaping what a chip can do, lithography systems lead the way by transferring intricate circuit designs onto substrates with unmatched precision. From prototyping to high-volume manufacturing, these tools define the geometry of modern microchips, as well performance.
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Product
MBE Technologies
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When you’re creating thin films of exotic compound semiconductor materials one crystal at a time, you need a molecular beam epitaxy system that is configurable for different applications.
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Product
Phosphorus Valved Cracker
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The patented Valved Cracker for Phosphorus is uniquely tailored to provide a controlled and reproducible P2 flux from a solid phosphorus charge. The multi-zone crucible is designed for in situ conversion from commercially available red phosphorus to the more reactive white phosphorus with its advantageous evaporation characteristics.
