Showing results: 46 - 60 of 92 items found.
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Process Sensing Technologies
Our accessories are tailored to optimise and retain gas purity at every step of the gas sample stage in order to ensure the best performance for trace impurity measurements at the ppb level.
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MKS Instruments
For cleaning CVD and ALD/ALE process chambers, the Paragon remote plasma source is designed for high gas dissociation rates (> 98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. This leading-edge performance translates into increased process throughput and repeatable process results. The Paragon design incorporates a proprietary plasma block design with a Plasma Electrolytic Oxidation coating for low particle, long block life that delivers lower cost of ownership.
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GHW Series -
MKS Instruments
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.
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MKS Instruments
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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MKS Instruments
The KEINOS™ 2MHz plasma generator builds on the solid, reliable attributes of the existing 2MHz design. KEINOS™ incorporates the latest technology from MKS to enable demanding applications of pulsing, fast impedance changes and shorter process steps. KEINOS™ can deliver up to 13kW of power, pulsing up to 50KHz, multiple set point pulsing, pulse shaping and MKS patented frequency tuning. KEINOS™ uses an integrated VI sensor for power accuracy and digital based control for fast response times.
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SPECTRO ARCOS -
SPECTRO Analytical Instruments GmbH
The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.Its unique new MultiView plasma interface option provides truly uncompromising axial-view and radial-view plasma observation in a single instrument. The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. Visit the MultiView Q&A section in the ARCOS Resource Center for answers to frequently asked questions. Plasma power enters a whole new era with the system's innovative generator. This unique, compact and extremely rugged component is based on laterally diffused metal oxide semiconductor (LDMOS) technology. It delivers the highest plasma power available today, enabling previously impossible feats of analysis at the highest plasma loads.
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EKSPLA uab
Unique laser systems for extreme applications:*OPCPA*Plasma physics*Laser shock peening
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Plasma Source -
SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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USim -
Tech-X Corporation
modeling framework that simulates the dynamics of charged fluids or neutrals. Using structured or unstructured meshes, USim quickly and accurately solves such basic problems as shock and instability capturing in inviscid, compressible neutral gas flows (Euler equations) or profile evolution in ionized plasmas (ideal MHD equations). supports: hydrodynamics, magnetohydrodynamics, Hall magnetohydrodynamics, two-fluid plasmas and Navier-Stokes and Maxwell's equations.
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HPR-60 MBMS -
Hiden Analytical Ltd.
The Hiden HPR-60 molecular beam mass spectrometer is a compact skimmer inlet MS for the analysis of atmospheric plasma and reactive gas phase intermediates.
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MKS Instruments
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
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Skyray Instruments
Involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Shimadzu Corp.
Optical emission spectrometry involves applying electrical energy in the form of spark generated between an electrode and a metal sample, whereby the vaporized atoms are brought to a high energy state within a so-called "discharge plasma".
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Sparklike Handheld™ -
Sparklike Oy
Sparklike Handheld™ is practical and quick method to test IG gas concentration. Technology is based on plasma emission spectroscopy. A high voltage spark is launched in the IG unit's cavity causing a light emission which is observed and analyzed further.
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ZZ-0017-01 -
LXinstruments GmbH
- Monitor holder for 19 “rack installation- 9 U (400 mm)- Can be used universally with LED, LCD and plasma monitors- Compatible with the VESA standards 75 x 75 and 100 x 100 mm- Record in portrait and landscape format