Showing recent results 1 - 4 of 4 products found.
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SALD-7500nano - Shimadzu Corp.
Delivering 10 times the sensitivity of previous models, this innovative analyzer is capable of continuously measuring changes in particle size and particle size distribution at one-second intervals, within a range spanning 7 nm to 800 μm. In addition, unique options that accommodate the measurement of even high-concentration samples (up to 20 wt%) and trace quantity samples (down to 15 μL) are available. Due to its leading-edge measurement capabilities, the analyzer will likely be used for many applications in new areas, including nanotechnology, the life sciences, and fine bubbles (microscopic bubbles).
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Anton Paar GmbH
Particle systems can be complex, but measuring them doesn’t have to be! Anton Paar offers two different technologies to characterize particles from the nanometer to the millimeter range. The Litesizer series employs light-scattering technology to determine particle size, zeta potential, transmittance, molecular mass, and the refractive index of nano- and microparticles in liquid dispersions. The PSA series uses laser diffraction technology to measure the size of particles in both liquid dispersions and dry powders in the micro and millimeter range. Side by side they open up a wide range of possibilities for comprehensive particle characterization.
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2300-1 and 2300-2 - MSP Corporation
2300-1 and 2300-2 Particle Deposition Systems (PDS™) are the latest, most advanced particle deposition tools from MSP for creating polystyrene latex (PSL) sphere size standards needed to calibrate KLA-Tencor, Applied Materials, TopCon, Hitachi and other wafer surface inspection systems. The new NPT (Nano Particle Technology) tools provide:True 20nm deposition capabilityUp to 12 different PSL sphere sizes and up to 50 different spots of particles in a single recipe±2% particle size accuracy for particles >50nm and ±1.0nm for particles < 50nmFull deposition and pattern deposition (spot, arc, and ring) while retaining all the desirable features of the popular 2300 tools:Differential mobility analyzer (DMA) technology for accurate particle sizing and size classificationAutomated NIST traceable calibration routineRecipe controlDeposition of Process Particles (Si, SiO2, Al2O3, TiO2, Si3N4, Ti, W, Ta, Cu, etc.) as well as PSL spheresThe 2300N-PT1 requires manual wafer loading while the 2300-NPT2 has automated wafer handling including dual FOUP load ports and an ISO Class 1 mini-environment. Bridge tool options for handling 200 and 300mm wafers are available. Please contact factory for more details.
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Klocke Nanotechnik
In light microscopy it is natural to use toolsets like tweezers, knives, probes and several different measurement tools. Without this many present-day products and methods would not exist. The operators of SEM/FIB-Systems generally work without toolsets, although the wavelength limit of light is no physical boundary. It can be imagined how technology would be pushed when a SEM/FIB Workbench reaches the same degree of practicability and utilization as toolsets for light microscopes. The Nanoworkbench is the first system substituting the eye-hand coordination effectively with nm precision in a SEM/FIB-system. The Nanoworkbench features a set of applications including TEM lamella preparation, nano probing, nano cutting, nano cleaning, force distance measurement, particle sorting and material preparation. Every application supports automated processes so almost no user interaction is needed. Even complex processes can be done within seconds and even by untrained users. Applications can be combined to create new and more complex processes. Expanding the SEM/FIB to a material processing system and a nano-analytical workbench by utilizing the Klocke Nanoworkbench enables new applications in research and production of material research, live sciences, tribology, environmental & forensic research and semiconductor technology.
