Showing results: 1 - 15 of 18 items found.
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JEOL Ltd.
Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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FIB-SEMs -
Carl Zeiss AG
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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SEM -
Carl Zeiss AG
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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McPherson, Inc.
The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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El-Mul Technologies
Systems utilizing multiple electron beams are an emerging semiconductor metrology technology that aims to increase throughput. El-Mul is a pioneer in developing detection solutions for such metrology systems and has designed and manufactured prototype detectors that can simultaneously detect 144 beams at 35MHz.
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MR-3 -
Stefan Mayer Instruments
3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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ZEISS Correlative Cryo Workflow -
Carl Zeiss AG
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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AET Associates, Inc.
X-ray and radioactive devices developed by AET, are widely utilized for medical, industrial and research use. The Compact Pulse X-ray Source can accelerate electron beams in a high-gradient electric field, to produce X-rays. Dose Calibrators are utilized for radioactive examinations and treatments in the medical industry.
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XRS-FP2 -
Amptek Inc.
XRS-FP2 is the next generation quantitative analysis software package for materials analysis using X-Ray Fluorescence (XRF). The single, integrated software package can be used in 3 different modes for different applications:*Single-layer samples, for compositional and single-layer thickness analysis (XRS-FP2 BULK)*Multi-layer, thin-film samples, for composition and multilayer thickness analysis (XRS-FP2 MTF)*Single-layer samples, for composition and single-layer thickness using an incident electron beam instead of and x-ray beam (XRS-FP2 EPXA)
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MODEL VES-3000 -
TEK-VAC INDUSTRIES Inc.
TEK-VAC's VES-3000 coater station model offers a modular concept for thin film deposition. Common PVD techniques which can be employed in this compact unit include thermal and electron beam evaporation. A 2KVA SCR controlled filament evaporation power supply is provided. Optional ion deposition and magnetron sputtering devices can be incorporated in the system.
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EPMA-8050G -
Shimadzu Corp.
This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company's traditions achieves the ultimate advance in analysis performance.
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GDZip + MEZip -
SolutionSoft Systems Inc.
Recognizing the challenge to transfer, manipulate, and store the exponentially-increasing size of IC design files, Solution-Soft has developed gdzip and mezip, breakthrough compressors for the GDSII and MEBES formats used by the industry. The MEBES format is the most commonly used format for electron beam lithography and photomask production. The GDSII stream is the standard exchange format between the design world and the mask shops.
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TCS -
RARA Electronics Corporation
These components are four-terminal. bus-bar, metal strip current shunts. Assembled using electron beam welding. These units can handle 15W of continuous power and a maximum current of 350A 90.1mohm). Also they can absorb a high pulse power rating and have very low inductance. They also feature excellent long term stability, less than 100ppm/C TCR, and have excellent frequency characteristics.
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Nordson Corporation
The BRIGHTHAWK NT100 is a performance-leading microfocus X-ray tube comprising proprietary technology to achieve a high brightness output. The tube consists of a LaB6 crystal source for generation of the electron beam, a magnetic beam steering system, and a tungsten target for X-ray photon emission. The components are mounted in a precision-engineering housing and held at ultra-low vacuum levels for long-life performance. Following on from the successful 3rd generation tube, this 4th generation of tube across a wide energy range from 30 kV to 160 kV is highly configurable through a software interface to the internal control board, which is connected via an optical interface (through an Ethernet converter).
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ZEISS Atlas 5 -
Carl Zeiss AG
Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
