Photo Mask
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Product
Tabletop Mask Aligner
Model 200
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The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Product
Tabletop Front & Backside Mask Aligner
Model 200IR
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The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Product
Photo Detectors
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Our photo detectors are offered for both power or energy measurements. Measure as low as a few femtojoules in energy or a few picowatts in power, thanks to our highly sensitive sensors and performant electronics.
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Product
Photo Detector Testing
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With the rise of 5G technology and popularization mobile devices, more and more advanced photoelectric sensors are used in our daily lives. In order to be better applied to mobile devices, the photosensitive area of these advanced photodetector is getting smaller and smaller. However, these applications place higher and higher requirements on the light sensing performance of advanced photodetectors. In the process of shrinking the photosensitive area, it also brings the challenge of accurate measurement of quantum efficiency. Enlitech adopts the spatial light homogenizing technology and follows the ASTM standard “Irradiance Mode” test method, which is proven that it can accurately perform quantum efficiency and other key parameter measurements of advanced photodetectors.
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Product
Phase Masks
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Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.
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Product
Photo Detectors
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Vishay has the broadest portfolio of PIN photobodies on the market. Vishay's photo detectors, photo transistors, and light detectors offer lower capacitance, provide high-speed response, and low noise and low dark current along with excellent sensitivity. They are ideal for high-speed data transfer, light barriers, alarm systems, and linear light measurement.
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Product
Photo Optic Sensors
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From patient monitoring in hospitals, to wearables and home healthcare applications, TE Connectivity (TE) offers photo optic sensors and components for non-invasively measuring blood oxygenation (SpO₂) level. With more than 27 years of proven reliability and expertise, TE has designed SpO2 sensors with best-in-class flexibility to accommodate multiple wavelength options. Our ability to provide both components and complete sensor packages make us the leading choice for pulse oximetry applications that require high degrees of precision, durability and performance.
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Product
Mask Flatness Measurement System
Tropel® UltraFlatTM 200 Mask System
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The Tropel® UltraFlatTM 200 Mask System was designed specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter masks.
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Product
Photo Detector Laser Power Meters
11PD100-Si
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Silicon detectors provide a generous aperture for laser beams up to 10 mm in diameter. The threaded aperture allows you to install filters, attenuators, fiber optic adapters or other optics that suit your specific needs.
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Product
Camera Color Correction for Photo & Video
SpyderCHECKR™ Family
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Automatically color correct your images by capturing SpyderCHECKR reference patches in your photo shoot, eliminating trial and error in post production. You can also color calibrate your camera and perform precision in-camera white balance.
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Product
MASK MVM-SEM® E3600 Series
E3630
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Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
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Product
Masks Respiratory Resistance Tester
WKS-1200
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WKS-1200 Masks Respiratory Resistance Tester applies to determining the inhalation resistance and exhalation resistance of respirators and mask protective products under specified conditions, and used for the relevant testing and inspection of ordinary mask products by the national labor protection equipment inspection agency or manufacturer.
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Product
Mask Foreign Matter Inspection Device
PR-PD2HR
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Efficient foreign matter inspection and measurement with high yield.
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Product
MASK MVM-SEM® E3600 Series
E3640
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Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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Product
Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
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The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Product
Mask UV Sterilizers
UV-MASK
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Mask UV Sterilizer applies to sterilizing the surface of masks, protective clothing, food, toys and other objects. It is widely used in hospitals, food, tea food and beverage processing and packaging equipment, food factories, cosmetics factories, dairy factories, breweries, beverage factories, bakeries and refrigerators, etc.
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Product
MASK MVM-SEM® E3600 Series
E3650
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Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Product
Medical Masks Synthetic Blood Penetration Tester
WKS-8010
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WKS-8010 Medical Masks Synthetic Blood Penetration Tester is to test the mask material with synthetic blood under continuous pressure, and visually inspect the penetration of synthetic blood on the material. It is suitable for the resistance of masks to the penetration of synthetic blood under different levels of test pressure.
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Product
Mask Alignment Systems
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EVG’s inventions, such as the world’s first bottom-side alignment system in 1985, have pioneered and set the industry standards in both top and double-sided lithography, aligned wafer bonding and nanoimprint lithography. EVG contributes in these areas through continuous development of mask aligner product generations to augment this core lithography technology.
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Product
Mask Bacterial Filtration Efficiency (BFE) Tester
WKS-1010
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WKS-1010 Mask Bacterial Filtration Efficiency (BFE) Tester is used to test the percentage of the mask material to filter out the suspended particles containing bacteria under the specified flow rate. It is suitable for the performance test of the bacterial filtration efficiency of medical surgical masks by metrological inspection departments, scientific research institutes, medical mask manufacturers and other related departments.
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Product
Traffic Photo Enforcement
LidarCam 2
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Automatically collect a video + multiple high-resolution photos every time you capture a traffic violation. Built-in Automated License Plate Recognition (ANPR/ALPR) Technology can automatically check for wanted plates or other violations. Hand-held or mounted to a tripod, in a patrol vehicle or from the side of the road, the Stalker LidarCam 2 is the next generation of photo enforcement.
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Product
Photo Detector with Integrated Transimpedance Amplifiers
ADN3010-11
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Analog Devices optoelectronic amplifiers include a range of germanium photodiodes that, through a proprietary process, have been monolithically integrated with silicon transimpedance amplifiers and limiting amplifiers. This process eliminates the need for bond wires connecting the photodiode to the transimpedance amplifier, which leads to improved performance and greater manufacturing reliability. Our portfolio of products also supports the growing need for optical and electrical interface miniaturization.
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Product
GENERAL INSPECTION MACHINE AFTER SOLDER MASK
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DVI is a technology of automated optical inspection, which can inspect deep to the difference from semi-transparent layers or semi-reflective layers.
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Product
Masks Particle Filtration Efficiency Tester
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Sataton Instruments Technology CO., Ltd
Face masks particle filtration efficiency (BFE) tester is device to determine the particle filter penetration and filtration efficiency for respiratory protective devices and face masks. The tester with particle generator can provide sodium chloride particles and paraffin oil particles. It can measure the particle penetration, filtering efficiency and the breathing resistance delta P. It is widely used in quality control, research and development, certification, manufacturing or testing industry, etc.
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Product
Photo Gate Logger Sensor
NUL-209
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This sensor can be used to study various kinds of motion. With six modes of operation, time, velocity or acceleration can be measured with one or two photo gates and associated timing cards, as well as showing pictorially the status (digital 1 or 0) of the voltage output of the photo gate as timing cards pass through it.
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Product
MASK DR-SEM
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Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Product
Mask ventilation resistance and pressure differential tester
WKS-3102
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Mask ventilation resistance and pressure differential tester is used to measure the inhalation and exhalation resistance of mask under specified conditions. Applicable to mask manufacturers, labor protection equipment inspection agencies to carry out related testing and inspection of mask products, mask breath resistance tester, breathing valve air tightness tester, breath resistance machine for measuring respirator and mask protection products in Inspiratory resistance and expiratory resistance under specified conditions.
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Product
Face Masks Particulate Filtration Efficiency PFE Tester
GLE-20
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GLE-20 is an oil-salt two-in-one Face Masks Particulate Filtration Efficiency PFE Tester. According to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1, etc. It is used to test the particulate filtering efficiency of daily protective masks and medical masks, and to determine the obstruction performance of ordinary fabrics and medical protective masks against a constant flow of airflow.
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Product
NanoLattice Pitch Standard for Mask Handling Tools (NLSM)
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The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade, with the only pitch standard of its kind available below the 130 nm node.
