R&D Microwave PECVD System

R&D Microwave PECVD System

Retrofittable with RF-DC-Laser Ablation Modules.
High Temperature Substrate Heating, 4" Diameter.
High Power Magnetron Head, 600W
Microprocessor Temperature Control.
Standard Model equipped to handle four gas inputs, expandable.
Adaptable for RF or DC Plasma.
Top Loading, Compact Footprint.
Broad Operating Pressure Range (10-4 to 760 torr).

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