Our wide range of powerful, versatile, and proven mass spectrometry-based solutions deliver a new level of understanding and control in vacuum and gas-related applications to customers.
MKS Instruments' platform of innovative optical analyzers based on Tunable Filter Spectroscopy (TFS™) provides real-time gas analysis, while delivering customers a substantially lower total cost of ownership. TFS™ can be utilized from UV (Ultra-Violet) through IR (Infra-Red) spectral regions. MKS TFS™ sensor platforms have been on the market since 2008 with more than 2500 systems deployed.
FTIR Spectroscopy gas analyzer instruments from MKS Instruments are capable of ppb to ppm sensitivity for multiple gas species in a variety of gas analysis applications, such as toxic gas detection, automotive emissions measurement, and monitoring stack emissions, processes, ambient air, purity, and selective catalytic reduction performance.
The Process Sense endpoint sensor is a small, low-cost SiF4 sensor specifically designed for Remote Plasma Chamber Clean Endpoint detection for silicon-based CVD deposition chambers. Process Sense is based on infrared absorption, the only technique applicable to all plasma cleaning processes (in-situ and remote). It gets mounted onto a bypass on the rough line, ensuring no effect on deposition hardware. The signal level reported by the Process Sense, which is proportional to SiF4 concentration, can be used to determine the completion of the chamber clean process.
The 835 VQM is a mass spectrometer that operates from UHV to 10-5 Torr and accurately measures the gases in the vacuum chamber. The 835 VQM Differential Pump System delivers the advantages of the 835 VQM at higher pressures. The VQM system consists of an autoresonant ion trap mass spectrometer gauge, a VQM Controller and VQM Viewer software that that converts raw data into actionable information. The system is ratiometric, meaning that it determines the ratio of each gas to other gases in a vacuum chamber. It is usually coupled with a total pressure gauge to provide partial pressures of each gas as indication of the quality of the vacuum in the chamber.
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