OAI
OAI is a leading manufacturer of reliable, precision equipment for MEMS, semiconductors, nanotechnology, cleanroom automation, and for UV light measurement.
- 800-843-8259
408-232-0600 - 408-433-9904
- sales@oainet.com
- 464 South Hillview Drive
Milpitas, CA 95035
United States of America
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Product
Exposure Systems
Model 2012AF & 2012SM
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The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.The Model 2012SM Automated Edge-bead Exposure System provides a cost-effective method for edge-bead removal using standard shadow mask technology. Designed to accommodate wafers from 8” to 300mm, the tool features automated FOUP loading. Mask and substrate changeover can be accomplished quickly and easily adding to both versatility and high-volume throughput of this production tool.
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Product
Calibrated Solar Reference Cell
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To insure repeatable testing on any solar simulator, OAI offers 2cm x 2cm calibrated reference cells. Standard reference cell calibration cycles can be set up by OAI''s calibration laboratory to insure that your reference cell maintains certification.
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Product
Handheld Surface & Volume Low Resistivity Meter for Conductive Materials
Loresta AX
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The Loresta AX Resistivity Meter a handheld unit measures the low resistivity of samples with consistent accuracy. This resistivity meter measures resistivity using a wide variety of probes. The Loresta AX uses a standard RCF that enables the user to input other RCF''s if known.
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Product
Tabletop Front & Backside Mask Aligner
Model 200IR
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The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Product
Standard Class AAA Solar Simulator
TriSOL TSS
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Essential for testing virtually any material or product that is exposed to sunlight for long or short periods of time, OAI’s low-cost, Standard Solar Simulators deliver highly collimated, uniform light. Depending on configuration, output on these Solar Simulators is rated at 350W -5,000W.These Class AAA Solar Simulators feature OAI’s Advanced Uniform Beam Optics and are available with a choice of air mass filters to reproduce a wide range of solar spectra. For added flexibility, OAI’s proven lens and collimating mirror technology allows for a variety of exposure area sizes. A Class AAA Solar Simulator is an essential tool for manufacturing as well as R&D; it is indispensable in test labs, industry, and in universities. OAI Standard Solar Simulators are used in photobiology, biomedical, solar cell testing, cosmetic testing, and paints & coatings analysis. Based on 35+ years of proven UV light technology, OAI Solar Simulator Systems deliver repeatable, reliable, constant output, and measurement uniformity.
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Product
Automated I-V/AOI/EL and Sorting System
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OAI’s High Performance In-line Automated-I-V Testing, AOI/EL Inspection and Sorting/Binning System for Various Si Solar Cells. The 10000A-I-V System is a unique and reliable I-V testing, AOI/EL Inspection and Sorting / Binning system for testing of Mono, Multi-Si, C-HJT and other full Size (156mm x 156mm) and/or Cut-cell (156mm x 39mm or 156mm x 31.2mm or other custom sizes) Si Solar Cells.
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Product
Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
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The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Product
Exposure Systems
Model 2000AF & 2000SM
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The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure system (2000AF); both configurations are based on OAI’s proven, time-tested platform.
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Product
Enhanced UV Light Source
Model 30E
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The Model 30E Enhanced UV Lightsource is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm, using the appropriate lamp (included). Output power ranges from 200 watts to 5 kilowatts. All OAI UV Lightsources are easily equipped with quick-change filter assemblies, enabling the user to customize the output spectrum with little effort. Optional remote exhaust fans are available.
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Product
Mask Treatment Process
Model 100MT
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OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
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Product
Tabletop Mask Aligner
Model 200
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The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Product
Custom Solutions for Mask Aligners
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OAI offers custom designed solutions built to your unique specification.
