Showing results: 1 - 15 of 18 items found.
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PHI Quantera II -
Physical Electronics
The core technology of the PHI Quantera II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling, and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 7.5 µm. In addition to superior XPS performance characteristics the PHI Quantera II provides two in situ sample parking stations which enables the automated analysis of all three sample platens in a single user defined analysis queue.
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PHI VersaProbe III -
Physical Electronics
The PHI VersaProbe III is a highly versatile, multi-technique instrument with PHI’s patented, monochromatic, micro-focused, scanning X-ray source. The instrument offers a true SEM-like ease of operation with superior micro area spectroscopy and excellent large area capabilities. The fully integrated multi-technique platform of the PHI VersaProbe III offers an array of optional excitation sources, sputter ion sources, and sample treatment and transfer capabilities. These features are essential in studying today’s advanced materials and in supporting your material characterization and problem-solving needs.
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Rocky Mountain Laboratories, Inc.
X-ray photoelectron spectroscopy (XPS Analysis) also called Electron Spectroscopy for Chemical Analysis (ESCA) is a chemical surface analysis method. XPS measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.
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FLIR IRW-xPC/xPS Series -
Teledyne FLIR
The FLIR IRW-xPC/xPS joins the existing FLIR IR Window family to help you inspect more efficiently, make inaccessible components accessible, and save money by preventing unplanned downtime. The rectangular polymer windows are impact resistant and provide the largest viewing area available to monitor completely undisturbed assets inside energized electrical equipment. IR Windows-xPC/xPS are durable and stable in harsh environments, making them suitable for most industrial settings as well as for shipboard use.
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Evans Analytical Group®
X-ray Photoelectron Spectroscopy (XPS Analysis), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is used to determine quantitative atomic composition and chemistry. It is a surface analysis technique with a sampling volume that extends from the surface to a depth of approximately 50-70 Angstroms. Alternatively, XPS analysis can be utilized for X-ray Photoelectron Spectroscopy (XPS) or Electron Spectroscopy for Chemical Analysis (ESCA) from Evans Analytical Group (EAG).sputter depth profiling to characterize thin films by quantifying matrix-level elements as a function of depth.
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Kratos AXIS Nova -
Shimadzu Corp.
X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a mature and widely used surface analysis technique for materials characterisation. XPS provides quantitative elemental and chemical state information from the upper most 10 nm of material. The The AXIS Nova photoelectron spectrometer can collect X-ray photoelectron spectra and images from any material that is stable under the ultra-high vacuum conditions required for the technique.
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Rocky Mountain Laboratories, Inc.
Rocky Mountain Laboratories, Inc. provides SEMI Standards analyses that conform to the following SEMATECH and SEMI Standards for testing of passivated 316L stainless steel components being considered for installation into a high-purity gas distribution system:SEMASPEC #90120401B-STD (SEM Analysis)SEMASPEC #90120402B-STD (EDS Analysis)SEMASPEC #90120403B-STD (XPS Analysis)SEMASPEC #91060573B-STD (Auger (AES) Analysis)SEMI F60-0306 (based on F60-0301) (XPS Analysis)SEMI F72-1102 (Auger (AES) Analysis)
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Rocky Mountain Laboratories, Inc.
Rocky Mountain Laboratories is now offering testing to detect Cr(VI) on the surface of materials. ROHS standards for export of materials to Europe require testing for Cr(VI), and with our XPS instrument, we can provide that testing.
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AXIS Supra -
Kratos Analytical Ltd
AXIS SupraTM is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterisation. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode. XPS spectroscopy and imaging results can be complemented by additional surface analysis techniques such as: ultraviolet photoemission spectroscopy (UPS); Schottky field emission scanning Auger microscopy (SAM) and secondary electron microscopy (SEM) and ion scattering spectroscopy (ISS). The AXIS Supra replaces the AXIS Ultra DLD as Kratos' flagship x-ray photoelectron spectrometer.
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AXIS Supra+ -
Shimadzu Corp.
X-ray photoelectron spectroscopy (XPS) is unique in providing quantitative elemental and chemical state information from the uppermost 10 nm of a materials surface. The AXIS Supra+ (also known as Kratos Ultra 2+ in Japan) is a market leading X-ray photoelectron spectrometer combining state-of-the-art spectroscopic and imaging capabilities with the highest level of automation currently available. Unrivalled large area spectroscopic performance allows photoelectron spectra to be acquired from all types of materials including metals, semi-conductors and insulators. Fast, high spatial resolution XPS imaging reveals the lateral distribution of surface chemistry and aids further characterisation with selected small area analysis.
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Material Interface, Inc.
Surface Analysis; X-Ray Photoelectron Spectroscopy (XPS, ESCA), Auger Electron Spectroscopy (AES), Time-of-Flight Secondary Ion Mass Spectrometry (Static) (TOF-SIMS), Dynamic Secondary Ion Mass Spectrometry (D-SIMS). Microscopy & Diffraction; Organic Material Analysis; Bulk Chemistry.
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xPS Series -
Carl E. Holmes Company
High Voltage SCR Controlled Power Supply, P/N 18278PS Power Rating: 350 KW. Input: 480 VAC, 3 PH, 60 Hz Output: 0 to 5000 VDC, 70 Amps max Ripple: 2 % approximately at maximum rated voltage Configuration: 12 pulse externally SCR controlled rectifier system Protection Devices: Input contactors Overload relay shutoff Input surge suppressor Thermal switches Output current limiting resistor (made with 5 Ohm Kanthal heating element) Emergency power shutoff Cooling: Each 6 pulse rectifier assembly is cooled by three 10” fans Interface: 4/20 ma converter interface for output voltage and output current to SCR controller. Enclosure: The overall dimension of the unit is (78”H x 38”W x 53”D). It is comprised of two separate enclosures each with dimensions of (78” H x 38” W x 26” D) which are integrated together to form a single enclosure. Each half enclosure has one 6 pulse transformer and one 6 pulse high voltage rectifier. Weight: Approx. 5000 lbs. SCR Controller: The 12 pulse SCR controller is supplied by the customer. We were responsible for the 12 pulses Transformer and 12 pulses Rectifier section. Portability: Unit can be lifted up with a fork lift. It can also be moved around with a 5000 lb pallet jack. Transformer: Two 200 KVA transformers are used to step 480 VAC to 3750 VAC each in a 12 pulse configuration Rectifiers: Two 6 pulse rectifier assemblies capable for 5000 VDC and 60 Amps output were used. The high voltage rectifier assemblies are isolated and protected in a fiberglass plenum within the enclosure. Blocking Diode: Each diode of the 6 pulse rectifier consists of 10 diodes in series to offer a blocking voltage of 12000 V (PIV)
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Shimadzu Corp.
Shimadzu offers a range of instruments that are ideal for all sample forms handled by customers in the fields of steel, non-ferrous metals, environment, foods, chemicals, pharmaceuticals, semiconductors, ceramics, and polymers. EPMA/SEM offers analysis of targets from several centimeters to several microns; XPS offers analysis from several millimeters to several microns; and SPM permits observations from over a hundred microns to several nanometers.
