Showing results: 1351 - 1353 of 1353 items found.
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CS-131 -
HORIBA, Ltd.
The CS-131 is a high-precision chemical concentration monitor designed for use with SC-1 solutions used in cleaning processes during semiconductor manufacturing. It offers a faster response speed in a more compact size than anything available to date. The CS-131 monitors the concentrations of the individual components of the SC-1 solutions (NH3/H2O2/H2O) which is widely used to remove particles and organic substances. The monitor has a number of outputs which can be utilized to keep the concentrations of the individual elements of the SC-1 solutions within the allowable ranges; this eliminates unnecessary replacement of chemicals potentially increasing bath life time and reducing chemical cost. In addition, a model with an integrated cooling unit is available, allowing accommodation of a broader range of sample temperatures.
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CS-137 -
HORIBA, Ltd.
The CS-137 is a high-precision chemical solution concentration monitor designed to meet the strict demands of semiconductor wet-etching processes. Etching processes use BHF solution to etch silicon oxide and remove particles from the wafer surface. The CS-137 continually monitors each component of the BHF solution (NH4F/HF/H2O), alerting the user each time the solution is replaced or replenished. This allows you to maintain the concentration of the BHF solution within the required component ranges, while eliminating unnecessary solution replacement.
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DP15 -
Validyne Engineering
An easy-to-replace pressure-sensing diaphragm maximizes the system's functionality by making pressure measurements from 2.22" H2O to 3200 psi in one compact unit. Rugged and reliable, the DP15 pressure sensor provides superior accuracy for measuring low-pressure liquids and gasses, while it withstands the abuse of field and laboratory testing. The ability to change full scale ranges make the DP15 a very cost effective solution for applications that need different pressure ranges or university labs.
