High Performance UV Nanoimprint Resist

High Performance UV Nanoimprint Resist

UV Nanoimprint is a mechanical molding technique. A template made from quartz or a flexible elastomer with a 3D relief is brought into intimate contact with a UV-curable resist spin-coated on top of a substrate. Applying low imprint pressure at room temperature features are filled within seconds due to the low viscosity of the imprint resist. The resist is hardened via UV-light through the backside of the template. Finally substrate and template are separated. The replicated resist relief can further be transferred into the substrate via RIE-process or used as functional element.

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