Showing results: 46 - 53 of 53 items found.
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Applied NanoStructures, Inc.
AppNano silicon probes are manufactured out of prime grade, low resistivity (0.01- 0.025 Ω-cm), n-type antimony doped, single crystal siliconOur well-established silicon technologies combined with novel micro-fabrication processes achieve consistent high quality monolithic probes with unprecedented tip sharpnessWe have many standard silicon probe series designed for a wide variety of applications that are compatible with most AFM equipment in the market
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Transmission -
Neaspec GmbH
Detection optimized for high performance near-field imaging in transmission-modeEnables optical amplitude and phase resolved near field measurementsPatented background-free detection technologyEnables bottom-side (transmission-mode) sample illumination with broadband mirrorSuited for visible and infrared wavelength range 0.5 20 mRequires transparent sample substrateMotorized parabolic mirror for easy beam-alignment in transmission-modeStationary focal point with respect to AFM-tipVariable illumination spot size (ca. 2m 100m)Suitable for plane-wave illuminationSupported AFM scan-speed: up to 20 m/s @ highest spatial resolution
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3DM Serirs -
Park Systems Corp.
Park Systems has introduced the revolutionary Park 3DM Series, the completely automated AFM system designed for overhang profiles, high-resolution sidewall imaging, and critical angle measurements. With the patented decoupled XY and Z scanning system with tilted Z-scanner, it overcomes the challenges of the normal and flare tip methods in accurate sidewall analysis. In utilizing our True Non-Contact Mode™, the Park 3DM Series enables non-destructive measurement of soft photoresist surfaces with high aspect ratio tips.
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HV200/5 -
Anfatec Instruments AG
The HV200/5 is a high-precision HV-amplifier designed for the control of tube scanners. It takes three input voltages In X, In Y and In Z (-10 V to + 10 V), amplifies them separately (input gain switches: x1, x2, x5, x10, x20) and adds an offset voltage between -10 V and +10 V. In a 2nd stage, the signal is amplified by a factor of 20. This enables its use as HV amplifier in scanning image acquisition applications, such as STM or AFM, with the capability to shift the scan range in high resolution imaging.
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Wafer Series -
Park Systems Corp.
Park's Smart ADR provides fully automated defect review and identification, enabling a critical inline process to classify defect types and source their origin through high resolution 3D imaging.Designed specifically for the semiconductor industry, Smart ADR is the most advanced defect review solution available, featuring automatic target positioning without the need for labor intensive reference marks that often damage the sample. The Smart ADR process improves productivity by up to 1,000% compared to traditional defect review methods. Additionally, the new ADR capability offers up to 20x longer tip life thanks to Park's groundbreaking True Non-Contact™ Mode AFM technology.
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Park Systems Corp.
Atomic Force Microscopy (AFM) allows for sub nanometer resolution imaging of surface topography and is able to quantify surface roughness at the angstrom scale. Our team can give you highly accurate measurements such as surface topography, dopant distribution, magnetic domain features, and a wide variety of other sample properties to give you the information you need to do great work.Park can provide measurements in the following areas:● Topography (surface roughness, grain size, step height, etc.)● Mechanical Properties (stiffness, etc.)● Electrical properties (capacitance, conductivity, etc.)● Thermal properties ● Magnetic properties These properties can be measured in air or liquid, depending on your needs.
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Rocky Mountain Laboratories, Inc.
Scanning probe microscopy (SPM) refers to a family of measurement techniques that utilize a scanning probe. The most common measurement is Atomic Force Microscopy (AFM Analysis), which measures surface topography. Imaged areas can be from the nm scale to as large as 100 µm X 100 µm. Heights and depths of features can be measuredand many surface roughness parameters, e.g Ra, can be calculated. 3-D images can also be produced for dramatic data presentation. Magnetic and electrical response can also be measured with SPM.
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HDM Series -
Park Systems Corp.
The task of identifying nanoscale defects is a very time consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput. In addition, Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan. Park NX-HDM, together with its industry's lowest noise floor, and its unique True Non-Contact™ technology, it is the most accurate AFM for surface roughness measurement in the market.
