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Mask Inspection system

Mask Inspection system

The Applied Aera4 Mask Inspection system is a fourth-generation 193nm-based inspection tool unique in combining true aerial imaging with cutting-edge high-resolution imaging. Equipped with a new lithography-grade lens, the Aera4 system demonstrates improved signal-to-noise for both standard high-resolution applications and aerial inspection, making it the tool of choice for 1x nm technology nodes and for early-production EUV mask inspection.

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