Showing results: 1 - 3 of 3 items found.
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Nano-View Co. Ltd.
~0.1 nm thickness difference can be seen by IE-1000.Thickness distribution of thin film can be imaged.Thickness and optical images of semiconductor device, display, and bio samples.IE-1000 can show the images which can not be seen by conventional microscope.Defect of semiconductor and display can be seen directly.Easy and fast operation.
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Nano-View Co. Ltd.
– Antireflective coating (ARC) on textured (poly-) crystalline silicon solar cellMeasurement– Thickness, Reflectivity, n&kWavelength– 420 – 950 nm (1.3-3.0 eV) : expandableAccuracy (thickness measurement on specular sample)– 104.5 nm for 104.8 nm SiO₂on c-Si* Accuracy can be dependent on the quality of filmThickness range– 10 nm ~ 20 mm (depend on sample)Data acquisition time– < 1 sBeam spot size– ~ 50 mmFocusing of beam– Manual (optional auto-focus)Sample stage– Manual X-Y stage (specify sample size and travel distance)(optional automatic X-Y stage for mapping)
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SE Series -
Nano-View Co. Ltd.
Spectroscopic data measurement– Visible range: 350~840 nm (or 1.5~3.5 eV)– Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}Manually variable angle of incidence– 45°~90° with 5° stepSingle body system– 40 cm (W) × 30 cm (D) × 30 cm (H), 15 kg (typical)* UV- option requires external lamp power supplyEasy operation– No set-up / No keys to control– Low maintenanceUser-friendly software– operation and analysisOther features– Sample stage with tilt & height adjustmentssample size: (5 mm × 5 mm) ~ (200 mm × 200 mm)– Computer with current operating softwareOptions– Mapping stage: manual or automatic– UV-option: 250~840 nm (or 1.5~5.0 eV)
